Method of fabricating silicon-on-insulator like devices

Claim 2

A process for forming an MOS transistor comprising the steps of: forming an insulator layer over a surface of a semiconductor body; forming a hole in the layer for exposing a portion of the surface of the semiconductor body; growing epitaxially semiconductor material from the exposed portion of the surface of the semiconductor body vertically upward in the hole; removing portions of the insulator layer to expose an opposed pair of vertical sidewall portions of the vertically grown semiconductor material; growing epitaxially semiconductor material substantially only laterally from said opposed pair of exposed sidewall portions of the vertically grown semiconductor material; forming a gate region over a top portion of the vertically grown semiconductor material and using the gate region as a mask to form self-aligned source and drain regions in the laterally grown semiconductor material regions; and forming a transistor using the gate region, the two laterally grown silicon portions as source and drain regions and the portion of the vertically grown semiconductor material intermediate between the laterally grown portions as a channel.

Claim 3

The process of claim 1 wherein the semiconductor material is silicon, and the upper surface of the vertically grown silicon is covered with a layer of silicon oxide before lateral epitaxial deposition.

Claim 4

The process of claim 2 in which the gate region is an oxide-insulated polycrystalline silicon region formed over the top of a portion of the vertically grown silicon.

Claim 5

The process of claim 3 in which the silicon oxide layer is removed from the vertically grown silicon at sidewall portions intermediate between end walls of the vertically grown silicon whereby the laterally grown silicon regions interface with the vertically grown silicon only over said intermediate sidewall portions.

Claim 6

The process of claim 4 in which an oxide-insulated polycrystalline silicon gate region is used as a mask to allow doping of the two laterally grown silicon portions to adapt same to serve as the source and drain, respectively, of the transistor.

Claim 7

The process of claim 5 in which silicide regions are formed over the top of the gate region and over the portions of said laterally grown regions distant from said gate region and electrical connections are provide to such silicide regions.

Claim 8

The process of claim 6 wherein the vertically grown silicon is essentially monocrystalline silicon.

Claim 9

A process for making an MOS transistor comprising the steps of: forming an oxide layer over a surface of a monocrystalline silicon substrate of one conductivity type; forming a hole in the oxide which exposes an enclosed portion of the substrate surface; filling the hole to the approximate level of the oxide layer with substantially epitaxial vertically grown silicon; covering the top surface of the grown silicon with silicon oxide exposing a pair of opposed sidewalls on the grown silicon; growing laterally from said opposed sidewalls a pair of opposed regions of epitaxially grown silicon, said regions being supported by regions of the oxide layer and being capped at opposite ends by regions of said oxide layer; forming an oxide-insulated polysilicon layer over the top surface of the vertically grown silicon and shaping it for use as the gate region of the transistor over the region intermediate between the two laterally grown regions; implanting the laterally grown regions with dopants which cause the laterally grown regions to have the opposite conductivity type; using the sidewall spacer technique to cover the sidewalls of the polysilicon electrode and the upper portions of the laterally grown regions for forming regions of a silicide layer selectively over only the top surface of the polysilicon electrode and the lower surfaces of the laterally grown regions; and providing electrical connections to the regions of the silicide layer.

Claim 10

A process for making an MOS transistor comprising the steps of: forming an oxide layer over a surface of a monocrystalline silicon substrate of one conductivity type; forming a hole in the oxide which exposes an enclosed portion of the substrate surface; filling the hole to the approximate level of the oxide layer with substantially epitaxial vertically grown silicon; covering the top surface of the grown silicon with silicon oxide exposing a pair of opposed sidewalls on the grown silicon; growing laterally from said opposed sidewalls a pair of opposed regions of epitaxially grown silicon, said regions being supported by regions of the oxide layer and being capped at opposite ends by regions of said oxide layer; forming an oxide-insulated polysilicon layer over the top surface of the vertically grown silicon and shaping it for use as the gate region of the transistor over the region intermediate between the two laterally grown regions; implanting the laterally grown regions with dopants which cause the laterally grown regions to have the opposite conductivity type; using the sidewall spacer technique to cover the sidewalls of the polysilicon electrode and the upper portions of the laterally grown regions for forming regions of a silicide layer selectively over only the top surface of the polysilicon electrode and the lower surfaces of the laterally grown regions; and providing electrical connections to the regions of the silicide layer.

Claim 11

A process for forming a semiconductor device comprising the steps of: forming an insulating layer over a surface of a semiconductor body; forming a hole in the insulator layer for exposing a portion of the surface of the semiconductor body; growing epitaxially semiconductor material from the exposed portion of the surface of the semiconductor body vertically upward in the hole; removing portions of the insulator layer to expose an opposed pair of vertical sidewall portions of the vertically grown semiconductor material; and growing epitaxially semiconductor material laterally from said opposed pair of exposed sidewall portions of the vertically grown semiconductor material to form first and second regions which are separated by portions of vertically grown semiconductor material which serve as a third region of the device.

Claim 12

A process for forming a semiconductor device comprising the steps of: forming an insulating layer over a surface of a semiconductor body; forming a hole in the insulator layer for exposing a portion of the surface of the semiconductor body; growing epitaxially semiconductor material from the exposed portion of the surface of the semiconductor body vertically upward in the hole; removing portions of the insulator layer to expose an opposed pair of vertical sidewall portions of the vertically grown semiconductor material; and growing epitaxially semiconductor material laterally from said opposed pair of exposed sidewall portions of the vertically grown semiconductor material to form first and second regions which are separated by portions of vertically grown semiconductor material which serve as a third region of the device.