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Polycrystalline silicon ohmic contacts to group III-arsenide compound semiconductors

Assignee: Harris Corp
•
Filing: 1990-11-06
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Granted: 1991-06-25
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Expires: 2010-11-06
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Abstract

Abstract A polycrystalline silicon layer forms an Ohmic contact to a group III-arsenide compound semiconductor substrate by heating the substrate. The polysilicon contact out-diffuses silicon into the substrate to form an N++ region.

Inventors

  • 👤 William E. O'Mara, Jr.
  • 👤 Gregory A. Schrantz

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 08:31
CPC Classifications
H; H10; H10D; H10D64/00; H10D64/01; H10D64/011; H10D64/0116; H10D64/60; H10D64/62; H10P; H10P32/00; H10P32/10; H10P32/14; H10P32/17; H10P32/174; H10D62/00; H10D62/80; H10D62/85

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 64 words
A contact structure for group III-arsenide substrate comprising: a group III-arsenide substrate having a first region of a first impurity concentration; a contact region in said first region having silicon impurities of a greater impurity concentration than said first impurity concentration; and a polycrystalline silicon contact on a surface of said first region of said substrate forming an ohmic contact with said contact region.
Claim 2
Dependent Claim 64 words
A contact structure for group III-arsenide substrate comprising: a group III-arsenide substrate having a first region of a first impurity concentration; a contact region in said first region having silicon impurities of a greater impurity concentration than said first impurity concentration; and a polycrystalline silicon contact on a surface of said first region of said substrate forming an ohmic contact with said contact region.
Claim 3
Dependent Claim 17 words
A contact structure according to claim 1, wherein said first region is of an N conductivity type.
Claim 4
Dependent Claim 17 words
A contact structure according to claim 1, wherein said first region is of a P conductivity type.
Claim 5
Dependent Claim 35 words
A contact structure according to claim 1 wherein said group III-arsenide substrate is selected from the group of binary or ternary compounds including gallium arsenide, aluminum gallium arsenide, gallium indium arsenide, and aluminum indium arsenide.

References Cited (Backward Citations)

JPS56162873A Cited
EP0074541A2 Cited
US4519127A Cited
US4908691A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-06-24 1994-12-24 1995-06-25 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-06-24 1998-12-24 1999-06-25 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-06-24 2002-12-24 2003-06-25 $7700.00 Window Closed / Lapsed

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