Patent US4797179A successfully refreshed from Google Patents.
US4797179A
Expired / Lapsed
US
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Fabrication of integral lenses on LED devices
Assignee: LYTEL Corp A CORP OF
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Filing: 1987-06-09
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Granted: 1989-01-10
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Expires: 2007-06-09
Abstract
Abstract Integrated lenses are fabricated on LED devices by chemical etching mesas through mask openings which are non-circular. The mask is removed and the mesas are then etched to form spherical lenses.
Inventors
- 👤 George P. Watson
- 👤 Kathleen Meehan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 20:16
CPC Classifications
H; H10; H10H; H10H20/00; H10H20/80; H10H20/81; H10H20/819
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
81 words
A method of fabricating LED devices from a wafer having LED's defined therein, comprising forming a substantially circular first masking portion over each area of said wafer from which radiation would be emitted; and forming a second masking portion on said wafer to define unmasked portions associated with said first masking portions; said unmasked portions being non-circular and shaped relative to a chemical etchant so that said chemical etchant can etch said wafer to produce mesas having substantially circular cross sections.
Claim 2
Independent Claim
81 words
A method of fabricating LED devices from a wafer having LED's defined therein, comprising forming a substantially circular first masking portion over each area of said wafer from which radiation would be emitted; and forming a second masking portion on said wafer to define unmasked portions associated with said first masking portions; said unmasked portions being non-circular and shaped relative to a chemical etchant so that said chemical etchant can etch said wafer to produce mesas having substantially circular cross sections.
Claim 3
Dependent Claim
16 words
The method of claim 1, further comprising thereafter, etching said masked wafer to produce said mesas.
Claim 4
Dependent Claim
16 words
The method of claim 2, wherein said etching is carried out using an isotropic chemical etchant.
Claim 5
Dependent Claim
11 words
The method of claim 3, wherein said chemical etchant is BPK.
Claim 6
Dependent Claim
22 words
The method of claim 2, further comprising the steps of removing the masking portions and etching said mesas to form spherical lenses.
Claim 7
Dependent Claim
12 words
The method of claim 5, wherein said mesas are etched using BPK.
Claim 8
Dependent Claim
28 words
The method of claim 1, wherein said unmasked portions define substantially rectangular shapes in which (111A) planes of said wafer substantially align with diagonals of said rectangular shapes.
Claim 9
Dependent Claim
12 words
The method of claim 7, wherein said rectangular shapes are substantially squares.
Claim 10
Independent Claim
85 words
A method of fabricating closely spaced recessed mesas on a wafer, comprising forming a substantially circular first masking portion over each area of said wafer at which a mesa is to be produced; and forming a second masking portion on said wafer to define unmasked portions associated with said first masking portions; said unmasked portions being non-circular and shaped relative to a chemical etchant so that said chemical etchant can etch said wafer to produce said mesas whereby said mesas have substantially circular cross sections.
Claim 11
Independent Claim
85 words
A method of fabricating closely spaced recessed mesas on a wafer, comprising forming a substantially circular first masking portion over each area of said wafer at which a mesa is to be produced; and forming a second masking portion on said wafer to define unmasked portions associated with said first masking portions; said unmasked portions being non-circular and shaped relative to a chemical etchant so that said chemical etchant can etch said wafer to produce said mesas whereby said mesas have substantially circular cross sections.
Claim 12
Dependent Claim
16 words
The method of claim 9, further comprising thereafter, etching said masked wafer to produce said mesas.
Claim 13
Dependent Claim
16 words
The method of claim 10, wherein said etching is carried out using an isotropic chemical etchant.
Claim 14
Dependent Claim
11 words
The method of claim 11, wherein said chemical etchant is BPK.
Claim 15
Dependent Claim
28 words
The method of claim 9, wherein said unmasked portions define substantially rectangular shapes in which (111A) planes of said wafer substantially align with diagonals of said rectangular shapes.
Claim 16
Dependent Claim
12 words
The method of claim 13, wherein said rectangular shapes are substantially squares.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-01-10 | 1992-07-11 | 1993-01-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-01-10 | 1996-07-11 | 1997-01-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-01-10 | 2000-07-11 | 2001-01-10 | $7700.00 | Window Closed / Lapsed |