Patent US4774437A successfully refreshed from Google Patents.
US4774437A
Expired / Lapsed
US
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Inverted re-entrant magnetron ion source
Assignee: Varian Semiconductor Equipment Associates Inc
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Filing: 1986-02-28
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Granted: 1988-09-27
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Expires: 2006-02-28
Abstract
Abstract An ion source for an intense ion beam from a solid source is formed with a cathode around a central anode. A source of magnetic field with closely spaced poles is formed around a central region of the cathode so that the most intense region of the magnetic field is a torus on the inside of the cathode and the field at the anode is weak. A torus of plasma can be formed near the inside surface of the cathode which can be coated with solid source material. An ion beam can be extracted through an aperture in the cathode.
Inventors
- 👤 John C. Helmer
- 👤 Kenneth J. Doniger
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 10:46
CPC Classifications
H; H01; H01J; H01J27/00; H01J27/02; H01J27/08; H01J27/14; H01J37/00; H01J37/02; H01J37/04; H01J37/08
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
109 words
An ion beam source comprising: a chamber having an interior capable of being evacuated, said chamber having an axis which passes through said interior; a cathode within said chamber, said cathode surrounding but not intersecting said axis, said cathode having an aperture for passing an ion beam; a means for inducing a sharply reentrant magnetic field on said cathode, said magnetic field being concentrated at said cathode in a region adjacent said aperture and weak at said axis; anode means located outside concentrated regions of said magnetic field for imposing an electric potential; and means for extracting said ion beam through said aperture and for focusing said ion beam.
Claim 2
Dependent Claim
109 words
An ion beam source comprising: a chamber having an interior capable of being evacuated, said chamber having an axis which passes through said interior; a cathode within said chamber, said cathode surrounding but not intersecting said axis, said cathode having an aperture for passing an ion beam; a means for inducing a sharply reentrant magnetic field on said cathode, said magnetic field being concentrated at said cathode in a region adjacent said aperture and weak at said axis; anode means located outside concentrated regions of said magnetic field for imposing an electric potential; and means for extracting said ion beam through said aperture and for focusing said ion beam.
Claim 3
Dependent Claim
19 words
An ion beam source as in claim 1 wherein said anode means includes a conductor lying on said axis.
Claim 4
Dependent Claim
20 words
An ion beam source as in claim 1 wherein said anode means is a planar conductive surface intersecting said axis.
Claim 5
Dependent Claim
19 words
An ion beam source as in claim 1 wherein said cathode is a cylindrical ring centered on said axis.
Claim 6
Dependent Claim
56 words
An ion beam source as in claim 4 wherein said anode means includes a conducting rod lying on said axis, first and second conducting plates centered on said axis and connected to said conducting rod, said first and second conducting plates being located on opposite sides of said means for inducing a sharply reentrant magnetic field.
Claim 7
Dependent Claim
23 words
An ion beam source as in claim 1 wherein said cathode is a ring formed by joining four rectangular plates at their edges.
Claim 8
Dependent Claim
56 words
An ion beam source as in claim 6 wherein said anode means includes a conducting rod lying on said axis, first and second conducting plates centered on said axis and connected to said conducting rod, said first and second conducting plates being located on opposite sides of said means for inducing a sharply reentrant magnetic field.
Claim 9
Dependent Claim
25 words
A source of charged particles as in any one of claims 1-7 including a cathode liner of material which includes atoms of the beam desired.
Claim 10
Dependent Claim
60 words
An ion beam source as in claim 1 wherein said means for inducing a sharply reentrant magnetic field on said cathode comprises a first and a second magnetic pole piece located adjacent to and exteriorly of said cathode surrounding said axis, said first and said second pole pieces being separated by a selected gap, said aperture being adjacent said gap.
Claim 11
Dependent Claim
27 words
An ion beam source as in claim 9 wherein each of said first and said second pole pieces tapers inwardly toward said cathode to form said gap.
Claim 12
Dependent Claim
24 words
An ion source as in claim 9 wherein said means for extracting and for focusing is positioned in said selected gap adjacent said aperture.
Claim 13
Dependent Claim
27 words
An ion beam source as in claim 9 further including a member of magnetic material surrounding said first and second pole pieces, for forming a magnetic shield.
Claim 14
Dependent Claim
34 words
An ion beam source as in claim 1 wherein the dimension of the region surrounded by said cathode along an axis perpendicular to said axis is approximately three times the width of said gap.
Claim 15
Dependent Claim
119 words
A ion beam source, comprising: a cathode formed as a conductor generally closed about a hollow interior but having an opening at an end, said cathode having aperture means for passing an ion beam; an anode extending from outside said cathode through said opening into said hollow interior, said anode being generally centered in said hollow interior; means for producing a magnetic field with lines linking inwardly through said cathode into said hollow interior, said means for producing extending around a periphery of said cathode, said aperture means being located on said periphery, said magnetic field being concentrated in a region adjacent said aperture; and extraction means outside said cathode for extracting an ion beam through said aperture means.
Claim 16
Dependent Claim
119 words
A ion beam source, comprising: a cathode formed as a conductor generally closed about a hollow interior but having an opening at an end, said cathode having aperture means for passing an ion beam; an anode extending from outside said cathode through said opening into said hollow interior, said anode being generally centered in said hollow interior; means for producing a magnetic field with lines linking inwardly through said cathode into said hollow interior, said means for producing extending around a periphery of said cathode, said aperture means being located on said periphery, said magnetic field being concentrated in a region adjacent said aperture; and extraction means outside said cathode for extracting an ion beam through said aperture means.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-09-27 | 1992-03-28 | 1992-09-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-09-27 | 1996-03-28 | 1996-09-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-09-27 | 2000-03-28 | 2000-09-27 | $7700.00 | Window Closed / Lapsed |