Process of forming self-aligned interconnects for semiconductor devices

Claim 2

A process for forming an interconnect in a semiconductor device formed in a major surface of a semiconductor material and for aligning said interconnect to elements of said device, said process comprising: (a) delineating an active area within which individual devices are made by forming an oxide region in said substrate; (b) forming a multi-layer structure on said semiconductor surface, said multi-layer structure including at least one etch-stop layer; (c) using a slot mask in conjunction with a resist layer formed on said multi-layer structure to lithographically define a plurality of slots corresponding to various elements of said devices, thereby self-aligning said elements with each other; (d) etching portions of said multi-layer structure corresponding to said slots, stopping at said etch-stop layer; (e) stripping said resist layer; (f) using an active mask in conjunction with another resist layer formed on said multi-layer structure to define only active areas encompassing a group of said slot associated with an individual device; (g) removing any remaining portions of said multi-layer structure in said slots; and (h) filling said slots with a conducting material to form conducting plugs.

Claim 3

The process of claim 1 wherein said multi-layer structure comprises: (a) a first layer consisting essentially of a field oxide; (b) a second layer consisting essentially of an etch-stop material having a significantly different etch rate than said field oxide; (c) a third layer consisting essentially of an oxide; and (d) a fourth layer consisting essentially of polysilicon or silicon nitride.

Claim 4

The process of claim 2 wherein said conducting material comprises polysilicon or tungsten.

Claim 5

The process of claim 3 further including implanting dopant species into said polysilicon-filled slots to connect said interconnect to said active area.

Claim 6

The process of claim 3 further including doping at least some of said polysilicon plugs to change the conductivity thereof.

Claim 7

The process of claim 2 further including planarizing said interconnect to the surface of said multi-layer structure.

Claim 8

A process for forming a self-aligned planarized interconnect in a field effect transistor formed in a major surface of a semiconductor, and wherein source, gate and drain elements are to be formed, comprising: (a) delineating an active area within which individual devices are made by forming an oxide region in said substrate; (b) forming a multi-layer structure on said semiconductor surface, said multi-layer structure including at least one etch-stop layer; (c) using a slot mask in conjunction with a resist layer formed on said multi-layer structure to lithographically define a plurality of slots corresponding to various elements of said devices, thereby self-aligning said elements with each other; (d) etching portions of said multi-layer structure corresponding to said slots, stopping at said etch-stop layer; (e) stripping said resist layer; (f) using an active mask in conjunction with another resist layer formed on said multi-layer structure to define only said active area encompassing a group of said slot associated with an individual device; (g) removing any remaining portions of said etch-stop layer in said slots, along with said field oxide therein; (h) forming a thin oxide on the exposed portions of said semiconductor in said slots associated with said gates of said device; (i) filling said slots with conducting material to form conducting plugs and forming N and P regions in said substrate underlying said slots; (j) implanting dopant species into said conducting slots associated with said sources and drains of said device; (k) doping at least some of said conducting plugs to change the conductivity thereof.

Claim 9

A process for forming a self-aligned planarized interconnect in a field effect transistor formed in a major surface of a semiconductor, and wherein source, gate and drain elements are to be formed, comprising: (a) delineating an active area within which individual devices are made by forming an oxide region in said substrate; (b) forming a multi-layer structure on said semiconductor surface, said multi-layer structure including at least one etch-stop layer; (c) using a slot mask in conjunction with a resist layer formed on said multi-layer structure to lithographically define a plurality of slots corresponding to various elements of said devices, thereby self-aligning said elements with each other; (d) etching portions of said multi-layer structure corresponding to said slots, stopping at said etch-stop layer; (e) stripping said resist layer; (f) using an active mask in conjunction with another resist layer formed on said multi-layer structure to define only said active area encompassing a group of said slot associated with an individual device; (g) removing any remaining portions of said etch-stop layer in said slots, along with said field oxide therein; (h) forming a thin oxide on the exposed portions of said semiconductor in said slots associated with said gates of said device; (i) filling said slots with conducting material to form conducting plugs and forming N and P regions in said substrate underlying said slots; (j) implanting dopant species into said conducting slots associated with said sources and drains of said device; (k) doping at least some of said conducting plugs to change the conductivity thereof.

Claim 10

The process of claim 7 wherein said multi-layer structure comprises: (a) a first layer consisting essentially of a field oxide; (b) a second layer consisting essentially of an etch-stop material having a significantly different etch rate than said field oxide; (c) a third layer consisting essentially of an oxide; and (d) a fourth layer consisting essentially of a material having an etch rate significantly different than said field oxide.

Claim 11

The process of claim 8 wherein said fourth layer comprises a material selected from the group consisting of polysilicon or silicon nitride.

Claim 12

The process of claim 7 wherein said conducting material comprises a material selected from the group consisting of polysilicon and tungsten.

Claim 13

The process of claim 10 wherein said conducting material consists essentially of polysilicon and said slots are filled with said polysilicon and said N and P regions are formed in said substrate by implanting ions into said polysilicon in said slots and diffusing said implanted ions into said substrate regions.

Claim 14

The process of claim 7 wherein said conducting material consists essentially of tungsten and said N and P regions are formed in said substrate by implanting ions thereinto through said slots and said slots are then filled with said tungsten.

Claim 15

The process of claim 7 wherein after filling said slots with said conducting material, said conducting material is planarized to the surface of said multi-layer structure.

Claim 16

A process for forming a self-aligned planarized interconnect in a CMOS device wherein N-wells and P-wells are formed in a major surface of a semiconductor, and wherein source, gate and drain elements are to be formed, comprising: (a) delineating an active area within which individual devices are made by forming an oxide region in said substrate; (b) forming a multi-layer structure on said semiconductor surface, said multi-layer structure comprising (1) a first layer consisting essentially of a field oxide, (2) a second layer consisting essentially of an etch-stop material having a significantly different etch rate than said field oxide, (3) a third layer consisting essentially of an oxide, and (4) a fourth layer consisting essentially of polysilicon or silicon nitride; (b) using a slot mask in conjunction with a resist layer formed on said multi-layer structure to lithographically define a plurality of slots corresponding to various elements of said devices, thereby self-aligning said elements with each other; (c) etching portions of said fourth and third corresponding to said slots, stopping at said etch-stop layer; (d) stripping said resist layer; (e) using an active mask in conjunction with another resist layer formed on said multi-layer structure to define only said active area encompassing a group of said slot associated with an individual device; (f) removing any remaining portions of said etch-stop layer in said slots, along with said field oxide therein; (g) forming a thin oxide on the exposed portions of said semiconductor in said slots associated with said gates of said device; (h) filling said slots with polysilicon to form polysilicon plugs and planarizing to the surface of said multi-layer structure; (i) implanting dopant species into said polysilicon-filled slots associated with said sources and drains of said device; (j) doping at least some of said polysilicon plugs to change the conductivity thereof.

Claim 17

A process for forming a self-aligned planarized interconnect in a CMOS device wherein N-wells and P-wells are formed in a major surface of a semiconductor, and wherein source, gate and drain elements are to be formed, comprising: (a) delineating an active area within which individual devices are made by forming an oxide region in said substrate; (b) forming a multi-layer structure on said semiconductor surface, said multi-layer structure comprising (1) a first layer consisting essentially of a field oxide, (2) a second layer consisting essentially of an etch-stop material having a significantly different etch rate than said field oxide, (3) a third layer consisting essentially of an oxide, and (4) a fourth layer consisting essentially of polysilicon or silicon nitride; (b) using a slot mask in conjunction with a resist layer formed on said multi-layer structure to lithographically define a plurality of slots corresponding to various elements of said devices, thereby self-aligning said elements with each other; (c) etching portions of said fourth and third corresponding to said slots, stopping at said etch-stop layer; (d) stripping said resist layer; (e) using an active mask in conjunction with another resist layer formed on said multi-layer structure to define only said active area encompassing a group of said slot associated with an individual device; (f) removing any remaining portions of said etch-stop layer in said slots, along with said field oxide therein; (g) forming a thin oxide on the exposed portions of said semiconductor in said slots associated with said gates of said device; (h) filling said slots with polysilicon to form polysilicon plugs and planarizing to the surface of said multi-layer structure; (i) implanting dopant species into said polysilicon-filled slots associated with said sources and drains of said device; (j) doping at least some of said polysilicon plugs to change the conductivity thereof.