Erasable programmable read only memory device improved in operation speed and in the amount of read out current

Claim 2

An erasable programmable read only memory device fabricated on a semiconductor substrate of a first conductivity type and including a plurality of memory cells arranged in rows and columns, a plurality of word lines associated with the rows of the memory cells, respectively, and a plurality of digit line pairs respectively associated with the columns of the memory cells, each of said digit line pairs consisting of a first digit line for a reading out operation and a second digit line for a write-in operation, each memory cell comprising: (a) a series combination of a selecting transistor of an enhancement type and a reading out transistor of a depletion type coupled between said first digit line and a source of constant voltage level; and (b) a write-in transistor of the enhancement type coupled between said second digit line and said source of constant voltage level, in which a floating gate is shared between said reading out transistor and said write-in transistor, and in which a control gate is coupled to one of said word lines and shared between said selecting transistor, said reading out transistor and said write-in transistor.

Claim 3

An erasable programmable read only memory device as set forth in claim 1, in which said control gate is supplied with a control signal swinging its voltage level within a voltage range.

Claim 4

An erasable programmable read only memory device as set forth in claim 2, in which said write-in transistor has a channel region with a second threshold voltage level out of said voltage range.

Claim 5

An erasable programmable read only memory device as set forth in claim 3, in which said first conductivity type is of the p-type.

Claim 6

An erasable programmable read only memory device as set forth in claim 4, in which said control signal goes up to about 1.5 volt for said reading out operation.

Claim 7

An erasable programmable read only memory device as set forth in claim 5, in which said first threshold voltage level is about 0.5 volts.

Claim 8

An erasable programmable read only memory device as set forth in claim 6, in which said reading out transistor allows a read out current on the order of 200 microampere in the presence of said floating gate without any electrons trapped therein, and in which said reading out transistor suppresses the read out current to about 10 microampere in the presence of said floating gate injected with hot electrons.

Claim 9

An erasable programmable read only memory cell fabricated on a semiconductor substrate of a first conductivity type, comprising: (a) a first impurity region of a second conductivity type formed in said semiconductor substrate and serving as a common source region of a write-in transistor and a reading out transistor, said second conductivity type being opposite to said first conductivity type; (b) a second impurity region of said second conductivity type formed in said semiconductor substrate in a spacing relationship to said first impurity region and serving as a drain region of a selecting transistor, said second impurity region being coupled to a first digit line used for a reading out operation; (c) a first channel region of said second conductivity type contiguous to said first impurity region and serving as a channel region of said reading out transistor; (d) a second channel region of said first conductivity type located between said first channel and said second impurity region and serving as a channel region of said selecting transistor; (e) a third impurity region of said second conductivity type formed in said semiconductor substrate in a spacing relationship to said first impurity region and serving as a drain region of said write-in transistor, said third impurity region being coupled to a second digit line for a write-in operation; (f) a third channel region of said first conductivity type located between said first and third impurity regions and serving as a channel region of said write-in transistor; (g) first, second and third gate insulating films covering said first, second and third channel regions, respectively; (h) a floating gate formed on said first and third gate insulating films and located over said first and third channel regions; (i) an inter-gate insulating film covering said floating gate; and (j) a control gate having a first portion formed on said inter-gate insulating film for being overlapped with said floating gate and a second portion formed on said second gate insulating film for being located over said second channel region.

Claim 10

An erasable programmable read only memory cell fabricated on a semiconductor substrate of a first conductivity type, comprising: (a) a first impurity region of a second conductivity type formed in said semiconductor substrate and serving as a common source region of a write-in transistor and a reading out transistor, said second conductivity type being opposite to said first conductivity type; (b) a second impurity region of said second conductivity type formed in said semiconductor substrate in a spacing relationship to said first impurity region and serving as a drain region of a selecting transistor, said second impurity region being coupled to a first digit line used for a reading out operation; (c) a first channel region of said second conductivity type contiguous to said first impurity region and serving as a channel region of said reading out transistor; (d) a second channel region of said first conductivity type located between said first channel and said second impurity region and serving as a channel region of said selecting transistor; (e) a third impurity region of said second conductivity type formed in said semiconductor substrate in a spacing relationship to said first impurity region and serving as a drain region of said write-in transistor, said third impurity region being coupled to a second digit line for a write-in operation; (f) a third channel region of said first conductivity type located between said first and third impurity regions and serving as a channel region of said write-in transistor; (g) first, second and third gate insulating films covering said first, second and third channel regions, respectively; (h) a floating gate formed on said first and third gate insulating films and located over said first and third channel regions; (i) an inter-gate insulating film covering said floating gate; and (j) a control gate having a first portion formed on said inter-gate insulating film for being overlapped with said floating gate and a second portion formed on said second gate insulating film for being located over said second channel region.

Claim 11

An erasable programmable read only memory cell as set forth in claim 8, in which said first channel region is smaller in impurity density than said first impurity region.

Claim 12

An erasable programmable read only memory cell as set forth in claim 9, in which said second impurity region is larger in impurity density than said first impurity region.

Claim 13

An erasable programmable read only memory cell as set forth in claim 10, in which said first conductivity type is of the p-type.

Claim 14

An erasable programmable read only memory cell as set forth in claim 11, in which said control gate further has a vertical portion interconnecting said first portion and said second portion.

Claim 15

An erasable programmable read only memory cell fabricated on a semiconductor substrate of a first conductivity type, comprising: (a) a first impurity region of a second conductivity type formed in said semiconductor substrate and serving as a common source region of a write-in transistor and a selecting transistor, said second conductivity type being opposite to said first conductivity type; (b) a second impurity region of said second conductivity type formed in said semiconductor substrate in a spacing relationship to said first impurity region and serving as a drain region of a reading out transistor, said second impurity region being coupled to a first digit line used for a reading out operation; (c) a first channel region of said second conductivity type contiguous to said second impurity region and serving as a channel region of said reading out transistor; (d) a second channel region of said first conductivity type located between said first channel region and said first impurity region and serving as a channel region of said selecting transistor; (e) a third impurity region of said second conductivity type formed in said semiconductor substrate in a spacing relationship to said first impurity region and serving as a drain region of said write-in transistor, said third impurity region being coupled to a second digit line for a write-in operation; (f) a third channel region of said first conductivity type located between said first and third impurity regions and serving as a channel region of said write-in transistor; (g) first, second and third gate insulating films covering said first, second and third channel regions, respectively; (h) a floating gate formed on said first and third gate insulating films and located over said first and third channel regions; (i) an inter-gate insulating film covering said floating gate; and (j) a control gate having a first portion formed on said inter-gate insulating film for being overlapped with said floating gate and a second portion formed on said second gate insulating film for being located over said second channel region.

Claim 16

An erasable programmable read only memory cell fabricated on a semiconductor substrate of a first conductivity type, comprising: (a) a first impurity region of a second conductivity type formed in said semiconductor substrate and serving as a common source region of a write-in transistor and a selecting transistor, said second conductivity type being opposite to said first conductivity type; (b) a second impurity region of said second conductivity type formed in said semiconductor substrate in a spacing relationship to said first impurity region and serving as a drain region of a reading out transistor, said second impurity region being coupled to a first digit line used for a reading out operation; (c) a first channel region of said second conductivity type contiguous to said second impurity region and serving as a channel region of said reading out transistor; (d) a second channel region of said first conductivity type located between said first channel region and said first impurity region and serving as a channel region of said selecting transistor; (e) a third impurity region of said second conductivity type formed in said semiconductor substrate in a spacing relationship to said first impurity region and serving as a drain region of said write-in transistor, said third impurity region being coupled to a second digit line for a write-in operation; (f) a third channel region of said first conductivity type located between said first and third impurity regions and serving as a channel region of said write-in transistor; (g) first, second and third gate insulating films covering said first, second and third channel regions, respectively; (h) a floating gate formed on said first and third gate insulating films and located over said first and third channel regions; (i) an inter-gate insulating film covering said floating gate; and (j) a control gate having a first portion formed on said inter-gate insulating film for being overlapped with said floating gate and a second portion formed on said second gate insulating film for being located over said second channel region.

Claim 17

An erasable programmable read only memory device as set forth in claim 2, in which said selecting transistor has a channel region with a first threshold voltage level within said voltage range.