Method for erosion detection of a sputtering target and target arrangement

Claim 3

The method according to claim 1, further providing said material discontinuity by a material interface of target material and a material which is compatible with the sputtering process, not to contaminate said sputtering process as erosion reaches said compatible material.

Claim 4

The method according to claim 1, whereby said material discontinuity is provided by material interface between target material and gas.

Claim 5

The method according to claim 1, wherein heat development is monitored as said physical value and a predetermined change of said developed heat is detected as said discontinuity of said steadily changing physical value.

Claim 6

The method according to claim 1, further providing said material discontinuity by a material interface of target material and a gas within a compartment and placing said sensor for monitoring within said compartment.

Claim 7

The method according to claim 5, further placing said sensor within said compartment remote from an area of said compartment where said erosion first penetrates said material discontinuity formed by target material bordering said compartment and material within said compartment.

Claim 8

The method according to claim 1, further comprising the steps of forming said signal substantially according to time derivation of said physical value and detecting said discontinuity of said steadily changing physical value by comprising said time derivation with a predetermined reference value.

Claim 9

The method according to claim 1, wherein said physical value is selected to be one of heat, pressure, light and the occurrence of charged particles.

Claim 10

A target arrangement for detecting a predetermined depth of erosion within a target of a sputtering source for cathode sputtering process, comprising: sensor means for monitoring a physical value, said physical value steadily changing as a function of depth or erosion of said target, said sensor means outputting a signal corresponding to said physical value monitored; a material interface providing a discontinuity of material, said discontinuity of material generating a discontinuity in said steadily changing physical value upon said erosion reaching said material discontinuity; and detection means connected to an output of said sensor means for detecting a discontinuity of the rate of change said output signal with respect to time corresponding to said discontinuity of said physical value upon said erosion reaching said material discontinuity, the occurrence of said discontinuity of said physical value being substantially independent from the steady change of said physical value as said erosion approaches said material interface.

Claim 11

A target arrangement for detecting a predetermined depth of erosion within a target of a sputtering source for cathode sputtering process, comprising: sensor means for monitoring a physical value, said physical value steadily changing as a function of depth or erosion of said target, said sensor means outputting a signal corresponding to said physical value monitored; a material interface providing a discontinuity of material, said discontinuity of material generating a discontinuity in said steadily changing physical value upon said erosion reaching said material discontinuity; and detection means connected to an output of said sensor means for detecting a discontinuity of the rate of change said output signal with respect to time corresponding to said discontinuity of said physical value upon said erosion reaching said material discontinuity, the occurrence of said discontinuity of said physical value being substantially independent from the steady change of said physical value as said erosion approaches said material interface.

Claim 12

The arrangement according to claim 9, wherein said discontinuity of material is formed with material compatible with the sputtering process.

Claim 13

The arrangement according to claim 9, wherein said interface is formed by a target material and gas.

Claim 14

The arrangement according to claim 9, wherein said sensor means is at least one of a heat sensor, a pressure sensor, an optical sensor, an electric charge sensor, a particle sensor.

Claim 15

The arrangement according to claim 9, wherein said sensor means includes a measuring surface made of target material.

Claim 16

The arrangement according to claim 9, wherein said interface is formed by a target material and gas, said gas being provided within at least one compartment or recess within said target material.

Claim 17

The arrangement according to claim 14, further comprising at least two compartments, arranged in at least one of staggered in depth beyond a virgin surface of a target and of disposed along and beyond said surface.

Claim 18

The arrangement according to claim 9, wherein said sensor means generates an output signal proportional to time derivation of said physical value.

Claim 19

The arrangement according to claim 16, wherein said output signal is led to comparator means, said comparator means being connected to a reference signal source.