US5066561A
Expired / Lapsed
US
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Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
Assignee: EMD Performance Materials Corp
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Filing: 1990-03-28
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Granted: 1991-11-19
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Expires: 2010-03-28
Abstract
Abstract The invention provides a method for producing a positive working photosensitive element with increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a propylene glycol alkyl ether acetate on a substrate, drying, exposing to imaging energy and developing.
Inventors
- 👤 Thomas R. Pampalone
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 05:28
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
156 words
A method of producing and using a photoresist which consists essentially of: a ) forming a photosensitive composition containing a mixture of (i) at least one novolak resin, (ii) at least one o-quinone diazide photosensitizer, said resin and said photosensitizer being present at a relative proportion of from about 15 to 99 parts by weight resin and about 1 to 85 parts by weight photosensitizer based on the weight of the solids portion of the photosensitive composition, and (iii) a solvent composition consisting essentially of a propylene glycol alkyl ether acetate present in an amount of from about 40% to about 90% by weight of the overall photosensitive composition; b) coating said composition on a substrate; c) drying said composition such that it is substantially non-tacky but contains residual solvent to form a photoresist composition; d) imagewise exposing the dried photoresist composition to actinic radiation; and e) removing the exposed areas with an aqueous alkaline developer.
Claim 2
Independent Claim
156 words
A method of producing and using a photoresist which consists essentially of: a ) forming a photosensitive composition containing a mixture of (i) at least one novolak resin, (ii) at least one o-quinone diazide photosensitizer, said resin and said photosensitizer being present at a relative proportion of from about 15 to 99 parts by weight resin and about 1 to 85 parts by weight photosensitizer based on the weight of the solids portion of the photosensitive composition, and (iii) a solvent composition consisting essentially of a propylene glycol alkyl ether acetate present in an amount of from about 40% to about 90% by weight of the overall photosensitive composition; b) coating said composition on a substrate; c) drying said composition such that it is substantially non-tacky but contains residual solvent to form a photoresist composition; d) imagewise exposing the dried photoresist composition to actinic radiation; and e) removing the exposed areas with an aqueous alkaline developer.
Claim 3
Dependent Claim
15 words
The method of claim 1 wherein said acetate component is propylene glycol methyl ether acetate.
Claim 4
Dependent Claim
26 words
The method of claim 2 wherein said acetate is present in said photosensitive composition in an amount of from about 60% to about 83% by weight.
Claim 5
Dependent Claim
32 words
The method of claim 1 wherein said acetate is present in said solvent composition in an amount of about 100% based on the weight of the solvents portion of the photosensitive composition.
Claim 6
Dependent Claim
27 words
The method of claim 1 wherein said resin is present in an amount of from about 5% to about 40% based on the weight of said composition.
Claim 7
Dependent Claim
32 words
The method of claim 1 wherein the photosensitive composition further comprises one or more additives selected from the group consisting of colorants, anti-striation agents, plasticizers, adhesion promoters, speed enhancers, solvents and surfactants.
Claim 8
Dependent Claim
31 words
The method of claim 1 wherein said diazide is present in an amount of from about 10% to about 50% based on the weight of the solids portion of the composition.
Claim 9
Dependent Claim
31 words
The method of claim 7 wherein said diazide is present in an amount of from about 15% to about 35% based on the weight of the solids portion of the composition.
Claim 10
Dependent Claim
31 words
The method of claim 1 wherein said diazide is present in an amount of from about 50% to about 90% based on the weight of the solids portion of the composition.
Claim 11
Dependent Claim
31 words
The method of claim 1 wherein said diazide is present in an amount of from about 65% to about 85% based on the weight of the solids portion of the composition.
Claim 12
Dependent Claim
34 words
The method of claim 1 wherein said diazide component comprises one or more compounds selected from the group consisting of diazo sulfonyl-chloride reaction products with hydroxy or polyhydroxy aryl compounds, aryl amines or polyamines.
Claim 13
Dependent Claim
12 words
The method of claim 1 wherein said resin is a novolak resin.
Claim 14
Dependent Claim
30 words
The method of claim 12 wherein said photosensitive composition is dried to contain said residual solvent in an amount of 5% to 20% by weight based on the dried coating.
Claim 15
Dependent Claim
30 words
The method of claim 13 wherein said photosensitive composition is dried to contain said residual solvent in an amount of 8% to 12% by weight based on the dried coating.
Claim 16
Dependent Claim
23 words
The method of claim 1 wherein said drying is conducted at a temperature within the range of about 50° C. to 105° C.
Claim 17
Dependent Claim
37 words
The method of claim 1 wherein said substrate comprises one or more components selected from the group consisting of silicon, aluminum, polymeric resins, silicon dioxide, doped silicon dioxide, silicon nitride, tantalum, copper, polysilicon, ceramics and aluminum/copper mixtures.
Claim 18
Dependent Claim
17 words
The method of claim 1 wherein said photosensitizer is the condensation product of naphthoquinone-(1,2)-diazide-(2)5-sulfonyl chloride with trihydroxybenzophenone.
Claim 19
Dependent Claim
34 words
The method of claim 1 wherein said acetate is present in said solvent composition in an amount of at least about 50% based on the weight of the solvents portion of said photoresist-working composition.
Claim 20
Dependent Claim
30 words
The method of claim 1 wherein said residual solvent contains an amount of said propylene glycol alkyl ether acetate sufficient to increase the effective photospeed of the dried photoresist composition.
Claim 21
Dependent Claim
33 words
The method for producing and using a photoresist according to claim 1, wherein said residual solvent is present in an amount from about 1% to about 30% based on the dried coating weight.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-11-18 | 1995-05-20 | 1995-11-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-11-18 | 1999-05-20 | 1999-11-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-11-18 | 2003-05-20 | 2003-11-19 | $7700.00 | Window Closed / Lapsed |