Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
218 words
A semiconductor device having a first electrode, a second electrode, a unidirectional switching circuit connected between said first and second electrodes and a control electrode for controlling said unidirectional switching circuit, said unidirectional switching circuit comprising: a field effect transistor including a first semiconductor region of a first conductivity type, second and third regions of a second conductivity type which are formed at a first surface of said first semiconductor region and spaced from each other, said second region being in ohmic contact with said first electrode, said third region being made in a two-layer form of a low-impurity concentration layer exposed to said first surface of said first semiconductor region and a buried layer buried into said first semiconductor region and having a higher concentration of impurities than that of said low-impurity concentration layer, and a gate electrode facing an area of said first surface of said first semiconductor region disposed between said second and third regions having an insulating layer formed between said area and said gate electrode, said gate electrode being connected to said control electrode; and a Schottky-barrier diode including said low-impurity concentration layer and said second electrode which is formed of metallic material, said second electrode being in contact with said low-impurity concentration layer so as to provide a Schottky barrier effect therebetween.
Claim 2
Dependent Claim
218 words
A semiconductor device having a first electrode, a second electrode, a unidirectional switching circuit connected between said first and second electrodes and a control electrode for controlling said unidirectional switching circuit, said unidirectional switching circuit comprising: a field effect transistor including a first semiconductor region of a first conductivity type, second and third regions of a second conductivity type which are formed at a first surface of said first semiconductor region and spaced from each other, said second region being in ohmic contact with said first electrode, said third region being made in a two-layer form of a low-impurity concentration layer exposed to said first surface of said first semiconductor region and a buried layer buried into said first semiconductor region and having a higher concentration of impurities than that of said low-impurity concentration layer, and a gate electrode facing an area of said first surface of said first semiconductor region disposed between said second and third regions having an insulating layer formed between said area and said gate electrode, said gate electrode being connected to said control electrode; and a Schottky-barrier diode including said low-impurity concentration layer and said second electrode which is formed of metallic material, said second electrode being in contact with said low-impurity concentration layer so as to provide a Schottky barrier effect therebetween.
Claim 3
Dependent Claim
260 words
A semiconductor matrix circuit having a plurality of row lines, a plurality of column lines, unidirectional switching circuits formed at selected ones of respective intersections of said row lines and said column lines, and a plurality of input lines formed correspondingly to said row lines, each unidirectional switching circuit comprising: a field effect transistor including a first semiconductor region of a first conductivity type, second and third regions of a second conductivity type which are formed at a first surface of said first semiconductor region and spaced from each other, said second region being in ohmic contact with a row line passing through an associated intersection, said third region being made in a two-layer form of a low-impurity concentration layer exposed to said first surface of said first semiconductor region and a buried layer buried into said first semiconductor region and having a higher concentration of impurities than that of said low-impurity concentration layer, and a gate electrode facing an area of said first surface of said first semiconductor region disposed between said second and third regions having an insulating layer formed between said area and said gate electrode, said gate electrode being connected to an input line corresponding to said row line passing through said associated intersection, and a Schottky-barrier diode including said low-impurity concentration layer and said second electrode which is formed of metallic material said second electrode being in contact with said low-impurity concentration layer so as to provide a Schottky-barrier effect therebetween, said second electrode being connected to a column line passing through said associated intersection.
Claim 4
Dependent Claim
260 words
A semiconductor matrix circuit having a plurality of row lines, a plurality of column lines, unidirectional switching circuits formed at selected ones of respective intersections of said row lines and said column lines, and a plurality of input lines formed correspondingly to said row lines, each unidirectional switching circuit comprising: a field effect transistor including a first semiconductor region of a first conductivity type, second and third regions of a second conductivity type which are formed at a first surface of said first semiconductor region and spaced from each other, said second region being in ohmic contact with a row line passing through an associated intersection, said third region being made in a two-layer form of a low-impurity concentration layer exposed to said first surface of said first semiconductor region and a buried layer buried into said first semiconductor region and having a higher concentration of impurities than that of said low-impurity concentration layer, and a gate electrode facing an area of said first surface of said first semiconductor region disposed between said second and third regions having an insulating layer formed between said area and said gate electrode, said gate electrode being connected to an input line corresponding to said row line passing through said associated intersection, and a Schottky-barrier diode including said low-impurity concentration layer and said second electrode which is formed of metallic material said second electrode being in contact with said low-impurity concentration layer so as to provide a Schottky-barrier effect therebetween, said second electrode being connected to a column line passing through said associated intersection.