US4404732A
Expired / Lapsed
US
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Self-aligned extended epitaxy mesfet fabrication process
Assignee: International Business Machines Corp
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Filing: 1981-12-07
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Granted: 1983-09-20
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Expires: 2001-12-07
Abstract
Abstract A fabrication process for a gallium arsenide MESFET device is disclosed. A feature of the invention is placing a gate structure on the gallium arsenide substrate. Then a process including molecular beam epitaxy, grows epitaxial gallium arsenide on each respective side of the gate, forming a raised source region and a raised drain region. Gallium arsenide will not grow in a conductive state on top of a tungsten gate metal. The resulting MESFET device has a raised source and drain which significantly reduces the high resistance depleted surface adjacent to the gate which generally occurs in planer gallium arsenide MESFET devices. Furthermore, the MESFET channel region which is defined by the proximate edges of the source and the drain, is self-aligned with the edges of the gate by virtue of the insitu process for the formation of the source and drain, as described above.
Inventors
- 👤 Thomas L. Andrade
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 11:02
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/10; H10D62/13; H10D62/149; H10D62/161; H10D30/00; H10D30/60; H10D30/67; H10D30/6729; H10D30/6737; H10D30/6738; H10D30/674; H10D30/675; H10D30/80; H10D30/87; H10D62/80; H10D62/85; H10D64/00; H10D64/60; H10D64/64; H10P; H10P14/00; H10P14/20; H10P14/22; H10P14/29; H10P14/2901; H10P14/2907; H10P14/2911; H10P14/34; H10P14/3402; H10P14/3414; H10P14/3421; H10P14/36; Y; Y10; Y10S; Y10S148/00; Y10S148/088; Y10S148/10; Y10S148/105; Y10S148/169; Y10S438/00; Y10S438/969
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
115 words
An improved fabrication process for forming a gallium arsenide MESFET device, comprising the steps of: forming an N-type gallium arsenide layer on a low conductivity substrate; forming a refractory gate electrode on a selected portion of the surface of said gallium arsenide layer; growing an epitaxial gallium arsenide raised source region on said gallium arsenide layer on a first side of said gate and simultaneously therewith growing a gallium arsenide raised drain region on said gallium arsenide layer on a second side of said gate opposite from said first side thereof, said source and drain regions being of N-type conductivity; whereby a self-aligned refractory gate MESFET device having a raised source and drain, is formed.
Claim 2
Dependent Claim
115 words
An improved fabrication process for forming a gallium arsenide MESFET device, comprising the steps of: forming an N-type gallium arsenide layer on a low conductivity substrate; forming a refractory gate electrode on a selected portion of the surface of said gallium arsenide layer; growing an epitaxial gallium arsenide raised source region on said gallium arsenide layer on a first side of said gate and simultaneously therewith growing a gallium arsenide raised drain region on said gallium arsenide layer on a second side of said gate opposite from said first side thereof, said source and drain regions being of N-type conductivity; whereby a self-aligned refractory gate MESFET device having a raised source and drain, is formed.
Claim 3
Dependent Claim
214 words
An improved fabrication process for forming a gallium arsenide MESFET device, comprising the steps of: forming a first N-type gallium arsenide layer on a low conductivity substrate; mesa etching said gallium arsenide layer for electrical isolation, defining a first side and an opposed second side thereof; depositing an oxide layer on said low conductivity substrate and adjacent to said first and second sides of said gallium arsenide layer; forming a high temperature resistant gate electrode on a selected portion of the surface of said gallium arsenide layer; depositing a second layer of gallium arsenide on the exposed surfaces of said oxide layer and said first gallium arsenide layer, forming polycrystalline gallium arsenide over said oxide layer and forming epitaxial gallium arsenide over said first gallium arsenide layer, said epitaxial portion of said second gallium arsenide layer forming a raised source region on said first gallium arsenide layer on a first side of said gate and simultaneously forming a raised drain region on said first gallium arsenide layer on a second side of said gate opposite from said first side thereof, said source and drain regions being of N-type conductivity; depositing ohmic contacts to said raised source and raised drain regions; whereby a self-aligned gate MESFET device having a raised source and drain, is formed.
Claim 4
Dependent Claim
214 words
An improved fabrication process for forming a gallium arsenide MESFET device, comprising the steps of: forming a first N-type gallium arsenide layer on a low conductivity substrate; mesa etching said gallium arsenide layer for electrical isolation, defining a first side and an opposed second side thereof; depositing an oxide layer on said low conductivity substrate and adjacent to said first and second sides of said gallium arsenide layer; forming a high temperature resistant gate electrode on a selected portion of the surface of said gallium arsenide layer; depositing a second layer of gallium arsenide on the exposed surfaces of said oxide layer and said first gallium arsenide layer, forming polycrystalline gallium arsenide over said oxide layer and forming epitaxial gallium arsenide over said first gallium arsenide layer, said epitaxial portion of said second gallium arsenide layer forming a raised source region on said first gallium arsenide layer on a first side of said gate and simultaneously forming a raised drain region on said first gallium arsenide layer on a second side of said gate opposite from said first side thereof, said source and drain regions being of N-type conductivity; depositing ohmic contacts to said raised source and raised drain regions; whereby a self-aligned gate MESFET device having a raised source and drain, is formed.
Claim 5
Dependent Claim
12 words
The process of claim 2, wherein said oxide layer is gallium oxide.
Claim 6
Dependent Claim
12 words
The process of claim 2, wherein said oxide layer is silicon oxide.
Claim 7
Dependent Claim
13 words
The process of claim 2, wherein said gate electrode is a refractory metal.
Claim 8
Dependent Claim
112 words
An improved fabrication process for forming a gallium arsenide MESFET device, comprising the steps of: forming a refractory gate electrode on a selected portion of the surface of a thin layer of gallium arsenide on a low conductivity substrate; epitaxially growing a gallium arsenide raised source region on said gallium arsenide substrate on a first side of said gate and simultaneously growing a gallium arsenide raised drain region on said gallium arsenide substrate on a second side of said gate opposite from said first side thereof, said thin layer of gallium arsenide therebetween forming a channel region; whereby a self-aligned refractory gate MESFET device having a raised source and drain, is formed.
Claim 9
Dependent Claim
112 words
An improved fabrication process for forming a gallium arsenide MESFET device, comprising the steps of: forming a refractory gate electrode on a selected portion of the surface of a thin layer of gallium arsenide on a low conductivity substrate; epitaxially growing a gallium arsenide raised source region on said gallium arsenide substrate on a first side of said gate and simultaneously growing a gallium arsenide raised drain region on said gallium arsenide substrate on a second side of said gate opposite from said first side thereof, said thin layer of gallium arsenide therebetween forming a channel region; whereby a self-aligned refractory gate MESFET device having a raised source and drain, is formed.
Claim 10
Dependent Claim
34 words
The process of claim 6 wherein said refractory gate electrode is composed of a material which is a member of the group consisting of tungsten, tungsten carbide, titanium carbide, tantalum carbide, and titanium nitride.
Claim 11
Dependent Claim
120 words
An improved fabrication process for forming a III-V semiconductor MESFET device, comprising the steps of: forming a high temperature resistant gate electrode on a selected portion of the surface of a thin layer of a III-V semiconductor on a low conductivity substrate; epitaxially growing a III-V semiconductor raised source region on said III-V semiconductor substrate on a first side of said gate and simultaneously growing a III-V semiconductor raised drain region on said III-V semiconductor substrate on a second side of said gate opposite from said first side thereof, said thin layer of III-V semiconductor therebetween forming a channel region; whereby a self-aligned gate MESFET device having a raised source and drain and a low contamination channel region, is formed.
Claim 12
Dependent Claim
120 words
An improved fabrication process for forming a III-V semiconductor MESFET device, comprising the steps of: forming a high temperature resistant gate electrode on a selected portion of the surface of a thin layer of a III-V semiconductor on a low conductivity substrate; epitaxially growing a III-V semiconductor raised source region on said III-V semiconductor substrate on a first side of said gate and simultaneously growing a III-V semiconductor raised drain region on said III-V semiconductor substrate on a second side of said gate opposite from said first side thereof, said thin layer of III-V semiconductor therebetween forming a channel region; whereby a self-aligned gate MESFET device having a raised source and drain and a low contamination channel region, is formed.
Claim 13
Dependent Claim
36 words
The process of claim 8, wherein said high temperature resistant gate electrode is composed of a material which is a member of the group consisting of tungsten, tungsten carbide, titanium carbide, tantalum carbide, and titanium nitride.
Claim 14
Dependent Claim
13 words
The process of claim 8, wherein said III-V semiconductor substrate is gallium arsenide.
Claim 15
Dependent Claim
15 words
The process of claim 10, wherein said III-V semiconductor source and drain are gallium arsenide.
Claim 16
Dependent Claim
36 words
The process of claim 11, wherein said high temperature resistant gate electrode is composed of a material which is a member of the group consisting of tungsten, tungsten carbide, titanium carbide, tantalum carbide, and titanium nitride.
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1986-09-19 | 1987-03-21 | 1987-09-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-09-19 | 1991-03-21 | 1991-09-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-09-19 | 1995-03-21 | 1995-09-20 | $7700.00 | Window Closed / Lapsed |