US4870860A — Direct-heated flow measuring apparatus having imp…

Claim 1

Independent Claim 133 words

A direct-heated flow measuring apparatus for measuring the flow rate within a passage comprising; a planar substrate that is formed of monocrystalline silicon; a film resistance pattern formed partially at said substrate; a supporting plate, fixed to said passage, for supporting said substrate, said supporting plate having good heat dissipation characteristics; at least one adiabatic member disposed between said substrate and said supporting plate; and electric power control means, connected to said film resistance pattern, for controlling the heat generated by said film resistance pattern, one part of a surface of said planar substrate and one part of a surface of said supporting plate being superimposed on each other via said adiabatic member, the cross-section of said adiabatic member being smaller than the superimposed area of said planar substrate and said supporting plate.

Claim 2

Dependent Claim 133 words

A direct-heated flow measuring apparatus for measuring the flow rate within a passage comprising; a planar substrate that is formed of monocrystalline silicon; a film resistance pattern formed partially at said substrate; a supporting plate, fixed to said passage, for supporting said substrate, said supporting plate having good heat dissipation characteristics; at least one adiabatic member disposed between said substrate and said supporting plate; and electric power control means, connected to said film resistance pattern, for controlling the heat generated by said film resistance pattern, one part of a surface of said planar substrate and one part of a surface of said supporting plate being superimposed on each other via said adiabatic member, the cross-section of said adiabatic member being smaller than the superimposed area of said planar substrate and said supporting plate.

Claim 3

Dependent Claim 16 words

An apparatus as set forth in claim 1, wherein apertures are provided in said supporting member.

Claim 4

Dependent Claim 19 words

An apparatus as set forth in claim 1, wherein fins for dissipating heat are provided in said supporting plate.

Claim 5

Dependent Claim 31 words

An apparatus as set forth in claim 1, wherein said supporting plate is made of a material having a relatively larger thermal conductivity than a thermal conductivity of said adiabatic member.

Claim 6

Dependent Claim 13 words

An apparatus as set forth in claim 4, wherein said material is metal.

Claim 7

Dependent Claim 17 words

An apparatus as set forth in claim 5, wherein said metal is one of aluminium and copper.

Claim 8

Dependent Claim 24 words

An apparatus as set forth in claim 1, wherein said adiabatic member is inserted between an edge of said supporting plate and said substrate.

Claim 9

Dependent Claim 18 words

An apparatus as set forth in claim 1, wherein said resistance pattern is formed on said monocrystalline silicon.

Claim 10

Dependent Claim 23 words

An apparatus as set forth in claim 1, wherein a diffusion resistance is formed as said film resistance pattern in said monocrystalline silicon.

Claim 11

Dependent Claim 57 words

An apparatus as set forth in claim 1, further comprising a temperature-compensating resistor for detecting the temperature of non-heated fluid in the fluid stream, said temperature-compensating resistor being substantially unaffected by the heat generated from said film resistance pattern, said electric power control means controlling the heat generated by said film resistance pattern and said temperature-compensating resistor.

Claim 12

Dependent Claim 49 words

An apparatus as set forth in claim 10, wherein a system of said temperature-compensating resistor has the same configuration as a system of said film resistance pattern, the system of said temperature-compensating resistor being symmetrical to the system of said film resistance pattern with respect to the fluid stream.

Claim 13

Dependent Claim 28 words

An apparatus as set forth in claim 11, wherein the system of said temperature-compensating resistor comprises a supporting means different to the system of said film resistance pattern.

Claim 14

Dependent Claim 28 words

An apparatus as set forth in claim 11, wherein the system of said temperature-compensating resistor comprises the same supporting means as the system of said film resistance pattern.

Claim 15

Dependent Claim 44 words

An apparatus as set forth in claim 10, wherein a system of said temperature-compensating resistor has the same configuration as a system of said film resistance pattern, the system of said temperature-compensating resistor being disposed upstream of the system of said film resistance pattern.

Claim 16

Dependent Claim 28 words

An apparatus as set forth in claim 14, wherein the system of said temperature-compensating resistor comprises the same supporting means as the system of said film resistance pattern.

Claim 17

Dependent Claim 18 words

An apparatus as set forth in claim 1, wherein said adiabatic member is made of an insulating material.

Claim 18

Dependent Claim 41 words

An apparatus as set forth in claim 16, further comprising: an electrode formed on said supporting plate and connected to said control means; and an electric conductive wire, formed by wire bonding, for connecting said electrode to said film resistance pattern.

Claim 19

Dependent Claim 17 words

An apparatus as set forth in claim 17 further comprising means for covering said electric conductive wire.

Claim 20

Dependent Claim 24 words

An apparatus as set forth in claim 18, wherein said covering means has at least a curled edge to protect said electric conductive wire.

Claim 21

Dependent Claim 21 words

An apparatus as set forth in claim 18, further comprising an adiabatic member inserted between said covering means and said substrate.

Claim 22

Dependent Claim 23 words

An apparatus set forth in claim 1, wherein said supporting plate supports at least one end of said substrate by said adiabatic member.

Claim 23

Dependent Claim 42 words

A measuring apparatus as in claim 1 wherein said adiabatic member is partially in contact with both said planar substrate and said supporting plate at a portion other than a portion of said planar substrate where said film resistance pattern is formed.

Claim 24

Dependent Claim 141 words

A direct-heated flow measuring apparatus for measuring the flow rate with passage comprising: a planar substrate that is formed of monocrystalline silicon; a film resistance pattern formed partially at said substrate; a supporting plate, fixed to said passage, for supporting said substrate, said supporting plate having good heat dissipation characteristics; at least one adiabatic member disposed between said substrate and said supporting plate; and electric power control means, connected to said film resistance pattern, for controlling the heat generated by said film resistance pattern, said adiabatic member being partially in contact with both said planar substrate and said supporting plate at a portion other than a portion of said planar substrate where said film resistance pattern is formed, wherein a material of said adiabatic member is polyimid resin, and wherein said polyimid resin has a thickness of 50 to 60 μm.

Claim 25

Dependent Claim 141 words

A direct-heated flow measuring apparatus for measuring the flow rate with passage comprising: a planar substrate that is formed of monocrystalline silicon; a film resistance pattern formed partially at said substrate; a supporting plate, fixed to said passage, for supporting said substrate, said supporting plate having good heat dissipation characteristics; at least one adiabatic member disposed between said substrate and said supporting plate; and electric power control means, connected to said film resistance pattern, for controlling the heat generated by said film resistance pattern, said adiabatic member being partially in contact with both said planar substrate and said supporting plate at a portion other than a portion of said planar substrate where said film resistance pattern is formed, wherein a material of said adiabatic member is polyimid resin, and wherein said polyimid resin has a thickness of 50 to 60 μm.

Claim 26

Dependent Claim 119 words

A direct-heated flow measuring apparatus for measuring the flow rate within a passage comprising: a planar substrate that is formed of monocrystalline silicon; a film resistance pattern formed at a central portion of said substrate; a supporting plate, fixed to said passage, for supporting at least one end of said substrate, said supporting plate having good heat dissipation characteristics; means for throttling heat transfer between said substrate and said supporting plate; and electric power control means, connected to said film resistance pattern, for controlling the heat generated by said film resistance pattern, wherein holes are provided in said supporting plate, said heat transfer throttling means comprising adiabatic chips fixed to said holes, said substrate being fixed to said chips.

Claim 27

Dependent Claim 119 words

A direct-heated flow measuring apparatus for measuring the flow rate within a passage comprising: a planar substrate that is formed of monocrystalline silicon; a film resistance pattern formed at a central portion of said substrate; a supporting plate, fixed to said passage, for supporting at least one end of said substrate, said supporting plate having good heat dissipation characteristics; means for throttling heat transfer between said substrate and said supporting plate; and electric power control means, connected to said film resistance pattern, for controlling the heat generated by said film resistance pattern, wherein holes are provided in said supporting plate, said heat transfer throttling means comprising adiabatic chips fixed to said holes, said substrate being fixed to said chips.

Claim 28

Dependent Claim 117 words

A direct heated flow measuring apparatus for measuring the flow rate within a passage, comprising: a planar substrate that is formed of monocrystalline silicon; a film resistance pattern formed at the central portion of said substrate; a supporting plate fixed to said passage, for supporting at least one end of said substrate, said supporting plate being made of a metal material having a relatively larger thermal conductivity than a thermal conductivity of an adiabatic member; said adiabatic member between said substrate and said supporting plate, for throttling heat transferred between said substrate and said supporting plate; and electric power control means, connected to said film resistance pattern, for controlling the heat generated by said film resistance pattern.

Claim 29

Dependent Claim 117 words

A direct heated flow measuring apparatus for measuring the flow rate within a passage, comprising: a planar substrate that is formed of monocrystalline silicon; a film resistance pattern formed at the central portion of said substrate; a supporting plate fixed to said passage, for supporting at least one end of said substrate, said supporting plate being made of a metal material having a relatively larger thermal conductivity than a thermal conductivity of an adiabatic member; said adiabatic member between said substrate and said supporting plate, for throttling heat transferred between said substrate and said supporting plate; and electric power control means, connected to said film resistance pattern, for controlling the heat generated by said film resistance pattern.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	1992-10-02	1993-04-03	1993-10-03	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	1996-10-02	1997-04-03	1997-10-03	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2000-10-02	2001-04-03	2001-10-03	$7700.00	Window Closed / Lapsed

Direct-heated flow measuring apparatus having improved response characteristics

Abstract

Inventors

Bibliographic Details

Claims Analysis

References Cited (Backward Citations)

USPTO Annuity & Maintenance Windows

Assigned Categories & Tags

Assign Category Tag