US4786887A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Thin-film strain gauge system and method of manufacturing same
Assignee: US Philips Corp
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Filing: 1987-07-30
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Granted: 1988-11-22
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Expires: 2007-07-30
Abstract
Abstract Thin film strain gauge system consisting of an elastically deformable flexible metallic substrate on which an electrically insulating layer of a plasma-polymerized material, in particular of Si:N:O:C:H-containing compounds and thereon a structured resistance layer as well as an electrically readily conducting layer having a structure for the electrical contacting are provided.
Inventors
- 👤 Udo Bringmann
- 👤 Olaf H. Dossel
- 👤 Klaus W. Gerstenberg
- 👤 Gerhard Kursten
- 👤 Reiner U. Orlowski
- 👤 Detlef G. Schon
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:57
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; C23C16/5096; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; H01J37/34; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49082; Y10T29/49103
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
60 words
A thin-film strain gauge system comprising an elastically deformable flexible substrate, an insulating layer present on a surface of said substrate, a resistance layer on the surface of said insulating layer away from said substrate and a patterned electrically conductive layer on the surface of said resistance layer characterized in that the insulating layer consists of a plasma polymerized material.
Claim 2
Dependent Claim
60 words
A thin-film strain gauge system comprising an elastically deformable flexible substrate, an insulating layer present on a surface of said substrate, a resistance layer on the surface of said insulating layer away from said substrate and a patterned electrically conductive layer on the surface of said resistance layer characterized in that the insulating layer consists of a plasma polymerized material.
Claim 3
Dependent Claim
22 words
A thin-film strain gauge system as claimed in claim 1, characterized in that the electrically insulating layer (3) consists of Si:N:O:C:H-containing compounds.
Claim 4
Dependent Claim
29 words
A thin-film strain gauge system as claimed in claim 2, characterized in that the electrically insulating layer (3) consists of plasma-polymerized oxygen containing silicones or analogous nitrogen containing silicones.
Claim 5
Dependent Claim
30 words
A thin-film strain gauge system as claimed in claim 1, characterized in that the electrically insulating layer (3) has a thickness in the range from 0.2 μm to 20 μm.
Claim 6
Dependent Claim
19 words
A thin-film strain gauge system as claimed in claim 1, characterized in that the substrate (1) consists of steel.
Claim 7
Dependent Claim
21 words
A thin-film strain gauge system as claimed in claim 1, characterized in that the substrate (1) consists of a copper-beryllium alloy.
Claim 8
Dependent Claim
22 words
A thin-film strain gauge system as claimed in claim 1, characterized in that the resistance layer (5) consists of a metal alloy.
Claim 9
Dependent Claim
22 words
A thin-film strain gauge system as claimed in claim 7, characterized in that the resistance layer (5) consists of a nickel-chromium alloy.
Claim 10
Dependent Claim
23 words
A thin-film strain gauge system as claimed in claim 1, characterized in that the resistance layer (5) consists of a doped semiconductor material.
Claim 11
Dependent Claim
24 words
A thin-film strain gauge system as claimed in claim 9, characterized in that the resistance layer consists of silicon doped with boron or phosphorus.
Claim 12
Independent Claim
72 words
A method of manufacturing a thin-film strain gauge system comprising: (a) providing an electrically insulating layer of a plasma-polymerized material on an elastically deformable, flexible, substrate by deposition from a gaseous phase which phase comprises a plasma-polymerizable material; (b) providing a resistance layer on said electrically insulating layer, (c) structuring said resistance layer to form at least one resistance path and (d) forming thin layer electrical connections on said structured resistance layer.
Claim 13
Independent Claim
72 words
A method of manufacturing a thin-film strain gauge system comprising: (a) providing an electrically insulating layer of a plasma-polymerized material on an elastically deformable, flexible, substrate by deposition from a gaseous phase which phase comprises a plasma-polymerizable material; (b) providing a resistance layer on said electrically insulating layer, (c) structuring said resistance layer to form at least one resistance path and (d) forming thin layer electrical connections on said structured resistance layer.
Claim 14
Dependent Claim
74 words
The method of claim 11 wherein the substrate is introduced into a plasma chemical vapor deposition device (PCVD device), monomeric gases, from which polymerized oxygen containing silicon or analogous nitrogen containing silicones can be formed by high frequency excitation, are introduced into said PCVD device said gases are subjected to said high frequency excitation to thereby form said polymerized silicone and an insulating layer, formed from said polymerized silicones is deposited on said substrate.
Claim 15
Dependent Claim
18 words
A method as claimed in claim 12, characterized in that hexamethyldisilazane is introduced as a monomeric process gas.
Claim 16
Dependent Claim
18 words
A method as claimed in claim 11, characterized in that the resistance layer is provided by vapour deposition.
Claim 17
Dependent Claim
20 words
A method as claimed in claim 11, characterized in that the resistance layer is provided by cathodic high frequency sputtering.
Claim 18
Dependent Claim
20 words
A method as claimed in claim 11, characterized in that the resistance layer is provided by plasma chemical vapour deposition.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-11-22 | 1992-05-23 | 1992-11-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-11-22 | 1996-05-23 | 1996-11-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-11-22 | 2000-05-23 | 2000-11-22 | $7700.00 | Window Closed / Lapsed |