Microwave enhanced CVD method for depositing diamond

Claim 2

A cyclotron resonance chemical vapor deposition method of forming a diamond or diamond-like carbon material on a substrate comprising: inputting at least one reactive gas comprising carbon into a reaction chamber; emitting a microwave into said reaction chamber at a predetermined frequency and in a predetermined direction; establishing a magnetic field in said reaction chamber where the direction of the magnetic field is substantially parallel to the direction of the microwave and the strength of the magnetic field is such as to cause cyclotron resonance at a predetermined position in the reaction chamber; exhausting the reaction chamber to establish in the chamber a pressure range of 0.1 to 300 Torr; and holding the substrate approximately at said predetermined, cyclotron resonance position in the reaction chamber; and depositing said diamond-like carbon material on a surface of the substrate.

Claim 3

A method as in claim 1 where said cyclotron resonance is mixed cyclotron resonance.

Claim 4

A method as in claim 1 where said reactive gas includes gas selected from the group consisting of C 2 H 2 , C 2 H 4 , CH 3 OH, C 2 H 5 OH, and CH 4 .

Claim 5

A method as in claim 1 wherein said substrate is disposed where the strength of said magnetic field is 875±185 Gauss.

Claim 6

A method as in claim 1 where the frequency of said microwave energy is 2.45 GHz.

Claim 7

A method as in claim 1 where said reactive gas includes an additive gas comprising nitrogen.

Claim 8

A method as in claim 6 where the amount of said nitrogen in said diamond or diamond-like carbon product is 0.01-1.0 weight percent.

Claim 9

A cyclotron resonance chemical vapor deposition method of forming a diamond or diamond-like carbon material on a substrate comprising the steps of: inputting at least one reactive gas comprising carbon into a reaction chamber; emitting a microwave into said reaction chamber at a predetermined frequency and in a predetermined direction; establishing a standing wave of said microwave in the reaction chamber; holding said substrate substantially at a position where said standing wave attains a maximum value; establishing a magnetic field in said reaction chamber where said direction of the magnetic field is is substantially parallel to the direction of the microwave and the strength of the magnetic field is such as to cause cyclotron resonance at approximately the position where the substrate is held in the reaction chamber; exhausting the reaction chamber to establish in the chamber a pressure range of 0.1 to 300 Torr; and depositing said diamond-like carbon material on a surface of the substrate.

Claim 10

A cyclotron resonance chemical vapor deposition method of forming a diamond or diamond-like carbon material on a substrate comprising the steps of: inputting at least one reactive gas comprising carbon into a reaction chamber; emitting a microwave into said reaction chamber at a predetermined frequency and in a predetermined direction; establishing a standing wave of said microwave in the reaction chamber; holding said substrate substantially at a position where said standing wave attains a maximum value; establishing a magnetic field in said reaction chamber where said direction of the magnetic field is is substantially parallel to the direction of the microwave and the strength of the magnetic field is such as to cause cyclotron resonance at approximately the position where the substrate is held in the reaction chamber; exhausting the reaction chamber to establish in the chamber a pressure range of 0.1 to 300 Torr; and depositing said diamond-like carbon material on a surface of the substrate.

Claim 11

A method as in claim 8 where said cyclotron resonance is mixed cyclotron resonance.