Patent US4960613A successfully refreshed from Google Patents.
US4960613A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Laser interconnect process
Assignee: Lockheed Martin Corp
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Filing: 1988-10-04
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Granted: 1990-10-02
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Expires: 2008-10-04
Abstract
Abstract The uniformity of a catalyst layer produced by laser decomposition of a catalyst source compound is substantially improved for patterned substrates whose characteristics vary along the path of a conductor line by providing a buffer layer of a metal such as Ti, Cr or Ni over the substrate prior to the laser induced decomposition of the catalyst source compound.
Inventors
- 👤 Herbert S. Cole
- 👤 Yung S. Liu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 14:26
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/069; H05; H05K; H05K3/00; H05K3/10; H05K3/18; H05K3/181; H05K3/182; H05K3/185; H10P; H10P14/00; H10P14/40; H10P14/412; H10W70/00; H10W70/01; H10W70/05; H10W70/60; H10W70/611; H10W70/614; H05K3/108; H05K3/46; H05K3/4644
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
174 words
A process for forming a desired conductor pattern on a patterned surface of a substrate comprising: providing said patterned substrate, said substrate including a surface pattern of areas having differing characteristics selected from the group consisting of composition, optical reflectivity, optical absorptivity and thermal conductivity; providing a buffer layer on said substrate patterned surface, said buffer layer extending across at least two areas of said surface pattern having differing characteristics; laser illuminating said buffer layer in said desired conductor pattern in the presence of a catalyst source compound to form a layer of an electroless plating catalyst on said buffer layer in said desired conductor pattern; said formation of said catalyst pattern being by decomposition of said catalyst source compound to provide said catalyst on said buffer layer and where said differing characteristics would affect said decomposition in the absence of said buffer layer; and exposing said catalyst patterned buffer layer to an electroless plating environment to deposit electroless metal on said buffer layer in a pattern determined by the pattern of said catalyst.
Claim 2
Dependent Claim
174 words
A process for forming a desired conductor pattern on a patterned surface of a substrate comprising: providing said patterned substrate, said substrate including a surface pattern of areas having differing characteristics selected from the group consisting of composition, optical reflectivity, optical absorptivity and thermal conductivity; providing a buffer layer on said substrate patterned surface, said buffer layer extending across at least two areas of said surface pattern having differing characteristics; laser illuminating said buffer layer in said desired conductor pattern in the presence of a catalyst source compound to form a layer of an electroless plating catalyst on said buffer layer in said desired conductor pattern; said formation of said catalyst pattern being by decomposition of said catalyst source compound to provide said catalyst on said buffer layer and where said differing characteristics would affect said decomposition in the absence of said buffer layer; and exposing said catalyst patterned buffer layer to an electroless plating environment to deposit electroless metal on said buffer layer in a pattern determined by the pattern of said catalyst.
Claim 3
Dependent Claim
13 words
The process recited in claim 1 wherein: said buffer layer comprises a metal.
Claim 4
Dependent Claim
29 words
The process recited in claim 1 further comprising, after said exposing step, the step of: removing portions of said buffer layer which are not covered by said electroless metal.
Claim 5
Dependent Claim
26 words
The process recited in claim 1 further comprising the step: depositing said catalyst containing compound on said buffer layer prior to the step of laser illuminating.
Claim 6
Dependent Claim
32 words
The process recited in claim 4 further comprising the step of: rinsing catalyst source compound from said buffer layer prior to exposing said catalyst patterned buffer layer to said electroless plating environment.
Claim 7
Dependent Claim
16 words
The process recited in claim 5 wherein: said electroless plating environment comprises an electroless plating bath.
Claim 8
Dependent Claim
22 words
The process recited in claim 1 wherein: said buffer layer comprises a metal selected from the group consisting of Ti and Cr.
Claim 9
Dependent Claim
24 words
The process recited in claim 7 wherein: said electroless metal comprises a metal selected from the group consisting of Cu, Au, Ni and Sn.
Claim 10
Dependent Claim
24 words
The process recited in claim 1 wherein: said electroless metal comprises a metal selected from the group consisting of Cu, Ni, Au and Sn.
Claim 11
Dependent Claim
33 words
The process recited in claim 1 wherein: said surface pattern of said patterned substrate comprises first areas and second areas, said first areas comprising a polymer and said second areas comprising a metal.
Claim 12
Dependent Claim
12 words
The process recited in claim 10 wherein: said polymer is a polyimide.
Claim 13
Dependent Claim
12 words
The process recited in claim 11 wherein: said polymer is a polyetherimide.
Claim 14
Dependent Claim
25 words
The process recited in claim 10 wherein the polymer is selected from the group consisting of polyimides, polyimide-siloxanes, polyetherimides, polysulfones, epoxys, polycarbonates, polyesters, and polyesterimides.
Claim 15
Dependent Claim
174 words
A process for forming a conductor in a desired pattern on a surface of a workpiece which comprises polymer portions and metal portions, said process comprising: providing said workpiece having a surface comprised of polymer portions and metal portions, said polymer portions and said metal portions having differing characteristics selected from the group consisting of optical reflectivity, optical absorptivity and thermal conductivity; forming a buffer layer on at least said polymer portions of said workpiece surface, to provide said polymer portions and said metal portions of said workpiece surface with substantially similar characteristics; laser illuminating said workpiece in said desired pattern in the presence of a catalyst source compound to form a layer of an electroless plating catalyst on said workpiece in said desired pattern by decomposing said catalyst source compound, said pattern including a segment disposed over said polymer portion and a segment disposed over said metal portion; exposing said workpiece with said catalyst to an electroless plating environment to deposit electroless metal on said workpiece surface in the pattern of said catalyst.
Claim 16
Dependent Claim
174 words
A process for forming a conductor in a desired pattern on a surface of a workpiece which comprises polymer portions and metal portions, said process comprising: providing said workpiece having a surface comprised of polymer portions and metal portions, said polymer portions and said metal portions having differing characteristics selected from the group consisting of optical reflectivity, optical absorptivity and thermal conductivity; forming a buffer layer on at least said polymer portions of said workpiece surface, to provide said polymer portions and said metal portions of said workpiece surface with substantially similar characteristics; laser illuminating said workpiece in said desired pattern in the presence of a catalyst source compound to form a layer of an electroless plating catalyst on said workpiece in said desired pattern by decomposing said catalyst source compound, said pattern including a segment disposed over said polymer portion and a segment disposed over said metal portion; exposing said workpiece with said catalyst to an electroless plating environment to deposit electroless metal on said workpiece surface in the pattern of said catalyst.
Claim 17
Dependent Claim
32 words
The process recited in claim 14 wherein: said forming step comprises forming said buffer layer on said polymer potions of said workpiece surface and on said metal portions of said workpiece surface.
Claim 18
Dependent Claim
12 words
The process recited in claim 14 wherein: said polymer is a polyimide.
Claim 19
Dependent Claim
12 words
The process recited in claim 16 wherein: said polymer is a polyetherimide.
Claim 20
Dependent Claim
24 words
The process recited in claim 14 wherein the polymer is selected from the group consisting of polyimides, polyimide-siloxanes, polysulfones, epoxys, polycarbonates, polyesters, and polyesterimides.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-10-01 | 1994-04-02 | 1994-10-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-10-01 | 1998-04-02 | 1998-10-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-10-01 | 2002-04-02 | 2002-10-02 | $7700.00 | Window Closed / Lapsed |