Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
104 words
A high mobility semiconductor device comprising: a first plurality of narrow bandgap semiconductor layers, and a second plurality of wide bandgap semiconductor layers interleaved with and contiguous with said first plurality, said wide bandgap and narrow bandgap layers being substantially lattice-matched to one another so as to form substantially defect-free heterojunctions at the interfaces between said layers, said layers having a conduction or valence band step of sufficient magnitude to confine carriers to said narrow bandgap layers, and characterized in that said layers are adapted such that the impurity-concentration-thickness product of said wide bandgap layers exceeds the impurity-concentration-thickness product of said narrow bandgap layers.
Claim 2
Dependent Claim
104 words
A high mobility semiconductor device comprising: a first plurality of narrow bandgap semiconductor layers, and a second plurality of wide bandgap semiconductor layers interleaved with and contiguous with said first plurality, said wide bandgap and narrow bandgap layers being substantially lattice-matched to one another so as to form substantially defect-free heterojunctions at the interfaces between said layers, said layers having a conduction or valence band step of sufficient magnitude to confine carriers to said narrow bandgap layers, and characterized in that said layers are adapted such that the impurity-concentration-thickness product of said wide bandgap layers exceeds the impurity-concentration-thickness product of said narrow bandgap layers.
Claim 3
Dependent Claim
29 words
The device of claim 1 wherein said wide bandgap layers are doped only in a central portion thereof so as to leave thin, undoped buffer zones adjacent said heterojunctions.
Claim 4
Dependent Claim
14 words
The device of claim 2 wherein said buffer zones are about 10-60 Angstroms thick.
Claim 5
Dependent Claim
14 words
The device of claim 1 or 2 wherein said narrow bandgap layers are undoped.
Claim 6
Dependent Claim
38 words
The device of claim 4 wherein said narrow bandgap layers have an impurity concentration level of about 10 14 /cm 3 and said wide bandgap layers have an impurity concentration of at least 10 16 /cm 3 .
Claim 7
Dependent Claim
30 words
The device of claim 5 wherein said narrow bandgap layers comprise Al y Ga 1-y As and said wide bandgap layers comprise n-type Al x Ga 1-x As, 0≦y, x-y≳0.02.
Claim 8
Dependent Claim
19 words
The device of claim 6 wherein said layers have a thickness in the range of 100 to 400 Angstroms.
Claim 9
Dependent Claim
49 words
The device of claim 4 wherein said Al x Ga 1-x As layers are doped n-type in the range of about 10 16 to 10 18 /cm 3 approximately, and including means for cooling said device in order to increase its mobility as compared to that at room temperature.
Claim 10
Dependent Claim
40 words
The device of claim 8 wherein said cooling means includes cryogenic apparatus for cooling said device below approximately 50° K. so as to increase the mobility of said device to at least 16,000 cm 2 V -1 sec -1 approximately.
Claim 11
Dependent Claim
85 words
A field effect transistor comprising a semi-insulating semiconductor substrate, an n-type device according to claim 1 or 2 fabricated on said substrate, spaced apart n-type zones extending through said device to said substrate, thereby forming source and drain zones, a portion of said device extending between said source and drain zones forming the channel of said transistor, source and drain electrodes formed on said source and drain zones, respectively, and a Schottky barrier gate electrode formed on said portion between said source and drain electrodes.
Claim 12
Dependent Claim
30 words
The transistor of claim 10 wherein said narrow bandgap layers comprise Al y Ga 1-y As and said wide bandgap layers comprise n-type Al x Ga 1-x As, 0≦y, x-y≳0.02.