US4814243A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Thermal processing of photoresist materials
Assignee: AT&T Inc
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Filing: 1987-09-08
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Granted: 1989-03-21
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Expires: 2007-09-08
Abstract
Abstract In an image reversal process (12), a photoresist coating on a wafer is baked in an oven (19) in the presence of amine gas to fix the exposed photoresist portion (14). A computer (21) is programmed with a characterization of the photoresist film. The output of a temperature sensing element (23) mounted on the wafer is directed to the computer which, in response, controls introduction of the amine gas and withdrawal of the wafer after a predetermined extent of reaction in the coating.
Inventors
- 👤 David H. Ziger
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 05:47
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/38; G03F7/20; G03F7/2022; G03F7/265
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
206 words
A method for making devices comprising the steps of coating a substrate with a radiation sensitive film, masking a first portion of the film and exposing an unmasked second portion to first actinic radiation, baking the film in oven for a time and at a temperature to react substantially certain constituents of the film produced by the first actinic radiation in the second portion of the radiation-sensitive film, withdrawing the substrate from the oven and exposing the radiation-sensitive film to second actinic radiation to which only the first portion of the film is sensitive, developing the radiation-sensitive film, and using the developed film as a mask for selectively processing the substrate, characterized by the steps of: programming a computer with information describing the extent of the reaction and consequent decomposition of certain compounds within the film resulting from heat application; mounting a temperature-sensing element on the radiation-sensitive film and directing the output of the temperature sensing element to the computer during the baking step; and using the computer to control withdrawal of the substrate from the oven in accordance with the information programmed, temperature information from the temperature-sensing element, and elapsed time, such that the substrate is withdrawn when a predetermined extent of reaction is reached.
Claim 2
Independent Claim
206 words
A method for making devices comprising the steps of coating a substrate with a radiation sensitive film, masking a first portion of the film and exposing an unmasked second portion to first actinic radiation, baking the film in oven for a time and at a temperature to react substantially certain constituents of the film produced by the first actinic radiation in the second portion of the radiation-sensitive film, withdrawing the substrate from the oven and exposing the radiation-sensitive film to second actinic radiation to which only the first portion of the film is sensitive, developing the radiation-sensitive film, and using the developed film as a mask for selectively processing the substrate, characterized by the steps of: programming a computer with information describing the extent of the reaction and consequent decomposition of certain compounds within the film resulting from heat application; mounting a temperature-sensing element on the radiation-sensitive film and directing the output of the temperature sensing element to the computer during the baking step; and using the computer to control withdrawal of the substrate from the oven in accordance with the information programmed, temperature information from the temperature-sensing element, and elapsed time, such that the substrate is withdrawn when a predetermined extent of reaction is reached.
Claim 3
Dependent Claim
39 words
The method of claim 1 further characterized by the step of: using the computer to control introduction into the oven of amine gas in response to a signal from the temperature-sensing element indicating a threshold value of substrate temperature.
Claim 4
Dependent Claim
37 words
The method of claim 2 further characterized in that: the first actinic radiation produces carboxylic acid in the second portion of the film; and the steps of baking and introducing amine gas controllably decompose such carboxylic acid.
Claim 5
Dependent Claim
42 words
The method of claim 3 further characterized in that: the second actinic radiation produces carboxylic acid in the first portion of the film; and the developing step selectively dissolves the first portion of the film while leaving the second portion substantially intact.
Claim 6
Dependent Claim
53 words
The method of claim 2 further characterized in that the programming step comprises the step of characterizing the decomposition of a photoactive compound in the first portion of the film in response to applied heat so that when such photoactive compound decomposition reaches a predetermined value, the substrate is withdrawn from the oven.
Claim 7
Independent Claim
140 words
A method for making devices including thereon a pattern comprising the steps of coating a body with a radiation-sensitive coating, masking part of the coating with a mask describing the pattern, exposing part of the coating to actinic radiation directed through the mask, developing the radiation-sensitive coating so as to define thereon the pattern, and using the pattern to process selectively the body, characterized by the steps of: baking the radiation-sensitive coating on the body; programming a computer with information characterizing a reaction in the radiation-sensitive coating in response to applied heat; mounting a temperature sensing element on the radiation-sensitive film and directing the output of the temperature sensing element to the computer during the baking step; and using the computer to control withdrawal of the substrate from the oven when the extent of reaction has reached a predetermined value.
Claim 8
Independent Claim
140 words
A method for making devices including thereon a pattern comprising the steps of coating a body with a radiation-sensitive coating, masking part of the coating with a mask describing the pattern, exposing part of the coating to actinic radiation directed through the mask, developing the radiation-sensitive coating so as to define thereon the pattern, and using the pattern to process selectively the body, characterized by the steps of: baking the radiation-sensitive coating on the body; programming a computer with information characterizing a reaction in the radiation-sensitive coating in response to applied heat; mounting a temperature sensing element on the radiation-sensitive film and directing the output of the temperature sensing element to the computer during the baking step; and using the computer to control withdrawal of the substrate from the oven when the extent of reaction has reached a predetermined value.
Claim 9
Dependent Claim
61 words
The method of claim 6 further characterized in that the radiation-sensitive coating is partially exposed to first actinic radiation prior to the baking step; the predetermined value of the sensitizer decomposition is sufficiently low that the previously unexposed radiation-sensitize coating remains sensitive to actinic radiation; and the previously unexposed radiation-sensitive coating is exposed to second actinic radiation after the baking step.
Claim 10
Dependent Claim
46 words
The method of claim 6 further characterized in that the reaction results in a decomposition of a photoactive compound in the radiation-sensitive coating, and the computer is used to control withdrawal of the substrate when the decomposition of the photoactive compound has reached a predetermined value.
Claim 11
Dependent Claim
72 words
The method of claim 1 further characterized in that the first portion of the film initially contains a first concentration c o d of a photoactive compound, and after baking the first portion of the film contains a second concentration c f d of said photoactive compound; and the computer is used to control the withdrawal of the substrate when the ratio c f d /c o d reaches a predetermined value.
Claim 12
Dependent Claim
67 words
The method of claim 6 further characterized in that before baking the radiation sensitive coating contains a first concentration c o d of a photoactive compound and after a baking the coating contains a second concentration c f d of said photoactive compound, and the computer is used to control withdrawal of the substrate when the ratio c f d /c o d reaches a predetermined value.
References Cited (Backward Citations)
JPS56331A
Cited
US4456679A
Cited
US4717645A
Cited
US4569717A
Cited
US4567132A
Cited
US4568631A
Cited
US4624910A
Cited
US4647172A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-03-20 | 1992-09-19 | 1993-03-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-03-20 | 1996-09-19 | 1997-03-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-03-20 | 2000-09-19 | 2001-03-21 | $7700.00 | Window Closed / Lapsed |