Patent US5069997A successfully refreshed from Google Patents.
US5069997A
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Positive and negative working radiation sensitive mixtures and production of relief patterns
Assignee: BASF SE
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Filing: 1989-05-16
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Granted: 1991-12-03
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Expires: 2009-05-16
Abstract
Abstract Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.
Inventors
- 👤 Reinhold Schwalm
- 👤 Horst Binder
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 21:48
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; G03F7/0045
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
103 words
A radiation sensitive mixture containing (a) a polymeric binder and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, wherein the polymeric binder (a) is a reaction product of a polymer that contains phenolic hydroxyl groups with dihydropyran or with an alkyl vinyl ether or is a polymer or polycondensate obtained by polymerization or polycondensation of reaction products of monomeric compounds that contain phenolic hydroxyl groups with dihydropyran or with an alkyl vinyl ether.
Claim 2
Dependent Claim
103 words
A radiation sensitive mixture containing (a) a polymeric binder and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, wherein the polymeric binder (a) is a reaction product of a polymer that contains phenolic hydroxyl groups with dihydropyran or with an alkyl vinyl ether or is a polymer or polycondensate obtained by polymerization or polycondensation of reaction products of monomeric compounds that contain phenolic hydroxyl groups with dihydropyran or with an alkyl vinyl ether.
Claim 3
Dependent Claim
39 words
A radiation sensitive mixture as recited in claim 1, wherein in the polymeric binder (a) from 10 to 100% of the phenolic hydroxyl groups originally present in the polymer have been reacted with dihydropyran or an alkyl vinyl ether.
Claim 4
Dependent Claim
32 words
A radiation sensitive mixture as recited in claim 1, wherein the polymeric binder (a) is a reaction product of a novolak based on p-cresol/formaldehyde with dihydropyran or with an alkyl vinyl ether.
Claim 5
Dependent Claim
32 words
A radiation sensitive mixture as recited in claim 2, wherein the polymeric binder (a) is a reaction product of a novolak based on p-cresol/formaldehyde with dihydropyran or with an alkyl vinyl ether.
Claim 6
Dependent Claim
36 words
A radiation sensitive mixture as recited in claim 1, wherein the polymeric binder (a) is a reaction product of poly(p-hydroxystyrene), poly(p-hydroxy-α-methylstyrene) or a copolymer of p-hydroxystyrene and p-hydroxy-α-methylstyrene with dihydropyran or with an alkyl vinyl ether.
Claim 7
Dependent Claim
36 words
A radiation sensitive mixture as recited in claim 2, wherein the polymeric binder (a) is a reaction product of poly(p-hydroxystyrene), poly(p-hydroxy-α-methylstyrene) or a copolymer of p-hydroxystyrene and p-hydroxy-α-methylstyrene with dihydropyran or with an alkyl vinyl ether.
Claim 8
Dependent Claim
115 words
A radiation sensitive mixture as recited in claim 1, wherein the organic compound (b) is a sulfonium salt of the general formula (I) ##STR6## where R 1 , R 2 and R 3 are identical to or different from one another and each is singly acyclyl or aryl which each may contain heteroatoms, or two of R 1 to R 3 together form a ring, with the proviso that at least one of R 1 to R 3 contains one or more acid cleavable groups, one of R 1 to R 3 can be linked to one or more further sulfonium salt residue directly or via acid cleavable groups, and X.sup.⊖ is a nonnucleophilic counterion.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-12-02 | 1995-06-03 | 1995-12-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-12-02 | 1999-06-03 | 1999-12-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-12-02 | 2003-06-03 | 2003-12-03 | $7700.00 | Window Closed / Lapsed |