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US5030295A Expired / Lapsed US ⏱️ 0.0 years remaining

Radiation resistant passivation of silicon solar cells

Assignee: Electric Power Research Institute
•
Filing: 1990-02-12
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Granted: 1991-07-09
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Expires: 2010-02-12
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Abstract

Abstract The interface of a silicon oxide passivation layer and a silicon substrate in a silicon solar cell is stabilized by covering the silicon oxide passivation layer with a layer of undoped or phosphorus doped polycrystalline silicon. A second layer of silicon oxide is formed by deposition on the surface of the phosphorus doped polycrystalline and enhances the anti-reflection characteristics of the composite structure.

Inventors

  • 👤 Richard M. Swanson
  • 👤 Jon-Yiew Gan
  • 👤 Peter E. Gruenbaum

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 03:14
CPC Classifications
H; H10; H10F; H10F10/00; H10F10/10; H10F10/11; H10F77/00; H10F77/30; H10F77/306; H10F77/311; H10F77/315; H10F77/80; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y10; Y10S; Y10S257/00; Y10S257/906; Y10S438/00; Y10S438/958

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 78 words
A silicon solar cell having improved stability when exposed to concentrated solar radiation, comprising: a body of silicon material having a major surface for receiving radiation, a plurality of p and n conductivity regions in said body for collecting electrons and holes created by impinging radiation, and a passivation layer on said major surface including a first layer of silicon oxide in contact with said body and a polycrystalline silicon layer on said first layer of silicon oxide.
Claim 2
Dependent Claim 78 words
A silicon solar cell having improved stability when exposed to concentrated solar radiation, comprising: a body of silicon material having a major surface for receiving radiation, a plurality of p and n conductivity regions in said body for collecting electrons and holes created by impinging radiation, and a passivation layer on said major surface including a first layer of silicon oxide in contact with said body and a polycrystalline silicon layer on said first layer of silicon oxide.
Claim 3
Dependent Claim 29 words
The silicon solar cell as defined by claim 1 wherein the thickness of said polycrystalline silicon layer is greater than the thickness of said first layer of silicon oxide.
Claim 4
Dependent Claim 26 words
The silicon solar cell as defined by claim 2 and further including a second layer of silicon oxide on the surface of said polycrystalline silicon layer.
Claim 5
Dependent Claim 55 words
The silicon solar cell as defined by claim 3 wherein the thickness of said first silicon oxide layer is on the order of 50 Angstroms, the thickness of said polycrystalline silicon layer is on the order of 300 Angstroms, and the thickness of said second silicon oxide layer is on the order of 1200 Angstroms.
Claim 6
Dependent Claim 35 words
The silicon solar cell as defined in claim 3 wherein said first silicon oxide layer is thermally grown, said polycrystalline silicon layer is vapor deposited, and said second layer of silicon oxide is vapor deposited.
Claim 7
Dependent Claim 18 words
The silicon solar cell as defined in claim 5 wherein said polycrystalline silicon layer is doped with phosphorus.
Claim 8
Dependent Claim 26 words
The silicon solar cell as defined in claim 6 wherein the dopant concentration of phosphorus is on the order of 3×10 19 atoms per cubic centimeter.
Claim 9
Independent Claim 46 words
A method of stabilizing a silicon oxide/silicon interface in a silicon solar cell comprising the steps of forming a doped polycrystalline silicon layer on said layer of silicon oxide, and forming a layer of silicon oxide material on the surface of said doped polycrystalline silicon layer.
Claim 10
Independent Claim 46 words
A method of stabilizing a silicon oxide/silicon interface in a silicon solar cell comprising the steps of forming a doped polycrystalline silicon layer on said layer of silicon oxide, and forming a layer of silicon oxide material on the surface of said doped polycrystalline silicon layer.

References Cited (Backward Citations)

US4234352A Cited
US4198246A Cited
US4375125A Cited
US4642414A Cited
US4778776A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-07-08 1995-01-07 1995-07-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-07-08 1999-01-07 1999-07-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-07-08 2003-01-07 2003-07-09 $7700.00 Window Closed / Lapsed

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