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Process for sputtering multilayers for magneto-optical recording

Assignee: Mitsubishi Chemical Corp
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Filing: 1989-11-27
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Granted: 1991-11-26
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Expires: 2009-11-27
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Abstract

Abstract An improved sputtering process for making a platinum/cobalt (Pt/Co) multilayer film comprised of alternating layers of platinum and cobalt, said improvement comprising using as the sputter gas krypton, xenon or a mixture thereof.

Inventors

  • 👤 Peter F. Carcia

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 02:50
CPC Classifications
G; G11; G11B; G11B11/00; G11B11/10; G11B11/105; G11B11/10582; G11B11/10586; B; B82; B82Y; B82Y25/00; H; H01; H01F; H01F10/00; H01F10/32; H01F10/324; H01F10/325; H01F41/00; H01F41/14; H01F41/18; H01F10/3286

Claims Analysis

Total Claims: 13
Claim 1
Independent Claim 32 words
An improved sputtering process for making a platinum/cobalt multilayer film comprised of alternating layers of platinum and cobalt, the improvement comprising using krypton, xenon or a mixture thereof as the sputter gas.
Claim 2
Dependent Claim 32 words
An improved sputtering process for making a platinum/cobalt multilayer film comprised of alternating layers of platinum and cobalt, the improvement comprising using krypton, xenon or a mixture thereof as the sputter gas.
Claim 3
Dependent Claim 11 words
The process of claim 1 wherein the sputter gas is krypton.
Claim 4
Dependent Claim 11 words
The process of claim 1 wherein the sputter gas is xenon.
Claim 5
Dependent Claim 24 words
The process of claim 1 wherein the sputter gas has a pressure about 2 to about 12 mTorr (about 0.27 to about 1.6 Pa).
Claim 6
Dependent Claim 66 words
The process of claim 4 wherein all said cobalt layers have substantially the same thickness d Co and all said platinum layers have substantially the same thickness d Pt , d Co is less than about 12 A (1.2 nm), d Pt is less than about 24 A (2.4 nm) and the total thickness of the multilayer film is less than about 750 A (75 nm).
Claim 7
Dependent Claim 33 words
The process of claim 5 wherein d Co is from about 2 to about 5 A (0.2 to about 0.5 nm) and d Pt /d Co is from about 1 to about 5.
Claim 8
Dependent Claim 11 words
The process of claim 6 wherein the sputter gas is krypton.
Claim 9
Dependent Claim 11 words
The process of claim 6 wherein the sputter gas is xenon.
Claim 10
Dependent Claim 66 words
The process of claim 1 wherein all said cobalt layers have substantially the same thickness d Co and all said platinum layers have substantially the same thickness d Pt , d Co is less than about 12 A (1.2 nm), d Pt is less than about 24 A (2.4 nm) and the total thickness of the multilayer film is less than about 750 A (75 nm).
Claim 11
Dependent Claim 33 words
The process of claim 9 wherein d Co is from about 2 to about 5 A (0.2 to about 0.5 nm) and d Pt /d Co is from about 1 to about 5.
Claim 12
Dependent Claim 11 words
The process of claim 10 wherein the sputter gas is krypton.
Claim 13
Dependent Claim 11 words
The process of claim 10 wherein the sputter gas is xenon.

References Cited (Backward Citations)

US3399129A Cited
US4529651A Cited
US4766034A Cited
US4587176A Cited
JPS61242321A Cited
EP0304873A1 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-11-25 1995-05-27 1995-11-26 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-11-25 1999-05-27 1999-11-26 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-11-25 2003-05-27 2003-11-26 $7700.00 Window Closed / Lapsed

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