US4957835A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Masked electron beam lithography
Assignee: KEVEX Inc
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Filing: 1987-05-15
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Granted: 1990-09-18
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Expires: 2007-05-15
Abstract
Abstract In an electron beam lithography system, a layer of photoresist is exposed in vacuum by a collimated flood beam of electrons passing through an electron mask in nominal contact with the photoresist to define the exposed images. The electron mask includes a mask wafer apertured to define one or more frames supporting one or more panes of electron permeable membrane material having an average atomic number less than 14 and each supporting a patterned layer of electron absorbing material defining the mask patterns. Suitable electron permeable membrane materials include BN, BC, SiC, Si 3 N 4 and Al 4 C 3 of a thickness of 0.1 μm to 2 μm.
Inventors
- 👤 Gary D. Aden
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 17:25
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/20; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
113 words
In a method for making a mask for flood beam electron lithography wherein the flood beam is patterned by passing through the mask and thence into the photoresist for exposure thereof, the steps of: recessing a substrate from one side to define a recess having a frame portion closed by a bottom end wall portion of the substrate; forming a relatively thin membrane layer of electron permeable material overlaying the bottom end wall of the recess; removing the end wall material overlaying said relatively thin membrane layer of electron permeable material; and forming a patterned layer of electron absorber material overlaying said membrane layer of electron permeable material to define the electron mask.
Claim 2
Dependent Claim
113 words
In a method for making a mask for flood beam electron lithography wherein the flood beam is patterned by passing through the mask and thence into the photoresist for exposure thereof, the steps of: recessing a substrate from one side to define a recess having a frame portion closed by a bottom end wall portion of the substrate; forming a relatively thin membrane layer of electron permeable material overlaying the bottom end wall of the recess; removing the end wall material overlaying said relatively thin membrane layer of electron permeable material; and forming a patterned layer of electron absorber material overlaying said membrane layer of electron permeable material to define the electron mask.
Claim 3
Dependent Claim
28 words
The method of claim 1, wherein the electron permeable material is selected from the group consisting of boron nitride, boron carbide, silicon nitride, silicon carbide, and aluminum carbide.
Claim 4
Dependent Claim
23 words
The method of claim 1, wherein the membrane layer is formed of a thickness falling within the range of 0.1 to 2.0 micrometers.
Claim 5
Dependent Claim
25 words
The method of claim 1, wherein the electron absorber material is selected from the group consisting of nickel, gold, platinum, tungsten, zirconium, copper and palladium.
Claim 6
Dependent Claim
26 words
The method of claim 1, wherein the layer of electron absorber material is formed of a thickness falling within the range of 500 to 15,000 Å.
References Cited (Backward Citations)
US3544790A
Cited
US3971860A
Cited
US4061814A
Cited
EP0082977A1
Cited
US4543266A
Cited
US4862490A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-09-17 | 1994-03-19 | 1994-09-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-09-17 | 1998-03-19 | 1998-09-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-09-17 | 2002-03-19 | 2002-09-18 | $7700.00 | Window Closed / Lapsed |