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US4908686A Expired / Lapsed US ⏱️ 0.0 years remaining

Stacked silicide/silicon mid- to long-wavelength infrared detector

Assignee: California Institute of Technology
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Filing: 1988-08-01
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Granted: 1990-03-13
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Expires: 2008-08-01
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Abstract

Abstract The use of stacked Schottky barriers (16) with epitaxially grown thin silicides (10) combined with selective doping (22) of the barriers provides high quantum efficiency infrared detectors (30) at longer wavelengths that is compatible with existing silicon VLSI technology.

Inventors

  • 👤 Joseph Maserjian

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 04:42
CPC Classifications
H; H10; H10F; H10F30/00; H10F30/20; H10F30/21; H10F30/22; H10F30/227; H10F39/00; H10F39/10; H10F39/12; H10F39/18; H10F39/184; H10F39/1843

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 74 words
An improved infrared detector comprising at least one unit comprising a thin single crystal metal silicide layer sandwiched between two single crystal silicon layers, each doped to a first doping level, each said silicon layer forming an interface with said silicide layer, the improvement comprising that portion of each said silicon layer adjacent said interface having a second doping level higher than that of said first doping level, thereby forming a reduced Schottky barrier.
Claim 2
Dependent Claim 74 words
An improved infrared detector comprising at least one unit comprising a thin single crystal metal silicide layer sandwiched between two single crystal silicon layers, each doped to a first doping level, each said silicon layer forming an interface with said silicide layer, the improvement comprising that portion of each said silicon layer adjacent said interface having a second doping level higher than that of said first doping level, thereby forming a reduced Schottky barrier.
Claim 3
Dependent Claim 33 words
The detector of claim 1 wherein said metal silicide layer is selected from the group of metal silicides that may be epitaxially grown on silicon, thereby forming a heteroepitaxial interface with said silicon.
Claim 4
Dependent Claim 16 words
The detector of claim 2 comprising a plurality of said units to form repeated Schottky barriers.
Claim 5
Dependent Claim 22 words
The detector of claim 2 wherein said metal silicide is selected from the group consisting of CoSi 2 and NiSi 2 .
Claim 6
Dependent Claim 18 words
The detector of claim 1 wherein said metal silicide has a thickness ranging up to about 10 nm.
Claim 7
Dependent Claim 78 words
An improved infrared detector comprising a plurality of stacked metal silicide layers, each silicide layer sandwiched between two silicon layers, each doped to a first doping level, each said silicon layer forming an interface with an adjacent metal silicide layer to form repeated p-type Schottky barriers, the improvement comprising that portion of each said silicon layer adjacent said interface having a doping level higher than that of said first doping level, thereby providing a reduced effective barrier height.
Claim 8
Dependent Claim 78 words
An improved infrared detector comprising a plurality of stacked metal silicide layers, each silicide layer sandwiched between two silicon layers, each doped to a first doping level, each said silicon layer forming an interface with an adjacent metal silicide layer to form repeated p-type Schottky barriers, the improvement comprising that portion of each said silicon layer adjacent said interface having a doping level higher than that of said first doping level, thereby providing a reduced effective barrier height.
Claim 9
Dependent Claim 25 words
The detector of claim 6 wherein said metal silicide is selected from the group consisting of metal silicides that may be epitaxially grown on silicon.
Claim 10
Dependent Claim 37 words
The detector of claim 7 wherein lateral contacts are provided to a plurality of layers by providing common n + contacting regions to the metal silicides and common p + contacting regions to the interleafing p-silicon layers.
Claim 11
Dependent Claim 22 words
The detector of claim 8 wherein said metal silicide is selected from the group consisting of CoSi 2 and NiSi 2 .
Claim 12
Dependent Claim 18 words
The detector of claim 7 wherein said metal silicide has a thickness ranging up to about 10 nm.

References Cited (Backward Citations)

US4137545A Cited
US4244750A Cited
US4492971A Cited
US4544939A Cited
US4742017A Cited
US4794438A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1993-03-12 1993-09-11 1994-03-13 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1997-03-12 1997-09-11 1998-03-13 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2001-03-12 2001-09-11 2002-03-13 $7700.00 Window Closed / Lapsed

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