High power frequency semiconductor device with improved thermal resistance

Claim 2

A high power and high frequency semiconductor device forming a bipolar transistor, comprising: a semiconductor substrate; and unit cells, operatively connected in parallel and formed in a zigzag pattern in said semiconductor substrate, said unit cells forming base regions of said bipolar transistor and each of said unit cells comprising elemental cells operatively connected in parallel in a substantially identical pattern to form a shape which is substantially identical for each of said unit cells, said elemental cells corresponding to emitter regions of said bipolar transistor.

Claim 3

A semiconductor device as recited in claim 1, wherein said unit cells are arranged in at east two lines, each line having a line axis and each unit cell having an alignment axis perpendicular to the line axis, the alignment axes of said unit cells in adjacent lines being offset by one-half pitch.

Claim 4

A semiconductor device as recited in claim 2, wherein the shape of each of said unit cell is one of square, a rectangle, a triangle, a hexagon and an octogon.

Claim 5

A semiconductor device as recited in claim 2, wherein the shape of each of said unit cells is a rectangle having a length of 250 μm and a width of 150 μm, and wherein said unit cells are separated by 100 μm along the line axis and between adjacent lines of said unit cells.

Claim 6

A semiconductor device as recited in claim 2, wherein said unit cells comprise elemental cells, operatively connected in parallel and formed in said unit cells in a substantially identical pattern.

Claim 7

A semiconductor device as recited in claim 1, wherein the emitter regions are formed by a mesh emitter.

Claim 8

A semiconductor device as recited in claim 1, further comprising a heat sink mounted on said semiconductor substrate.

Claim 9

A semiconductor device as recited in claim 1, wherein the shape of said unit cells is a polygon.

Claim 10

A high power and high frequency semiconductor device, comprising: a semiconductor substrate; a first unit cell line comprising first unit cells formed in said semiconductor substrate at a constant pitch along said first unit cell line; and a second unit cell line parallel to said first unit cell line, comprising second unit cells formed in said semiconductor substrate at the constant pitch along said second unit cell line and offset by one-half of the constant pitch from said first unit cells, said first and second unit cells operatively connected in parallel and each of said first and second unit cells comprising elemental cells operatively connected in parallel in a substantially identical pattern to form a shape which is substantially identical for each of said first and second unit cells.

Claim 11

A high power and high frequency semiconductor device, comprising: a semiconductor substrate; a first unit cell line comprising first unit cells formed in said semiconductor substrate at a constant pitch along said first unit cell line; and a second unit cell line parallel to said first unit cell line, comprising second unit cells formed in said semiconductor substrate at the constant pitch along said second unit cell line and offset by one-half of the constant pitch from said first unit cells, said first and second unit cells operatively connected in parallel and each of said first and second unit cells comprising elemental cells operatively connected in parallel in a substantially identical pattern to form a shape which is substantially identical for each of said first and second unit cells.

Claim 12

A high power and high frequency semiconductor device as recited in claim 9, wherein the first and second unit cell lines are arranged along substantially parallel line axes separated by a spacing distance, and wherein the shape of said first and second unit cells has a maximum first dimension, measured along one of the line axes of the first and second unit cell lines, approximately three-fifths of the constant pitch and a maximum second dimension, measured along alignment axes perpendicular to the line axes, approximately five-sevenths of the spacing distance.

Claim 13

A high power and high frequency semiconductor device forming a bipolar transistor, comprising: a semiconductor substrate; a common collector region formed on a surface of said semiconductor substrate, said common collector region having a first conductivity type; a plurality of base inland regions, operatively connected in parallel, having a second conductivity type different from the first conductivity type, each of said base inland regions being formed with a polygon shape on the surface of said semiconductor substrate in said common collector region, said base inland regions begin arrange din first and second groups, said base inland regions in the first group being formed along a first group line at a constant pitch of 250 micrometers, said base inland regions in the second group being formed at the same constant pitch along a second group line substantially parallel to the first group line at a distance of 350 micrometers therefrom, each of said base inland regions having a width of 150 micrometers measured parallel to the first group line nd a length of 250 micrometers measured perpendicular to the first group line, said base inland regions in the first group having first sides facing the second group with first alignment axes bisecting the first sides, said base inland regions in the second group have second sides facing the first group with second alignment axes bisecting the second sides, the first and second alignment axes being offset with respect to each other by 125 micrometers; and a plurality of emitter regions, operatively connected in parallel, having the first conductivity type, at least one of said emitter regions being formed in each of said base inland regions, each of said emitter regions having a substantially identical pattern.

Claim 14

A high power and high frequency semiconductor device forming a bipolar transistor, comprising: a semiconductor substrate; a common collector region formed on a surface of said semiconductor substrate, said common collector region having a first conductivity type; a plurality of base inland regions, operatively connected in parallel, having a second conductivity type different from the first conductivity type, each of said base inland regions being formed with a polygon shape on the surface of said semiconductor substrate in said common collector region, said base inland regions begin arrange din first and second groups, said base inland regions in the first group being formed along a first group line at a constant pitch of 250 micrometers, said base inland regions in the second group being formed at the same constant pitch along a second group line substantially parallel to the first group line at a distance of 350 micrometers therefrom, each of said base inland regions having a width of 150 micrometers measured parallel to the first group line nd a length of 250 micrometers measured perpendicular to the first group line, said base inland regions in the first group having first sides facing the second group with first alignment axes bisecting the first sides, said base inland regions in the second group have second sides facing the first group with second alignment axes bisecting the second sides, the first and second alignment axes being offset with respect to each other by 125 micrometers; and a plurality of emitter regions, operatively connected in parallel, having the first conductivity type, at least one of said emitter regions being formed in each of said base inland regions, each of said emitter regions having a substantially identical pattern.

Claim 15

A semiconductor device as recited in claim 11, wherein the polygon shape of each of said base inland regions is one of a rectangle, a triangle, a hexagon and an octagon.

Claim 16

A semiconductor device as recited in claim 11, wherein each of said emitter regions comprises a mesh emitter.

Claim 17

A high power and high frequency semiconductor device forming a bipolar transistor, comprising: a common collector region having a first conductivity type; a plurality of base regions, having a second conductivity type opposite to the first conductivity type, formed separately on a surface of said common collector region with a constant pitch along parallel row-lines, the rowlines being equally spaced apart by a separation distance, each of said base regions having a closed boundary surrounded by said common collector region, said base regions on even-numbered row-lines being offset along the row-lines by one-half of the constant pitch with reference to said base regions on odd-numbered row-lines, the separation distance and the constant pitch being selected to reduce thermal resistance of the bipolar transistor during operation; and emitter regions having the first conductivity type and formed in each of said base regions.

Claim 18

A high power and high frequency semiconductor device forming a bipolar transistor, comprising: a common collector region having a first conductivity type; a plurality of base regions, having a second conductivity type opposite to the first conductivity type, formed separately on a surface of said common collector region with a constant pitch along parallel row-lines, the rowlines being equally spaced apart by a separation distance, each of said base regions having a closed boundary surrounded by said common collector region, said base regions on even-numbered row-lines being offset along the row-lines by one-half of the constant pitch with reference to said base regions on odd-numbered row-lines, the separation distance and the constant pitch being selected to reduce thermal resistance of the bipolar transistor during operation; and emitter regions having the first conductivity type and formed in each of said base regions.

Claim 19

A high power and high frequency semiconductor device according to claim 14, wherein each of said base regions has a polygon shape with at least one side of said polygon shape parallel to the row-lines.

Claim 20

A high power and high frequency semiconductor device according to claim 15, wherein the polygon shape is one of a rectangular, a square, and a hexagon.

Claim 21

A high power and high frequency semiconductor device according to claim 16, wherein the polygon shape is a rectangle with first and second sides perpendicular to the row-lines, 250 micrometers long and third and fourth side parallel to the row-lines, 150 micrometers long, and wherein the constant pitch is 250 micrometers and the separation distance is 350 micrometers.

Claim 22

A high power and high frequency semiconductor device forming a bipolar transistor, comprising: a semiconductor substrate; a common collector region formed on a surface of said semiconductor substrate, said common collector region having a first conductivity type; a plurality of base inland regions, operatively connected in parallel, having a second conductivity type different from the first conductivity type, each of said base inland regions being formed with a polygon shape on the surface of said semiconductor substrate in said common collector region, said base inland regions being arranged in first and second groups, said base inland regions in the first group being formed along a first group line at a constant pitch, said base inland regions in the second group being formed at the same constant pitch along a second group line substantially parallel to the first group line at a predetermined distance therefrom, said base inland regions in the first group having first sides facing the second group with first alignment axes bisecting the first sides, said base inland regions in the second group having second sides facing the first group with second alignment axes bisecting the second sides, the first and second alignment axes being offset with respect to each other; and a plurality of emitter regions, operatively connected in parallel, having the first conductivity type, at least one of said emitter regions being formed in each of said base inland regions, each of said emitter regions having a substantially identical pattern.

Claim 23

A high power and high frequency semiconductor device forming a bipolar transistor, comprising: a semiconductor substrate; a common collector region formed on a surface of said semiconductor substrate, said common collector region having a first conductivity type; a plurality of base inland regions, operatively connected in parallel, having a second conductivity type different from the first conductivity type, each of said base inland regions being formed with a polygon shape on the surface of said semiconductor substrate in said common collector region, said base inland regions being arranged in first and second groups, said base inland regions in the first group being formed along a first group line at a constant pitch, said base inland regions in the second group being formed at the same constant pitch along a second group line substantially parallel to the first group line at a predetermined distance therefrom, said base inland regions in the first group having first sides facing the second group with first alignment axes bisecting the first sides, said base inland regions in the second group having second sides facing the first group with second alignment axes bisecting the second sides, the first and second alignment axes being offset with respect to each other; and a plurality of emitter regions, operatively connected in parallel, having the first conductivity type, at least one of said emitter regions being formed in each of said base inland regions, each of said emitter regions having a substantially identical pattern.

Claim 24

A semiconductor device as recited in claim 18, wherein each of said emitter regions comprises a mesh emitter.