High sensitivity mid and deep UV resist

Claim 1

A positive photosensitive composition comprising an admixture of a 1,2-naphthoquinonediazide photosensitizer and a bindingly effective amount of novolak resin wherein: A. said photosensitizer comprises an admixture of 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-4-sulfonic acid triester; 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-4-sulfonic acid diester, and 2,3,4-trihydroxybenzophenone-1,2-naphthoquinone-2-diazo-4-sulfonic acid monoester in the following relative amounts: triester--about 50 wt % to about 75 wt % monoester and diester--balance, in a monoester/diester weight ratio of about 1/2, said wt % being based on the total weight of the mono-, di, and triester; and B. said novolak resin comprising a resin selected from the group consisting of: 1. a resin prepared by condensing an aliphatic aldehyde, aromatic aldehyde or mixture thereof with a phenolic component comprising a mixture of p-cresol and m-cresol containing at least about 60 weight percent p-cresol, based on the total weight of p-cresol and m-cresol, and a sufficient amount of m-cresol to render said novolak resin soluble in an aqueous, alkaline solution, said phenolic component being essentially free of o-cresol; and 2.