US4894353A
Expired / Lapsed
US
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Method of fabricating passivated tunnel oxide
Assignee: Cypress Semiconductor Corp
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Filing: 1988-04-29
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Granted: 1990-01-16
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Expires: 2008-04-29
Abstract
Abstract A method of fabricating a high-quality tunnel oxide layer includes a two-step oxidation process. The first oxidation step includes oxidizing a substrate in an atmosphere comprising oxygen and nitrogen at a temperature of approximately 950° C., and thus is an HCl-less oxidation. The second oxidation step is performed in an atmosphere comprising HCl and argon at a temperature of approximately 1050° C. The first oxidation step is performed at a temperature in the range of temperatures for the viscous flow of the oxide to prevent any physical defects from forming in the oxide layer. The second oxidation step is performed at a temperature sufficient to passivate any mobile ions in the oxide layer in at atmosphere comprising a gettering agent, for example, HCl. By this two-step oxidation process a tunnel oxide layer which is of high quality and is not damaged during subsequent processing steps performed at temperatures at 1100° C. and above.
Inventors
- 👤 Effiong E. Ibok
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 16:15
CPC Classifications
H; H10; H10D; H10D64/00; H10D64/01; H10D64/013; H10D64/01302; H10D64/01332; H10D64/01336; H10D64/0134; H10D64/01346; H10D64/031; H10D64/035; H10P; H10P14/00; H10P14/60; H10P14/63; H10P14/6302; H10P14/6304; H10P14/6306; H10P14/6308; H10P14/6309; H10P14/6322
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
90 words
A method of fabricating a high-quality oxide layer on a substrate, comprising the sequential steps of: (a) oxidizing the substrate in an atmosphere comprising oxygen and nitrogen at a temperature greater than or equal to 950° C. and less than or equal to 1000° C.; and (b) oxidizing the substrate in an atmosphere comprising HC1, oxygen, and argon (Ar) at a temperature greater than 1050° C., said steps (a) and (b) being conducted for times sufficient to form an oxide layer having a total thickness of less than 200 Å.
Claim 2
Independent Claim
90 words
A method of fabricating a high-quality oxide layer on a substrate, comprising the sequential steps of: (a) oxidizing the substrate in an atmosphere comprising oxygen and nitrogen at a temperature greater than or equal to 950° C. and less than or equal to 1000° C.; and (b) oxidizing the substrate in an atmosphere comprising HC1, oxygen, and argon (Ar) at a temperature greater than 1050° C., said steps (a) and (b) being conducted for times sufficient to form an oxide layer having a total thickness of less than 200 Å.
Claim 3
Dependent Claim
22 words
A method according to claim 1, wherein said step (a) comprises oxidizing the substrate in an atmosphere comprising approximately 20% dry oxygen.
Claim 4
Dependent Claim
18 words
A method according to claim 2, wherein said step (a) comprises oxidizing the substrate at approximately 950° C.
Claim 5
Dependent Claim
21 words
A method according to claim 1, wherein said step (b) comprises oxidizing the substrate in an atmosphere comprising approximately 3% HC1.
Claim 6
Independent Claim
101 words
A method of fabricating a high-quality oxide layer on a substrate, comprising the steps of: (a) oxidizing the substrate in an atmosphere comprising oxygen and nitrogen at a temperature greater than or equal to 950° C. and less than or equal to 1000° C.; and (b) passivating the mobile ions in the oxide layer formed in said step (a) by exposing the oxide layer to an atmosphere comprising approximately 5% HC1 at a temperature greater than 1050° C., said steps (a) and (b) being conducted times sufficient to form a tunnel oxide layer having total thickness of less than 200 Å.
Claim 7
Independent Claim
101 words
A method of fabricating a high-quality oxide layer on a substrate, comprising the steps of: (a) oxidizing the substrate in an atmosphere comprising oxygen and nitrogen at a temperature greater than or equal to 950° C. and less than or equal to 1000° C.; and (b) passivating the mobile ions in the oxide layer formed in said step (a) by exposing the oxide layer to an atmosphere comprising approximately 5% HC1 at a temperature greater than 1050° C., said steps (a) and (b) being conducted times sufficient to form a tunnel oxide layer having total thickness of less than 200 Å.
Claim 8
Dependent Claim
24 words
A method according to claim 5, wherein said step (a) comprises oxidizing the substrate in an atmosphere comprising approximately 20% dry oxygen and nitrogen.
Claim 9
Dependent Claim
18 words
A method according to claim 6, wherein said step (a) comprises oxidizing the substrate at approximately 950° C.
Claim 10
Independent Claim
105 words
A method of fabricating a high-quality tunnel oxide layer having a thickness of less than 150 Å on a substrate, comprising the sequential steps of: (a) heating the substrate to greater than approximately 950° C. and less than or equal to 1000° C. in an atmosphere comprising nitrogen (N 2 ); (b) oxidizing the substrate in an atmosphere comprising oxygen at the temperature attained in said step (a); (c) heating the substrate to a temperature greater than approximately 1050° C. in an atmosphere comprising argon; and (d) oxidizing the substrate in an atmosphere comprising oxygen and HC1 at the temperature attained in said step (c).
Claim 11
Independent Claim
105 words
A method of fabricating a high-quality tunnel oxide layer having a thickness of less than 150 Å on a substrate, comprising the sequential steps of: (a) heating the substrate to greater than approximately 950° C. and less than or equal to 1000° C. in an atmosphere comprising nitrogen (N 2 ); (b) oxidizing the substrate in an atmosphere comprising oxygen at the temperature attained in said step (a); (c) heating the substrate to a temperature greater than approximately 1050° C. in an atmosphere comprising argon; and (d) oxidizing the substrate in an atmosphere comprising oxygen and HC1 at the temperature attained in said step (c).
Claim 12
Dependent Claim
21 words
A method according to claim 8, wherein said step (b) comprises oxidizing the substrate in an atmosphere comprising approximately 20% oxygen.
Claim 13
Dependent Claim
21 words
A method according to claim 10, wherein said step (d) comprises oxidizing the substrate in an atmosphere comprising approximately 3% HC1.
Claim 14
Dependent Claim
21 words
A method according to claim 9, wherein said step (d) comprises oxidizing the substrate in an atmosphere comprising approximately 3% HC1.
Claim 15
Dependent Claim
15 words
A method according to claim 8, wherein said step (d) comprises passivating the tunnel oxide.
Claim 16
Dependent Claim
21 words
A method according to claim 9, further comprising the step (e) of annealing the substrate in argon after said step (d).
Claim 17
Independent Claim
174 words
A method of fabricating an EEPROM having a high-quality tunnel oxide layer on a substrate, comprising the sequential steps of: (a) providing source and drain regions in the substrate, said source and drain regions being spaced apart to define a channel therebetween; (b) heat the substrate to a temperature greater than approximately 950° C. in an atmosphere comprising nitrogen (N 2 ); (c) oxidizing the substrate in an atmosphere comprising approximately 20% oxygen at a temperature of approximately 950° C. for a time sufficient to form an oxide layer having a thickness of less than approximately 100 Å; (d) heating the substrate to a temperature of approximately 1050° C. in an inert atmosphere; (e) oxidizing the substrate in an atmosphere comprising oxygen and approximately 3% HC1 at a temperature of approximately 1050° C. to passivate any mobile ions in the oxide layer for a time sufficient to increase the thickness of the oxide layer to less than approximately 150 Å; and (f) annealing the substrate in an atmosphere comprising argon for approximately 15 minutes.
Claim 18
Independent Claim
174 words
A method of fabricating an EEPROM having a high-quality tunnel oxide layer on a substrate, comprising the sequential steps of: (a) providing source and drain regions in the substrate, said source and drain regions being spaced apart to define a channel therebetween; (b) heat the substrate to a temperature greater than approximately 950° C. in an atmosphere comprising nitrogen (N 2 ); (c) oxidizing the substrate in an atmosphere comprising approximately 20% oxygen at a temperature of approximately 950° C. for a time sufficient to form an oxide layer having a thickness of less than approximately 100 Å; (d) heating the substrate to a temperature of approximately 1050° C. in an inert atmosphere; (e) oxidizing the substrate in an atmosphere comprising oxygen and approximately 3% HC1 at a temperature of approximately 1050° C. to passivate any mobile ions in the oxide layer for a time sufficient to increase the thickness of the oxide layer to less than approximately 150 Å; and (f) annealing the substrate in an atmosphere comprising argon for approximately 15 minutes.
Claim 19
Dependent Claim
28 words
A method according to claim 14, wherein said step (d) comprises heating the substrate in an atmosphere comprising argon to passivate any mobile ions at the oxide/substrate interface.
Claim 20
Dependent Claim
56 words
A method according to claim 14, wherein: said step (c) comprises oxidizing the substrate for approximately 10 minutes to grow a tunnel oxide layer having a thickness of approximately 50 Å; and said step (e) comprises oxidizing the substrate for approximately 3 minutes, thereby increasing the thickness of the tunnel oxide layer to approximately 80 Å.
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