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US4789622A Expired / Lapsed US ⏱️ 0.0 years remaining

Production of resist images, and a suitable dry film resist

Assignee: BASF SE
•
Filing: 1986-07-16
•
Granted: 1988-12-06
•
Expires: 2006-07-16
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Abstract

Abstract In the production of resist images by application of a radiation-sensitive positive-working resist layer based on degradable polymers onto a substrate, imagewise exposure of the resist layer to actinic radiation and removal of the irradiated parts of the layer with development of the resist image, the radiation-sensitive resist layer used is composed of poly(diacetylenes), in particular soluble ones. Preferably, the radiation-sensitive resist layer based on the poly(diacetylenes) contains sensitizers which can be activated by actinic radiation and which, after being activated, induce or accelerate molecular degradation of the poly(diacetylenes). Dry film resists comprise a temporary dimensionally stable base and a radiation-sensitive resist layer which is applied on the base, can be degraded by exposure to actinic radiation and is based on poly(diacetylenes), in particular soluble ones, with or without a cover sheet on top of the said resist layer.

Inventors

  • 👤 Reinhold J. Leyrer
  • 👤 Gerhard Wegner
  • 👤 Michael Mueller

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 07:28
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; Y; Y10; Y10S; Y10S430/00; Y10S430/145; Y10S430/146; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/949

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 48 words
A dry film resist comprising a dimensionally stable temporary base and a solid laminatable radiation-sensitive positive-working resist layer applied on the base, the said radiation-sensitive resist layer containing as the main constituent at least one soluble poly (diacetylene) and a sensitizer which can be activated by heat radiation.
Claim 2
Dependent Claim 48 words
A dry film resist comprising a dimensionally stable temporary base and a solid laminatable radiation-sensitive positive-working resist layer applied on the base, the said radiation-sensitive resist layer containing as the main constituent at least one soluble poly (diacetylene) and a sensitizer which can be activated by heat radiation.
Claim 3
Dependent Claim 17 words
A dry film resist as defined in claim 1, wherein the radiation-sensitive resist layer contains a plasticizer.
Claim 4
Dependent Claim 17 words
A dry film resist as defined in claim 2, wherein the resist layer is partially defined crystalline.
Claim 5
Dependent Claim 23 words
A dry film resist as defined in claim 2, wherein the poly(diacetylene) has a weight average molecular weight of from 10,000 to 2,000,000.
Claim 6
Dependent Claim 61 words
A dry film resist as defined in claim 2, wherein the poly(diacetylene) contains repeating units of the formula (II) ═C(R.sup.1)--C.tbd.C--C(R.sup.2)═ (II) where R 1 and R 2 are identical or different and independently of one another are each an aliphatic, aromatic or mixed aliphatic-aromatic radical of 1 to 50 carbon atoms, which radicals are saturated or unsaturated and unsubstituted or substituted.
Claim 7
Dependent Claim 30 words
A dry film resist as defined in claim 2, wherein, in the poly(diacetylene) of the formula (II), R 1 and R 2 contain ester, amide, sulfonate, urethane and/or urea groups.
Claim 8
Dependent Claim 40 words
A dry film resist as claimed in claim 2, wherein the radiation-sensitive resist layer contains a sensitizer which can be activated by actinic radiation and which, after being activated, is capable of inducing or accelerating molecular degradation of the poly(diacetylene).
Claim 9
Dependent Claim 23 words
A dry film resist as defined in claim 2, wherein the resist includes a strippable cover sheet on top of the resist layer.
Claim 10
Dependent Claim 33 words
A dry film resist as defined in claim 2, wherein the resist layer contains sensitizers which can be activated by actinic light as well as sensitizers which can be activated by heat radiation.
Claim 11
Dependent Claim 24 words
A dry film resist as defined in claim 5, wherein at least one of the radicals R 1 and R 2 contains a heteroatom.

References Cited (Backward Citations)

CA1043945A Cited
US4220747A Cited
US4208501A Cited
US4339951A Cited
US4215208A Cited
US4228126A Cited
US4273906A Cited
EP0011798A1 Cited
US4389217A Cited
EP0022618A2 Cited
EP0021695A2 Cited
EP0077577A2 Cited
US4258079A Cited
US4314021A Cited
EP0050746A2 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1991-12-06 1992-06-06 1992-12-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1995-12-06 1996-06-06 1996-12-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1999-12-06 2000-06-06 2000-12-06 $7700.00 Window Closed / Lapsed

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