US4810619A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photolithography over reflective substrates comprising a titanium nitride layer
Assignee: Intersil Corp
•
Filing: 1987-08-12
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Granted: 1989-03-07
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Expires: 2007-08-12
Abstract
Abstract For fine line lithography of a reflective substrate, a layer of titanium nitride is applied between the reflective surface and the photoresist that is absorbant at the wavelength of light used to expose the photoresist. The resolution of the photoresist is improved, even when an absorbant dye is used in the photoresist. The titanium nitride can be readily removed at the same time as the reflective layer is patterned, thereby avoiding the need of a separate step to remove the absober layer during etching of the reflective substrate.
Inventors
- 👤 Thomas R. Pampalone
- 👤 Brian C. Lee
- 👤 Edward C. Douglas
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 14:35
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/091
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
81 words
In a process for patterning a reflective layer on a substrate which comprises depositing said reflective layer, coating said layer with photoresist, exposing a portion of said photoresist, developing said photoresist to provide openings in the photoresist layer to the reflective layer and etching away the reflective layer in said opening, the improvement which comprises providing a titanium nitride layer intermediate the photoresist layer and the reflective layer, and after the etching step removing the remaining photoresist and the titanium nitride.
Claim 2
Dependent Claim
81 words
In a process for patterning a reflective layer on a substrate which comprises depositing said reflective layer, coating said layer with photoresist, exposing a portion of said photoresist, developing said photoresist to provide openings in the photoresist layer to the reflective layer and etching away the reflective layer in said opening, the improvement which comprises providing a titanium nitride layer intermediate the photoresist layer and the reflective layer, and after the etching step removing the remaining photoresist and the titanium nitride.
Claim 3
Dependent Claim
15 words
A process according to claim 1 wherein the reflective layer is a layer of aluminum.
Claim 4
Dependent Claim
16 words
A process according to claim 1 wherein the reflective layer is a layer of tantalum silicide.
Claim 5
Dependent Claim
14 words
A process according to claim 1 wherein the titanium nitride is stoichiometric titanium nitride.
Claim 6
Dependent Claim
15 words
A process according to claim 1 wherein the titanium nitride is a non-stoichiometric titanium nitride.
Claim 7
Dependent Claim
12 words
A process according to claim 1 wherein the titanium nitride contains oxygen.
Claim 8
Dependent Claim
12 words
A process according to claim 1 wherein the substrate has topographical features.
Claim 9
Dependent Claim
17 words
A process according to claim 1 wherein the photoresist contains an absorbent dye, absorbent at said frequency.
Claim 10
Dependent Claim
20 words
A process according to claim 1 wherein the reflective layer is aluminum and the etchant is a plasma containing chlorine.
Claim 11
Dependent Claim
21 words
A process according to claim 4 wherein the reflective layer is tantalum silicide and the etchant is a plasma containing chlorine.
Claim 12
Dependent Claim
14 words
A process according to claim 3 wherein the etchant is a plasma containing chloroform.
Claim 13
Dependent Claim
39 words
A process according to claim 1 wherein the reflective layer is tantalum silicide, the titanium nitride is TiO x N y , wherein x is about 0.8-1.3, y is about 0.8-1.2 and the etchant is a plasma containing chlorine.
Claim 14
Dependent Claim
25 words
A process according to claim 1 in which the remaining photoresist and the titanium nitride are removed at the same time with the same material.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-03-06 | 1992-09-05 | 1993-03-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-03-06 | 1996-09-05 | 1997-03-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-03-06 | 2000-09-05 | 2001-03-07 | $7700.00 | Window Closed / Lapsed |