Particle source for a reactive ion beam etching or plasma deposition installation

Claim 1

Particle source, in particular for a reactive ion beam etching or plasma deposition installation, with (a) a container (26) of a non-ferromagnetic and non-conducting material for a gas or gas mixture or plasma which has an upper face (27) and a side wall (28) and which has opposite the upper face (27) an aperture from which particles can emerge from the container; (b) a feed (55) for a gas or a gas mixture into the container; (c) an arrangement (29) for the feeding of electromagnetic waves, preferably microwaves, which adjoins the upper face (27) of the container; (d) at least one magnetic field generator which is configured outside of the container and which contains at least one north pole and one south pole, with the north and south pole being directed toward the container in such a manner that a curved magnetic field between north and south pole forms which projects into the interior of the container, characterized in that (e) the arrangement for the feeding of electromagnetic waves is a flared radiator (29) whose widest flare opening corresponds essentially to the area of the upper face (27) of the container; (f) the side wall (28) of the container (26) is surrounded by an electrically conducting but not ferromagnetic hollow body (90); (g) the magnetic field generator (32, 33) is configured on the outside of the hollow body (90) and extends essentially from the aperture of the container (26) to the widest flare opening of the flared radiator (29).