Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
197 words
A superconducting device comprising: a semiconductor layer; at least two superconducting electrodes formed in contact with said semiconductor layer, said superconducting electrodes being spaced from each other less than 10 times the coherence length of a superconducting electron pair; and at least one control electrode means for controlling current flowing between said superconducting electrodes, said at least one control electrode means being formed on said semiconductor layer between said superconducting electrodes and separated from said semiconductor layer by an electrically insulating film having a thickness of 20 to 80 nanometers, the superconducting electrodes and the control electrode means being positioned on a same side of the semiconductor layer; with an impurity contained in said semiconductor layer being so distributed as to form at least one high impurity concentration region having a concentration above a mean value and at least one low impurity concentration region having a concentration below said mean value, the high impurity concentration region being existent in contact with the superconducting electrodes, wherein the control electrode means is on a low impurity concentration region, with a high impurity concentration region positioned under the low impurity concentration region on which the control electrode means is located.
Claim 2
Dependent Claim
197 words
A superconducting device comprising: a semiconductor layer; at least two superconducting electrodes formed in contact with said semiconductor layer, said superconducting electrodes being spaced from each other less than 10 times the coherence length of a superconducting electron pair; and at least one control electrode means for controlling current flowing between said superconducting electrodes, said at least one control electrode means being formed on said semiconductor layer between said superconducting electrodes and separated from said semiconductor layer by an electrically insulating film having a thickness of 20 to 80 nanometers, the superconducting electrodes and the control electrode means being positioned on a same side of the semiconductor layer; with an impurity contained in said semiconductor layer being so distributed as to form at least one high impurity concentration region having a concentration above a mean value and at least one low impurity concentration region having a concentration below said mean value, the high impurity concentration region being existent in contact with the superconducting electrodes, wherein the control electrode means is on a low impurity concentration region, with a high impurity concentration region positioned under the low impurity concentration region on which the control electrode means is located.
Claim 3
Dependent Claim
195 words
A superconducting device comprising: a semiconductor layer; at least two superconducting electrodes formed in contact with said semiconductor layer, said superconducting electrodes being spaced from each other less than 10 times the coherence length of a superconducting electron pair; and at least one control electrode means for controlling current flowing between said superconducting electrodes, said at least one control electrode means being formed on said semiconductor layer between said superconducting electrodes and separated from said semiconductor layer by an electrically insulating film having a thickness of 20 to 80 nanometers, the superconducting electrodes and the control electrode means being positioned on a same side of the semiconductor layer; with an impurity contained in said semiconductor layer being so distributed as to form at least one high impurity concentration region having a concentration above a mean value and at least one low impurity concentration region having a concentration below said mean value, the high impurity concentration region being existent in contact with the superconducting electrodes, wherein the control electrode means is on a stack of semiconductor regions, the stack of semiconductor regions including first and second low impurity concentration regions sandwiching a high impurity concentration region.
Claim 4
Dependent Claim
195 words
A superconducting device comprising: a semiconductor layer; at least two superconducting electrodes formed in contact with said semiconductor layer, said superconducting electrodes being spaced from each other less than 10 times the coherence length of a superconducting electron pair; and at least one control electrode means for controlling current flowing between said superconducting electrodes, said at least one control electrode means being formed on said semiconductor layer between said superconducting electrodes and separated from said semiconductor layer by an electrically insulating film having a thickness of 20 to 80 nanometers, the superconducting electrodes and the control electrode means being positioned on a same side of the semiconductor layer; with an impurity contained in said semiconductor layer being so distributed as to form at least one high impurity concentration region having a concentration above a mean value and at least one low impurity concentration region having a concentration below said mean value, the high impurity concentration region being existent in contact with the superconducting electrodes, wherein the control electrode means is on a stack of semiconductor regions, the stack of semiconductor regions including first and second low impurity concentration regions sandwiching a high impurity concentration region.
Claim 5
Dependent Claim
53 words
The superconducting device as defined in claim 2, wherein the first low impurity concentration region is proximate to the control electrode means, and wherein the second low impurity concentration region, which extends below the control electrode means, also extends below the high impurity concentration region which is in contact with the superconducting electrodes.
Claim 6
Dependent Claim
28 words
The superconducting device as defined in claim 3, wherein each of the high impurity concentration region and the low impurity concentration region is of the same conductivity type.