Semiconductor device having level shift diode

Claim 2

A diode having a stacked structure, comprising: a first layer of a first compound semiconductor having a first electron affinity; a second layer of a second compound semiconductor formed on said first layer and having a second electron affinity less than said first electron affinity, forming a first heterojunction between said first and second layers, said first and second compound semiconductors both comprising one of n-type and i-type semiconductor material; a third layer comprising said first compound semiconductor with the first electron affinity and formed on said second layer, forming a second heterojunction between said second and third layers; a first electrode formed on said first layer; and a second electrode formed on said third layer, said first, second and third layers forming a bi-directional diode between said first and second electrodes.

Claim 3

A diode as claimed in claim 1, wherein said diode provides a predetermined level shift quantity dependent upon said second compound semiconductor.

Claim 4

A diode as claimed in claim 1, wherein said first compound semiconductor comprises gallium arsenide (GaAs) and said second compound semiconductor comprises aluminum gallium arsenide (AlGaAs).

Claim 5

A diode as claimed in claim 1, wherein said first compound semiconductor comprises gallium arsenic (GaAs), and said second compound semiconductor comprises aluminum gallium arsenide (Al x Ga l-x As), and said diode has a level shift quantity determined by aluminum content x.

Claim 6

A diode having a stacked structure, comprising: a first layer of a first compound semiconductor having a first electron affinity; a second layer of a second compound semiconductor formed on said first layer and having a second electron affinity less than said first electron affinity, forming a first heterojunction between said first and second layers, said first and second compound semiconductors both comprising one of n-type and i-type semiconductor material; a third layer comprising said first compound semiconductor with the first electron affinity and formed on said second layer, forming a second heterojunction between said second and third layers; a fourth layer comprising said second compound semiconductor with the second electron affinity and formed on said third layer, forming a third heterojunction between said third and fourth layers; a first electrode formed on said first layer; and a second electrode formed on said fourth layer, said first, second, third and fourth layers forming at least one bidirectional diode between said first and second electrodes.

Claim 7

A diode having a stacked structure, comprising: a first layer of a first compound semiconductor having a first electron affinity; a second layer of a second compound semiconductor formed on said first layer and having a second electron affinity less than said first electron affinity, forming a first heterojunction between said first and second layers, said first and second compound semiconductors both comprising one of n-type and i-type semiconductor material; a third layer comprising said first compound semiconductor with the first electron affinity and formed on said second layer, forming a second heterojunction between said second and third layers; a fourth layer comprising said second compound semiconductor with the second electron affinity and formed on said third layer, forming a third heterojunction between said third and fourth layers; a first electrode formed on said first layer; and a second electrode formed on said fourth layer, said first, second, third and fourth layers forming at least one bidirectional diode between said first and second electrodes.

Claim 8

A diode as claimed in claim 5, wherein a composition of said second compound semiconductor is selected to provide said diode with a predetermined level shift quantity.

Claim 9

A diode as claimed in claim 5, wherein said first compound semiconductor comprises gallium arsenide (GaAs) and said second compound semiconductor comprises aluminum gallium arsenide (AlGaAs).

Claim 10

A diode as claimed in claim 5, wherein said first compound semiconductor comprises gallium arsenide (GaAs) and said second compound semiconductor comprises aluminum gallium arsenide (Al x Ga l-x As), and said diode has a level shift quantity determined by aluminum content x.

Claim 11

A bi-directional diode, comprising: a first stack structure formed on a substrate, including a first layer of a first compound semiconductor having a first electron affinity; a second layer of a second compound semiconductor formed on said first layer and having a second electron affinity less than said first electron affinity, forming a first heterojunction between said first and second layers, said first and second compound semiconductors both comprising one of n-type and i-type semiconductor material; and a third layer comprising said first compound semiconductor with the first electron affinity and formed on said second layer, forming a second heterojunction between said second and third layers; a second stack structure formed on the substrate adjacent to said first stack structure, including a fourth layer of said first compound semiconductor having the first electron affinity; a fifth layer of said second compound semiconductor formed on said fourth layer and having the second electron affinity, forming a third heterojunction between said fourth and fifth layers; and a sixth layer comprising said first compound semiconductor with the first electron affinity and formed on said fifth layer, forming a fourth heterojunction between said fifth and sixth layers; and isolation means for providing isolation between said first and second adjacent stack structures.

Claim 12

A bi-directional diode, comprising: a first stack structure formed on a substrate, including a first layer of a first compound semiconductor having a first electron affinity; a second layer of a second compound semiconductor formed on said first layer and having a second electron affinity less than said first electron affinity, forming a first heterojunction between said first and second layers, said first and second compound semiconductors both comprising one of n-type and i-type semiconductor material; and a third layer comprising said first compound semiconductor with the first electron affinity and formed on said second layer, forming a second heterojunction between said second and third layers; a second stack structure formed on the substrate adjacent to said first stack structure, including a fourth layer of said first compound semiconductor having the first electron affinity; a fifth layer of said second compound semiconductor formed on said fourth layer and having the second electron affinity, forming a third heterojunction between said fourth and fifth layers; and a sixth layer comprising said first compound semiconductor with the first electron affinity and formed on said fifth layer, forming a fourth heterojunction between said fifth and sixth layers; and isolation means for providing isolation between said first and second adjacent stack structures.

Claim 13

A bi-directional diode as claimed in claim 9, wherein said first adjacent stack structure further includes a seventh layer comprising said second compound semiconductor with the second election affinity and formed on said third layer, forming a fifth heterojunction between said third and seventh layers.

Claim 14

A bi-directional diode as claimed in claim 10, wherein said second adjacent stack structure further includes an eight layer comprising said second compound semiconductor with the second electron affinity and formed on said sixth layer, forming a sixth heterojunction between said sixth and eighth layers of said second adjacent stack structure.

Claim 15

A bi-directional diode, comprising: a first stack structure formed on a substrate, including: a first layer of a first compound semiconductor having a first electron affinity; a second layer of a second compound semiconductor formed on said first layer and having a second electron affinity less than said first electron affinity, forming a first heterojunction between said first and second layers, said first and second compound semiconductors both comprising p-type semiconductor material; and a third layer comprising said first compound semiconductor with the first electron affinity and formed on said second layer, forming a second heterojunction between said second and third layers; a second stack structure formed on the substrate adjacent to said first stack structure, including a fourth layer of said first compound semiconductor having the first electron affinity; a fifth layer of said second compound semiconductor formed on said fourth layer and having the second electron affinity, forming a third heterojunction between said fourth and fifth layers; and a sixth layer comprising said first compound semiconductor with the first electron affinity and formed on said fifth layer, forming a fourth heterojunction between said fifth and sixth layers a second stack structure formed on the substrate adjacent to said first stack structure, including a fourth layer of said first compound semiconductor having the first electron affinity; a fifth layer of said second compound semiconductor formed on said fourth layer and having the second electron affinity, forming a third heterojunction between said fourth and fifth layers; and a sixth layer comprising said first compound semiconductor with the first electron affinity and formed on said fifth layer, forming a fourth heterojunction between said fifth and sixth layers; and isolation means for providing isolation between said first and second adjacent stack structures.

Claim 16

A bi-directional diode, comprising: a first stack structure formed on a substrate, including: a first layer of a first compound semiconductor having a first electron affinity; a second layer of a second compound semiconductor formed on said first layer and having a second electron affinity less than said first electron affinity, forming a first heterojunction between said first and second layers, said first and second compound semiconductors both comprising p-type semiconductor material; and a third layer comprising said first compound semiconductor with the first electron affinity and formed on said second layer, forming a second heterojunction between said second and third layers; a second stack structure formed on the substrate adjacent to said first stack structure, including a fourth layer of said first compound semiconductor having the first electron affinity; a fifth layer of said second compound semiconductor formed on said fourth layer and having the second electron affinity, forming a third heterojunction between said fourth and fifth layers; and a sixth layer comprising said first compound semiconductor with the first electron affinity and formed on said fifth layer, forming a fourth heterojunction between said fifth and sixth layers a second stack structure formed on the substrate adjacent to said first stack structure, including a fourth layer of said first compound semiconductor having the first electron affinity; a fifth layer of said second compound semiconductor formed on said fourth layer and having the second electron affinity, forming a third heterojunction between said fourth and fifth layers; and a sixth layer comprising said first compound semiconductor with the first electron affinity and formed on said fifth layer, forming a fourth heterojunction between said fifth and sixth layers; and isolation means for providing isolation between said first and second adjacent stack structures.

Claim 17

A bi-directional diode as claimed in claim 12, wherein said first adjacent stack structure further includes a seventh layer comprising said second compound semiconductor with the second electron affinity and formed on said third layer, forming a fifth heterojunction between said third and seventh layers.

Claim 18

A bi-directional diode as claimed in claim 13, wherein said second adjacent stack structure further includes an eighth layer comprising said second compound semiconductor with the second electron affinity and formed on said sixth layer, forming a sixth heterojunction between said sixth and eighth layers of said second adjacent stack structure.