US4710449A
Expired / Lapsed
US
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High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants
Assignee: Shin Etsu MicroSi Inc
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Filing: 1986-01-29
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Granted: 1987-12-01
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Expires: 2006-01-29
Abstract
Abstract A novel low metal ion developer composition used in a two step process which provided high contrast images and long developer bath life is provided. The process gives high contrast images. The substrate coated with positive photoresist is exposed then immersed in a "predip" bath, rinsed, and then, immersed in the developer bath, rinsed and dried. This process provided high contrast which does not decrease over the life of the developer system. The system consists of (1) a predip solution containing aqueous non-metal ion organic base and a cationic surfactant adjusted to a concentration that does not give development, and (2) a developer solution containing an aqueous solution of an non-metal ion organic base and a fluorochemical surfactant adjusted to a concentration that provides development. The high contrast is achieved by the cationic surfactant coating the resist and inhibiting the attack on the unexposed resist by the developer while permitting the developer to dissolve away the exposed resist.
Inventors
- 👤 James M. Lewis
- 👤 Andrew J. Blakeney
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 01:23
CPC Classifications
G; G03; G03C; G03C5/00; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322
Claims Analysis
Total Claims: 31
Claim 1
Independent Claim
272 words
A process for developing a positive radiation sensitive resist film comprised of radiation sensitive quinone diazide sulfonic acid derivatives in admixture with an alkali soluble resin that has been coated on a substrate and exposed to radiation in the form of a pattern to form soluble areas in the coating which are dissolved by the developer to form a surface relief pattern and which comprises: (a) contacting the exposed film with a solution comprising an organic base aqueous solution adjusted to a concentration that does not give development of photoresist and containing a cationic surfactant from about 0.0001 to about 1.0% by weight of the total solution, to form a developer resistant layer (b) subjecting said film to an aqueous rinse, and (c) contacting the said film with an organic aqueous base developer solution having a pH of at least 9 or greater and containing from about 0.0001 to 5% based on the weight of developer of a fluorocarbon surfactant having the formula: R.sub.f --Y--(CH.sub.2 CH.sub.2 O).sub.m R where Y is a radical selected from the group --CH 2 CH 2 O --, --SO 2 NR--, --SO 3 --, --SO 2 N(R')CH 2 CO 2 --, --CO 2 --and --CO--NR'-- wherein R f is either a straight or branched chain of the formula C p F 2p+1 where p is an integer of from 3-17 and wherein R is hydrogen or an acyl or alkyl radical of 1 to 30 carbon atoms and m is an integer of 2 to 26 and R' is hydrogen or an alkyl radical of 1-6 carbon atoms, until the exposed portions of the film are dissolved.
Claim 2
Dependent Claim
272 words
A process for developing a positive radiation sensitive resist film comprised of radiation sensitive quinone diazide sulfonic acid derivatives in admixture with an alkali soluble resin that has been coated on a substrate and exposed to radiation in the form of a pattern to form soluble areas in the coating which are dissolved by the developer to form a surface relief pattern and which comprises: (a) contacting the exposed film with a solution comprising an organic base aqueous solution adjusted to a concentration that does not give development of photoresist and containing a cationic surfactant from about 0.0001 to about 1.0% by weight of the total solution, to form a developer resistant layer (b) subjecting said film to an aqueous rinse, and (c) contacting the said film with an organic aqueous base developer solution having a pH of at least 9 or greater and containing from about 0.0001 to 5% based on the weight of developer of a fluorocarbon surfactant having the formula: R.sub.f --Y--(CH.sub.2 CH.sub.2 O).sub.m R where Y is a radical selected from the group --CH 2 CH 2 O --, --SO 2 NR--, --SO 3 --, --SO 2 N(R')CH 2 CO 2 --, --CO 2 --and --CO--NR'-- wherein R f is either a straight or branched chain of the formula C p F 2p+1 where p is an integer of from 3-17 and wherein R is hydrogen or an acyl or alkyl radical of 1 to 30 carbon atoms and m is an integer of 2 to 26 and R' is hydrogen or an alkyl radical of 1-6 carbon atoms, until the exposed portions of the film are dissolved.
Claim 3
Dependent Claim
16 words
The process in claim 1 in which the organic base in Step (a) is tetramethylammonium hydroxide.
Claim 4
Dependent Claim
16 words
The process in claim 1 in which the organic base in Step (a) is (2-hydroxyethyl)trimethylamnonium hydroxide.
Claim 5
Dependent Claim
125 words
The process of claim 1 in which the cationic surfactant in Step (a) comprises a compound selected from those having the formula: ##STR10## wherein R 3 is a cyclic group of from 2 to 6 carbons with from 0 to 3 heteroatoms chosen from the group o, N and S Provided that each heteroatom is not bonded to another or a quaternary nitrogen, R 1 is a saturated or unsaturated, straight or branched hydrocarbon chain of from 6 to 20 carbon atoms, R 2 is a saturated or unsaturated straight or branched hydrocarbon chain of 1 to 120 carbon atoms, X is Cl - , I - , Br - , CH 3 SO 4 - or CH 3 CH 2 SO 4 - .
Claim 6
Dependent Claim
15 words
The process of claim 4 in which the cationic surfactant in Step (a) comprises: ##STR11##
Claim 7
Dependent Claim
101 words
The process of claim 1 in which the cationic surfactant in Step (a) comprises a compound having the formula: ##STR12## where R 1 is a saturated or unsaturated straight or branched hydrocarbon chain of 6 to 20 carbon atoms, R 2 is a saturated or unsaturated straight or branched hydrocarbon chain of 1 to 120 carbon atoms; R 3 is an alkyl of 1 to 4 carbon atoms; and R 4 is a saturated or unsaturated straight or branched hydrocarbon chain of from 1 to 4 carbon atoms or phenalkyl wherein the alkyl moiety has from 0 to 3 carbon atoms.
Claim 8
Dependent Claim
15 words
The process of claim 6 in which the cationic surfactant in Step (a) comprises: ##STR13##
Claim 9
Dependent Claim
142 words
The process of claim 1 in which the cationic surfactant in Step (a) comprises a compound having the formula: ##STR14## wherein R 1 is a saturated or unsaturated straight or branched hydrocarbon chain of 6 to 20 carbon atoms, R 2 is a saturated or unsaturated straight or branched hydrocarbon chain of 1 to 120 carbon atoms, R 3 is alkyl of 1 to 4 carbon atoms and R 4 is a saturated or unsaturated straight or branched hydrocarbon chain containing 1 to 4 quaternary ammonium groups having the formula --(N + R 5 R 6 R 7 ) wherein R 5 is a saturated or unsaturated straight or branched hydrocarbon chain of from 1 to 20 carbon atoms, R 6 and R 7 are the same or different and each is an alkyl group of from 1 to 4 carbon atoms.
Claim 10
Dependent Claim
15 words
The process of claim 8 in which the cationic surfactant in Step (a) comprises: ##STR15##
Claim 11
Dependent Claim
48 words
The process of claim 1 in which the cationic surfactant in Step (a) comprises a compound selected from those having the formula: ##STR16## where R is a hydrocarbon chain derived from coconut oils R 1 and R 2 are hydroxy alkyl groups containing between 1 and 4 carbons.
Claim 12
Dependent Claim
15 words
The process of claim 10 in which the cationic surfactant in Step (a) comprises: ##STR17##
Claim 13
Dependent Claim
30 words
The process in claim 1 in which the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 14
Dependent Claim
16 words
The process in claim 1 in which the organic base in Step (c) is tetramethylammonium hydroxide.
Claim 15
Dependent Claim
16 words
The process in claim 1 in which the organic base in Step (c) is (2-hydroxyethyl)trimethylammonium hydroxide.
Claim 16
Dependent Claim
42 words
The process in claim 4 in which the organic base in Steps (a) and (c) is tetramethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 17
Dependent Claim
42 words
The process in claim 5 in which the organic base in Steps (a) and (c) is tetramethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 18
Dependent Claim
42 words
The process in claim 6 in which the organic base in Steps (a) and (c) is tetramethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 19
Dependent Claim
42 words
The process in claim 7 in which the organic base in Steps (a) and (c) is tetramethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 20
Dependent Claim
42 words
The process in claim 8 in which the organic base in Steps (a) and (c) is tetramethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 21
Dependent Claim
42 words
The process in claim 9 in which the organic base in Steps (a) and (c) is tetramethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 22
Dependent Claim
42 words
The process in claim 10 in which the organio base in steps (a) and (c) is tetramethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 23
Dependent Claim
42 words
The process in claim 11 in which the organic base in Steps (a) and (c) is tetramethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 24
Dependent Claim
42 words
The process in claim 4 in which the organic base in Steps (a) and (c) is (2-hydroxyethyl)trimethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 25
Dependent Claim
42 words
The process in claim 5 in which the organic base in Steps (a) and (c) is (2-hydroxyethyl)trimethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 26
Dependent Claim
42 words
The process in claim 6 in which the organic base in Steps (a) and (c) is (2-hydroxyethyl)trimethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 27
Dependent Claim
42 words
The process in claim 7 in which the organic base in Steps (a) and (c) is (2-hydroxyethyl)trimethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 28
Dependent Claim
42 words
The process in claim 8 in which the organic base in Steps (a) and (c) is (2-hydroxyethyl)trimethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 29
Dependent Claim
42 words
The process in claim 9 in which the organic base in Steps (a) and (c) is (2-hydroxyethyl)trimethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 30
Dependent Claim
42 words
The process in claim 10 in which the organic base in Steps (a) and (c) is (2-hydroxyethyl)trimethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
Claim 31
Dependent Claim
42 words
The process in claim 11 in which the organic base in Steps (a) and (c) is (2-hydroxyethyl)trimethylammonium hydroxide and the surfactant in Step (c) is CF 3 (CF 2 ) 6 --CH 2 CH 2 O--(CH 2 CH 2 O) 4 H.
References Cited (Backward Citations)
US3891439A
Cited
US3961100A
Cited
US3961101A
Cited
US4359520A
Cited
US4212935A
Cited
US4411981A
Cited
US4307178A
Cited
EP0062733A1
Cited
US4606999A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-11-30 | 1991-06-01 | 1991-12-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-11-30 | 1995-06-01 | 1995-12-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-11-30 | 1999-06-01 | 1999-12-01 | $7700.00 | Window Closed / Lapsed |