Photo-solubilizable composition

Abstract

Abstract PURPOSE:To obtain the titled composition having a high photosensitivity and a broad developing allowability in a development by incorporating a compd. having a partial structure capable of generating an acid by irradiation of an active ray and a partial structure shown by a specific constitutional formula and also having a property of increasing the solubility in a developer with an action of the acid to the titled composition. CONSTITUTION:The titled composition comprises the compd. having the partial structure capable of generating the acid by irradiating the active ray and the partial structure (a silylether group) shown by the formula and having the property of increasing the solubility in the developer with the action of the acid. The partial structure which enables to generate the acid by irradiating the active ray is preferably the structure having a s-triazine unit substd. with a trihalomethyl group or an oxadiazole unit substd. with a trihalomethyl group. The compounding ratio of the silylether bond of the silylether compd. and the partial structure capable of generating the acid by irradiating the active ray is preferably (1:5)-(1:0.001), more preferably (1:1)-(1:0.01) in a molar ratio.

Inventors

• 👤 Akihiko Kamiya
• 👤 神谷　明彦
• 👤 Toshiaki Aoso
• 👤 利明 青合

Bibliographic Details