US4828668A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Sputtering system for deposition on parallel substrates
Assignee: Semiconductor Energy Laboratory Co Ltd
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Filing: 1987-03-09
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Granted: 1989-05-09
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Expires: 2007-03-09
Abstract
Abstract An improved sputtering system for depositing film on a substrate is disclosed. The system comprises a vacuum chamber, a pair of electrodes with a target inbetween, a cart on which a plurality of substrates are mounted and a transportation mechanism for transporting the cart passing through the deposition space between the electrodes. The substrates are mounted perpendicular to the electric field induced by the pair of electrodes.
Inventors
- 👤 Shunpei Yamazaki
- 👤 Kunio Suzuki
- 👤 Mikio Kinka
- 👤 Takeshi Fukada
- 👤 Masayoshi Abe
- 👤 Katsuhiko Shibata
- 👤 Hisato Shinohara
- 👤 Masato Susukida
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 17:17
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/56; C23C14/34; C23C14/3464
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
84 words
A sputtering device comprising: a vacuum chamber; a vacuum pump for evacuating said vacuum chamber; a pair of targets being arranged opposite to each other in said chamber and forming a sputtering space in between; a power supply for supplying an alternating voltage between said targets; and means for supporting a plurality of substrates between said targets, said substrates being supported with major surfaces in an alignment substantially parallel to the electric field induced between said targets and said substrates being at grounded potential.
Claim 2
Dependent Claim
84 words
A sputtering device comprising: a vacuum chamber; a vacuum pump for evacuating said vacuum chamber; a pair of targets being arranged opposite to each other in said chamber and forming a sputtering space in between; a power supply for supplying an alternating voltage between said targets; and means for supporting a plurality of substrates between said targets, said substrates being supported with major surfaces in an alignment substantially parallel to the electric field induced between said targets and said substrates being at grounded potential.
Claim 3
Dependent Claim
124 words
A sputtering system comprising: a vacuum chamber; a vacuum pump for said vacuum chamber; a pair of targets being opposite to each other and forming a sputtering space in between; a power supply for supplying an alternating voltage between said targets in a manner that, during sputtering, the gross time for which one target functions as an anode and the other as a cathode is the same as the gross time for which the one target functions as a cathode and the other as an anode; and means for supporting a plurality of substrates between said targets, said substrates being supported with major surfaces in an alignment substantially parallel to the electric field induced between said target and said substrates being at ground potential.
Claim 4
Dependent Claim
124 words
A sputtering system comprising: a vacuum chamber; a vacuum pump for said vacuum chamber; a pair of targets being opposite to each other and forming a sputtering space in between; a power supply for supplying an alternating voltage between said targets in a manner that, during sputtering, the gross time for which one target functions as an anode and the other as a cathode is the same as the gross time for which the one target functions as a cathode and the other as an anode; and means for supporting a plurality of substrates between said targets, said substrates being supported with major surfaces in an alignment substantially parallel to the electric field induced between said target and said substrates being at ground potential.
Claim 5
Dependent Claim
37 words
A sputtering system of claim 1 or 2 further comprising a cart provided with said supporting means thereon and a transportation mechanism for transporting said cart in a direction passing through the sputtering space between said targets.
Claim 6
Dependent Claim
19 words
A sputtering system of claim 3 wherein said supporting means supports thereon a plurality of substrates back to back.
Claim 7
Dependent Claim
17 words
A sputtering system of claim 3 further comprising means for grounding said substrates supported in said chamber.
Claim 8
Dependent Claim
19 words
A sputtering system of claim 5 wherein said targets are biased by the same level in the opposed phases.
Claim 9
Dependent Claim
17 words
A sputtering system of claim 3 wherein said supporting means supports said substrates in a floating condition.
Claim 10
Dependent Claim
19 words
A sputtering system of claim 7 wherein said targets are supplied with said RF voltage in the opposed phases.
Claim 11
Dependent Claim
25 words
A sputtering system of claim 7 wherein said power supply is composed of an RF voltage source and a DC voltage source connected in series.
Claim 12
Dependent Claim
15 words
A sputtering system of claim 3 wherein said power supply is an RF voltage source.
Claim 13
Dependent Claim
20 words
The system of claim 1 wherein said supporting means is a cart which can be moved through said sputtering space.
Claim 14
Dependent Claim
14 words
The system of claim 11 wherein two substrates are mounted on said cart back-to-back.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-05-08 | 1992-11-07 | 1993-05-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-05-08 | 1996-11-07 | 1997-05-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-05-08 | 2000-11-07 | 2001-05-09 | $7700.00 | Window Closed / Lapsed |