US4755844A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Automatic developing device
Assignee: Toshiba Corp
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Filing: 1986-04-14
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Granted: 1988-07-05
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Expires: 2006-04-14
Abstract
Abstract This invention is described an automatic developing device. The automatic developing device according to this invention is comprising: a stage on which the substrate to be treated is disposed after application of the resist and the patterning step is complete; a sealed frame capable of movement, that is used to sealingly cover the substrate disposed on this stage; a supply pipe for supplying developer into this sealed frame; a treatment vessel in which installs the stage, the sealing frame and the developer supply pipe; and at least one nozzle which sprays rinsing liquid provider in this treatment vessel.
Inventors
- 👤 Takashi Tsuchiya
- 👤 Yasuo Matsuoka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 11:34
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/3021; G03D; G03D5/00; G03D5/04; Y; Y10; Y10S; Y10S134/00; Y10S134/902
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
98 words
Automatic developing device comprising: a rotatable stage onto which a substrate to be treated is placed after application of resist and completion of patterning step; a movable sealing frame placed over said stage so as to sealingly cover said substrate placed on said stage; a supply pipe which supplies developer into said sealing frame; a treatment vessel within which said stage, said sealing frame and said developer supply pipe are installed; at least one nozzle provided in said treatment vessel for spraying rinsing liquid over said substrate; and aperture means for exhausting treatment liquid from said treatment vessel.
Claim 2
Dependent Claim
98 words
Automatic developing device comprising: a rotatable stage onto which a substrate to be treated is placed after application of resist and completion of patterning step; a movable sealing frame placed over said stage so as to sealingly cover said substrate placed on said stage; a supply pipe which supplies developer into said sealing frame; a treatment vessel within which said stage, said sealing frame and said developer supply pipe are installed; at least one nozzle provided in said treatment vessel for spraying rinsing liquid over said substrate; and aperture means for exhausting treatment liquid from said treatment vessel.
Claim 3
Dependent Claim
17 words
Automatic developing device according to claim 1, provided with means for recovering developer from said sealing frame.
Claim 4
Dependent Claim
41 words
Automatic developing device according to claim 1, provided with means, connected to said nozzle, for changing over supply of rinsing liquid and developer; and provided with a rinsing liquid supply pipe and a developer supply pipe connected to said changing means.
Claim 5
Dependent Claim
139 words
Automatic developing device comprising: a stage onto which a substrate to be treated is placed after application of resist and completion of patterning step; a movable sealing frame placed over said stage so as to sealingly cover said substrate placed on said stage; a supply pipe which supplies developer into said sealing frame; a treatment vessel within which said stage, said sealing frame and said developer supply pipe are installed; and at least one nozzle which sprays rinsing liquid provided in said treatment vessel, wherein a first electrode is provided on an inside wall of said sealing frame and a second electrode, insulated from said first electrode, is mounted in said sealing frame so that it is connected to said substrate, and means for detecting a development end-point using the change in voltage between said first and second electrodes.
Claim 6
Dependent Claim
139 words
Automatic developing device comprising: a stage onto which a substrate to be treated is placed after application of resist and completion of patterning step; a movable sealing frame placed over said stage so as to sealingly cover said substrate placed on said stage; a supply pipe which supplies developer into said sealing frame; a treatment vessel within which said stage, said sealing frame and said developer supply pipe are installed; and at least one nozzle which sprays rinsing liquid provided in said treatment vessel, wherein a first electrode is provided on an inside wall of said sealing frame and a second electrode, insulated from said first electrode, is mounted in said sealing frame so that it is connected to said substrate, and means for detecting a development end-point using the change in voltage between said first and second electrodes.
Claim 7
Dependent Claim
139 words
Automatic developing device comprising: a stage onto which a substrate to be treated is placed after application of resist and completion of patterning step; a movable sealing frame placed over said stage so as to sealingly cover said substrate placed on said stage; a supply pipe which supplies developer into said sealing frame; a treatment vessel within which said stage, said sealing frame and said developer supply pipe are installed; and at least one nozzle which sprays rinsing liquid provided in said treatment vessel, wherein said first electrode is provided on an inside wall of said sealing frame and a second electrode, insulated from said first electrode, is mounted in said sealing frame so that it is connected to said substrate, and means for detecting a development end-point using the change in current between said first and second electrodes.
Claim 8
Dependent Claim
139 words
Automatic developing device comprising: a stage onto which a substrate to be treated is placed after application of resist and completion of patterning step; a movable sealing frame placed over said stage so as to sealingly cover said substrate placed on said stage; a supply pipe which supplies developer into said sealing frame; a treatment vessel within which said stage, said sealing frame and said developer supply pipe are installed; and at least one nozzle which sprays rinsing liquid provided in said treatment vessel, wherein said first electrode is provided on an inside wall of said sealing frame and a second electrode, insulated from said first electrode, is mounted in said sealing frame so that it is connected to said substrate, and means for detecting a development end-point using the change in current between said first and second electrodes.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-07-05 | 1992-01-04 | 1992-07-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-07-05 | 1996-01-04 | 1996-07-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-07-05 | 2000-01-04 | 2000-07-05 | $7700.00 | Window Closed / Lapsed |