US3961100A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for developing electron beam sensitive resist films
Assignee: RCA Corp
•
Filing: 1974-09-16
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Granted: 1976-06-01
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Expires: 1994-09-16
Abstract
Abstract The effective sensitivity of a photo- or electron beam resist is improved by contacting the resist film with developer solution and water prior to exposure.
Inventors
- 👤 David Isaac Harris
- 👤 Loren Bainum Johnston
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 07:29
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/004; G03F7/022
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
106 words
A process for developing a positive light and electron beam-sensitive resist film of a naphthoquinone-(1,2-)diazide sulfonic acid ester admixed with an alkali soluble resin on a support to form a surface relief pattern which consists essentially of the following steps in sequence a. contacting the unexposed resist film with an aqueous alkaline developer solution, b. washing the resist film with water, c. drying the film to remove the water, d. exposing the film to a modulated electron beam, and e. contacting the exposed film with the developer solution until the exposed portions of the film are partially dissolved, thereby improving the effective sensitivity of the resist.
Claim 2
Dependent Claim
106 words
A process for developing a positive light and electron beam-sensitive resist film of a naphthoquinone-(1,2-)diazide sulfonic acid ester admixed with an alkali soluble resin on a support to form a surface relief pattern which consists essentially of the following steps in sequence a. contacting the unexposed resist film with an aqueous alkaline developer solution, b. washing the resist film with water, c. drying the film to remove the water, d. exposing the film to a modulated electron beam, and e. contacting the exposed film with the developer solution until the exposed portions of the film are partially dissolved, thereby improving the effective sensitivity of the resist.
Claim 3
Dependent Claim
37 words
A process according to claim 1 wherein the resist film comprises a mixture containing from about 1 to about 50% by weight of 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone and from 99 to about 50% by weight of an alkali soluble resin.
Claim 4
Dependent Claim
19 words
A process according to claim 1 wherein step (a) is continued for from about 5 to about 15 seconds.
References Cited (Backward Citations)
US2911299A
Cited
US3264104A
Cited
US3707373A
Cited
US3639185A
Cited
US3649393A
Cited
US3841874A
Cited
US3850633A
Cited
US3850733A
Cited
US3779774A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-06-01 | 1979-12-01 | 1980-06-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-06-01 | 1983-12-01 | 1984-06-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-06-01 | 1987-12-01 | 1988-06-01 | $7700.00 | Window Closed / Lapsed |