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US4796228A Expired / Lapsed US ⏱️ 0.0 years remaining

Erasable electrically programmable read only memory cell using trench edge tunnelling

Assignee: Texas Instruments Inc
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Filing: 1986-06-02
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Granted: 1989-01-03
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Expires: 2006-06-02
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Abstract

Abstract An electrically programmable read only memory cell formed in a face of a semiconductor substrate which includes a floating gate transistor having a floating gate and a control gate formed at least partially in a trench in the substrate. The trench has bottom corners sufficiently sharp so as to enhance the likelihood of tunnelling between corner regions of the trench and the floating gate over that between planar surface regions of the trench and floating gate.

Inventors

  • 👤 David A. Baglee

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 20:49
CPC Classifications
G; G11; G11C; G11C16/00; G11C16/02; G11C16/04; G11C16/0408; G11C16/0441; H; H10; H10D; H10D30/00; H10D30/60; H10D30/68; H10D30/681; H10D30/683; H10D64/00; H10D64/01; H10D64/031; H10D64/035

Claims Analysis

Total Claims: 17
Claim 1
Independent Claim 75 words
An electrically programmable read only memory cell formed in a face of a semiconductor substrate, comprising a floating gate transistor having a floating gate and a control gate formed at least partially in a trench in said substrate wherein said trench has edges sufficiently sharp so as to enhance the likelihood of tunneling between corner regions of said trench and said floating gate over that between planar surface regions of said trench and floating gate.
Claim 2
Dependent Claim 75 words
An electrically programmable read only memory cell formed in a face of a semiconductor substrate, comprising a floating gate transistor having a floating gate and a control gate formed at least partially in a trench in said substrate wherein said trench has edges sufficiently sharp so as to enhance the likelihood of tunneling between corner regions of said trench and said floating gate over that between planar surface regions of said trench and floating gate.
Claim 3
Dependent Claim 19 words
A cell according to claim 1, wherein said substrate is silicon and said floating and control gates are polysilicon.
Claim 4
Dependent Claim 48 words
A cell according to claim 1, including a tunnel device coupled to a source of said floating gate transistor and having a floating gate connected to the floating gate of said floating gate transistor and a control gate connected to the control gate of said floating gate transistor.
Claim 5
Dependent Claim 21 words
A cell according to claim 1, including a selection transistor formed in said substrate in series with said floating gate transistor.
Claim 6
Dependent Claim 16 words
A cell according to claim 1, wherein walls and a bottom of said trench are rectangular.
Claim 7
Dependent Claim 25 words
A cell according to claim 2, wherein said substrate is P-type silicon, said and the thickness of said polysilicon gates are each about 0.4 microns.
Claim 8
Dependent Claim 13 words
A device according to claim 2, wherein said polysilicon layers are conformally deposited.
Claim 9
Dependent Claim 20 words
A cell according to claim 1, including a common moat region on at least two opposed ends of said trench.
Claim 10
Dependent Claim 36 words
A cell according to claim 5, wherein said trench has a width in the range of about 2 to 5 microns, a length of 2 to 5 microns and a depth of 1 to 3 microns.
Claim 11
Dependent Claim 27 words
A cell according to claim 2, including a silicon dioxide region between said substrate and said floating gate having a thickness of approximately 250 to 350 Angstroms.
Claim 12
Dependent Claim 12 words
A cell according to claim 1, wherein said cell is electrically erasable.
Claim 13
Dependent Claim 85 words
An electrically erasable programmable read only memory cell formed in a face of a semiconductor body, comprising: a floating gate transistor having both a floating gate and a control gate formed at least partially in a trench in said body with a channel region extending around said trench, said trench having bottom edges sufficiently sharp so that with a programming voltage applied between said channel region and said control gate electron tunnelling occurs between said channel region and said floating gate proximate said edge regions.
Claim 14
Dependent Claim 85 words
An electrically erasable programmable read only memory cell formed in a face of a semiconductor body, comprising: a floating gate transistor having both a floating gate and a control gate formed at least partially in a trench in said body with a channel region extending around said trench, said trench having bottom edges sufficiently sharp so that with a programming voltage applied between said channel region and said control gate electron tunnelling occurs between said channel region and said floating gate proximate said edge regions.
Claim 15
Dependent Claim 21 words
A cell according to claim 12, wherein said programming voltage is in the range of approximately 10 volts to 28 volts.
Claim 16
Dependent Claim 53 words
A cell according to claim 12, wherein said trench is surrounded by a diffused moat region of a first conductivity type and has a difficult channel region of the first conductivity type extending around sides and a bottom of said trench from the moat one side to the moat on another opposite side.
Claim 17
Dependent Claim 29 words
A cell according to claim 14, wherein said semiconductor body is silicon, said floating gate and control gates are doped polysilicon and said moat and channel regions are N-type.

References Cited (Backward Citations)

US4209849A Cited
US4668970A Cited
US4695979A Cited
US4698900A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-01-03 1992-07-04 1993-01-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-01-03 1996-07-04 1997-01-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-01-03 2000-07-04 2001-01-03 $7700.00 Window Closed / Lapsed

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