LCMOS displays fabricated with implant treated silicon wafers

Claim 1

In a liquid crystal device having a plurality of separately activatable liquid crystal cells, the structure comprising: a substrate above which each of said liquid crystal cell is disposed; an epitaxial layer on said substrate, said epitaxial layer including a semiconductor layer overlying a first dielectric layer; a plurality of source, channel and drain elements formed in said semiconductor layer, each said source element comprising a first plate of a capacitor having first and second plates, the second plate comprising said substrate; an insulating layer formed on said semiconductor layer; a gate element formed on said insulating layer above each said channel element; a second dielectric layer formed over each said gate element and said insulating layer; and a plurality of electrodes, each for activating one of said cells formed on said second dielectric layer and having an extension extending through said second dielectric layer and insulting layer to contact one of said source elements; wherein said substrate comprises a substrate free of localized diffusions.