US4982215A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and apparatus for creation of resist patterns by chemical development
Assignee: Toshiba Corp
•
Filing: 1989-08-30
•
Granted: 1991-01-01
•
Expires: 2009-08-30
Abstract
Abstract Creation of a resist pattern through chemical development of a resist layer which has been subjected to a patternmaking process such as selective exposure to electromagnetic rays or drawing with an electron beam. A workpiece, having the resist layer formed on an electroconductive surface of a substrate, is dipped in a bath of developing liquid at a first temperature. During the progress of the development the magnitude of an electric current flowing between the conductive surface of the workpiece and an electrode also immersed in the bath is constantly monitored in order to determine a moment at which the withdrawal of the developing liquid from the vessel is to be commenced. Upon commencement of the liquid withdrawl from the vessel, an additional amount of developing liquid is charged into the vessel at a second temperature lower than the first temperature. The progress of development during the liquid withdrawal is thus retarded in order to assure a sufficient length of time for the recovery of the used liquid for recirculation.
Inventors
- 👤 Yasuo Matsuoka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 20:04
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/3021; Y; Y10; Y10S; Y10S134/00; Y10S134/902
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
191 words
An apparatus for creating a resist pattern by chemically developing a resist layer which has been subjected to a patternmaking operation such as selective exposure or drawing, the apparatus comprises: p1 (a) developing vessel means for providing a bath of developed liquid in which a workpiece is to be dipped for development, the workpiece having a resist layer formed on an electroconductive surface; (b) an electrode immersed in the bath of developing liquid; (c) contact means for electrically connecting the electroconductive surface of the workpiece to the electrode in order to monitor the magnitude of an electric current flowing therebetween during the progress of development; (d) means for providing a recirculation path for the withdrawal of the used developing liquid from the developing vessel means and for the resupply of the used developing liquid into the developing vessel means; (e) heater means on the recirculation path for heating the developing liquid to a first predetermined temperature preparatory to supply into the developing vessel means; and (f) supply means for supplying the developing liquid into the developing vessel means at a second predetermined temperature which is lower than the first predetermined temperature.
Claim 2
Independent Claim
191 words
An apparatus for creating a resist pattern by chemically developing a resist layer which has been subjected to a patternmaking operation such as selective exposure or drawing, the apparatus comprises: p1 (a) developing vessel means for providing a bath of developed liquid in which a workpiece is to be dipped for development, the workpiece having a resist layer formed on an electroconductive surface; (b) an electrode immersed in the bath of developing liquid; (c) contact means for electrically connecting the electroconductive surface of the workpiece to the electrode in order to monitor the magnitude of an electric current flowing therebetween during the progress of development; (d) means for providing a recirculation path for the withdrawal of the used developing liquid from the developing vessel means and for the resupply of the used developing liquid into the developing vessel means; (e) heater means on the recirculation path for heating the developing liquid to a first predetermined temperature preparatory to supply into the developing vessel means; and (f) supply means for supplying the developing liquid into the developing vessel means at a second predetermined temperature which is lower than the first predetermined temperature.
Claim 3
Dependent Claim
52 words
The apparatus of claim 1 wherein the supply means comprises: (a) means for providing a branch path branching off from the recirculation path; and (b) cooler means on the branch path for cooling part of the recovered developing liquid to the second predetermined temperature preparatory to introduction into the developing vessel means.
Claim 4
Dependent Claim
92 words
The apparatus of claim 1 wherein the developing vessel means comprises: (a) an open-top developing vessel for receiving the developing liquid, the developing vessel having a bottom in which an opening is defined for communicating the developing vessel with the recirculation path; (b) a table disposed in the developing vessel for holding the workpiece thereon; and (c) means for moving at least either of the developing vessel and the table into and out of liquid-tight contact with each other for opening and closing the opening in the bottom of the developing vessel.
Claim 5
Dependent Claim
22 words
The apparatus of claim 3 further comprising drive means coupled to the table for rotating the same relative to the developing vessel.
References Cited (Backward Citations)
US4621037A
Cited
US4755844A
Cited
US4755442A
Cited
US4745422A
Cited
US4855775A
Cited
US4902608A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-12-31 | 1994-07-02 | 1995-01-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-12-31 | 1998-07-02 | 1999-01-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-12-31 | 2002-07-02 | 2003-01-01 | $7700.00 | Window Closed / Lapsed |