Patent US3432997A successfully refreshed from Google Patents.
US4332879A
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Process for depositing a film of controlled composition using a metallo-organic photoresist
Assignee: The AT&T MVPD Group LLC
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Filing: 1978-12-01
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Granted: 1982-06-01
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Expires: 1998-12-01
Abstract
Abstract The specification describes a process for depositing a film of controlled composition on a substrate by using a metallo-organic photoresist in which the organic portion is combusted by heating in a reactive atmosphere to leave a residual deposit of a desired substance on the substrate. The film may be formed as a patterned or unpatterned layer. In addition, the residual deposit may be subsequently subjected to a chemical reaction to alter its composition.
Inventors
- 👤 Antonio C. Pastor
- 👤 Ricardo C. Pastor
- 👤 Gregory L. Tangonan
- 👤 Shi-Yin Wong
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 17:18
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/0047; H; H05; H05K; H05K1/00; H05K1/02; H05K1/03; H05K1/0306; H05K1/09; H05K1/092; H05K3/00; H05K3/02
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
139 words
A process for depositing a film of controlled composition on a substrate comprising the steps of: (a) providing a polymerizable material which is suitable for use as a photoresist; (b) introducing into said polymerizable material a predetermined amount of a chosen substance containing a selected cation and which is capable of being chemically linked to said polymerizable material upon polymerization, to form a cation-containing polymerizable material; (d) polymerizing said cation-containing polymerizable material to form a metallo-organic photoresist of chosen composition having said cation substitutionally incorporated therein; and (c) depositing said cation-containing polymerizable material on said substrate to a predetermined thickness; (e) heating said deposited metallo-organic photoresist in a selected reactive atmosphere to elevated temperatures sufficient to combust the organic portion of said metallo-organic photoresist and to leave behind on said substrate an inorganic residue which contains said selected cation.
Claim 2
Dependent Claim
139 words
A process for depositing a film of controlled composition on a substrate comprising the steps of: (a) providing a polymerizable material which is suitable for use as a photoresist; (b) introducing into said polymerizable material a predetermined amount of a chosen substance containing a selected cation and which is capable of being chemically linked to said polymerizable material upon polymerization, to form a cation-containing polymerizable material; (d) polymerizing said cation-containing polymerizable material to form a metallo-organic photoresist of chosen composition having said cation substitutionally incorporated therein; and (c) depositing said cation-containing polymerizable material on said substrate to a predetermined thickness; (e) heating said deposited metallo-organic photoresist in a selected reactive atmosphere to elevated temperatures sufficient to combust the organic portion of said metallo-organic photoresist and to leave behind on said substrate an inorganic residue which contains said selected cation.
Claim 3
Dependent Claim
27 words
The process as set forth in claim 1 which further comprises the step of: defining a predetermined pattern in said photoresist during said polymerizing of step "d".
Claim 4
Dependent Claim
37 words
The process as set forth in claim 2 wherein said substrate is fused silica, said chosen composition comprises a lead-containing compound, and said residue is a lead-containing oxide having a thickness of 100 A to 4000 A.
Claim 5
Dependent Claim
39 words
The process as set forth in claim 1 wherein said selected reactive atmosphere comprises a material containing a substance selected from the group consisting of fluorine, chlorine, bromine, iodine, sulfur, selenium, tellurium, oxygen, hydrogen, nitrogen, helium, argon, and air.
Claim 6
Dependent Claim
34 words
The process as set forth in claim 1 or claim 2 which further comprises the step of exposing said residue to a second chosen reactive atmosphere to form a reaction product with said residue.
Claim 7
Dependent Claim
29 words
The process as set forth in claim 5 wherein said reaction product is chosen from the group consisting of an oxide, a halide, a chalcogenide, and a free element.
Claim 8
Dependent Claim
45 words
The process as set forth in claim 1 which further comprises the step of heating said substrate having said residue deposited thereon to elevated temperatures sufficient to diffuse at least a portion of said residue into said substrate to thereby form an optical waveguiding region.
Claim 9
Dependent Claim
16 words
The process as set forth in claim 1 wherein said inorganic residue contains a phosphorescent material.
Claim 10
Dependent Claim
38 words
The process as set forth in claim 1 wherein said cation is selected from the group consisting of lead, boron, europium, samarium, praseodymium, lanthanum, copper, iron, yttrium, aluminum, neodymium, tantalum, indium, tin, and binary and ternary mixtures thereof.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-05-31 | 1985-11-30 | 1986-06-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-05-31 | 1989-11-30 | 1990-06-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-05-31 | 1993-11-30 | 1994-06-01 | $7700.00 | Window Closed / Lapsed |