Surface structure of AlN substrate and a process for producing the same
Abstract
Abstract A surface structure of AlN substrate comprising: an AlN substrate, an intermediate layer disposed on the AlN substrate, and a metallized layer disposed on said intermediate layer, said intermediate layer comprising at least aluminum, nitrogen and oxygen. The metallized layer has a main component of one of Mo-Mn alloy, MO and W, and has a thickness of 1-20 μm. This surface structure is produced by coating a surface of AlN substrate with metallizing layer components, heat treating the resultant coated substrate at a temperature of 200°-500° C. under an oxidizing atmosphere, and further heating the heat treated coated substrate at a temperature of 1200°-1400° C. under a nonoxidizing atmosphere having a dew point of -35° to 5° C.
Inventors
- 👤 Satoshi Iio
- 👤 Akiyasu Okuno
Bibliographic Details
Claims Analysis
Total Claims: 11References Cited (Backward Citations)
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