Patent US4717462A successfully refreshed from Google Patents.
US4717462A
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Sputtering apparatus
Assignee: Hitachi Ltd
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Filing: 1986-10-24
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Granted: 1988-01-05
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Expires: 2006-10-24
Abstract
Abstract A sputtering apparatus comprising an intermediate electrode having a plurality of openings disposed between a cathode and a substrate electrode. The directionality of the particles which are liberated from a target by the collision of ions against the target is made remarkably uniform by the presence of the intermediate electrode, and thus a thin film having a superior step coverage can be deposited on the substrate placed on the substrate electrode.
Inventors
- 👤 Yoshio Homma
- 👤 Sukeyoshi Tsunekawa
- 👤 Shunji Sasabe
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 05:40
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; H01J37/3405; H01J37/3408; C; C23; C23C; C23C14/00; C23C14/04; C23C14/046
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
90 words
A sputtering apparatus comprising: a cathode disposed within a vacuum chamber; a substrate electrode disposed in face-to-face relationship with said cathode; and an intermediate electrode disposed between said cathode and said substrate electrode and including a plurality of openings, each of said openings having an aspect ratio between 0.1 and 3.0; wherein ions are made to collide against a target disposed on said cathode so as to liberate particles of materials of which said target is composed, thereby depositing a thin film on a substrate disposed on said substrate electrode.
Claim 2
Dependent Claim
90 words
A sputtering apparatus comprising: a cathode disposed within a vacuum chamber; a substrate electrode disposed in face-to-face relationship with said cathode; and an intermediate electrode disposed between said cathode and said substrate electrode and including a plurality of openings, each of said openings having an aspect ratio between 0.1 and 3.0; wherein ions are made to collide against a target disposed on said cathode so as to liberate particles of materials of which said target is composed, thereby depositing a thin film on a substrate disposed on said substrate electrode.
Claim 3
Dependent Claim
24 words
A sputtering apparatus according to claim 1, wherein the aspect ratio of each of said openings in said intermediate electrode is 0.3 to 1.0.
Claim 4
Dependent Claim
27 words
A sputtering apparatus according to claim 1, wherein said target is connected to either a direct current electric power source or a high frequency electric power source.
Claim 5
Dependent Claim
16 words
A sputtering apparatus according to claim 1, wherein said cathode is of a planar magnetron type.
Claim 6
Dependent Claim
24 words
A sputtering apparatus according to claim 1, wherein said substrate electrode is provided with either a high frequency or direct current electric power source.
Claim 7
Dependent Claim
20 words
A sputtering apparatus according to claim 1, wherein shutter means is further disposed between said cathode and said substrate electrode.
Claim 8
Dependent Claim
21 words
A sputtering apparatus according to claim 6, wherein said shutter means is disposed between said intermediate electrode and said substrate electrode.
Claim 9
Dependent Claim
14 words
A sputtering apparatus according to claim 1, wherein said intermediate electrode includes lattice-like openings.
Claim 10
Dependent Claim
19 words
A sputtering apparatus according to claim 1, wherein said intermediate electrode is made of either metal or alloys thereof.
Claim 11
Dependent Claim
102 words
A sputtering apparatus at least comprising: a cathode disposed within a vacuum chamber; a substrate electrode disposed in face-to-face relationship with said cathode; and an intermediate electrode disposed between said cathode and said substrate electrode and including a plurality of openings, said intermediate electrode is made of either metals or alloys thereof and is at least partially made of a soft magnetic material, wherein ions are made to collide against a target disposed on said cathode so as to liberate particles of materials of which said target is composed, thereby depositing a thin film on a substrate disposed on said substrate electrode.
Claim 12
Dependent Claim
102 words
A sputtering apparatus at least comprising: a cathode disposed within a vacuum chamber; a substrate electrode disposed in face-to-face relationship with said cathode; and an intermediate electrode disposed between said cathode and said substrate electrode and including a plurality of openings, said intermediate electrode is made of either metals or alloys thereof and is at least partially made of a soft magnetic material, wherein ions are made to collide against a target disposed on said cathode so as to liberate particles of materials of which said target is composed, thereby depositing a thin film on a substrate disposed on said substrate electrode.
Claim 13
Dependent Claim
86 words
A sputtering apparatus at least comprising: a cathode disposed within a vacuum chamber; a substrate electrode disposed in face-to-face relationship with said cathode; an intermediate electrode disposed between said cathode and said substrate electrode and including a plurality of openings; and means for heating said intermediate electrode, wherein ions are made to collide against a target disposed on said cathode so as to liberate particles of materials of which said target is composed, thereby depositing a thin film on a substrate disposed on said substrate electrode.
Claim 14
Dependent Claim
86 words
A sputtering apparatus at least comprising: a cathode disposed within a vacuum chamber; a substrate electrode disposed in face-to-face relationship with said cathode; an intermediate electrode disposed between said cathode and said substrate electrode and including a plurality of openings; and means for heating said intermediate electrode, wherein ions are made to collide against a target disposed on said cathode so as to liberate particles of materials of which said target is composed, thereby depositing a thin film on a substrate disposed on said substrate electrode.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-01-04 | 1991-07-06 | 1992-01-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-01-04 | 1995-07-06 | 1996-01-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-01-04 | 1999-07-06 | 2000-01-05 | $7700.00 | Window Closed / Lapsed |