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Mesa semiconductor device

Assignee: Microchip Technology Caldicot Ltd
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Filing: 1986-08-29
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Granted: 1987-10-13
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Expires: 2006-08-29
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Abstract

Abstract A method of fabricating two terminal mesa semiconductor devices comprising etching a surface doped and metal coated silicon slice thereby to form a plurality of silicon frusta each capped by a metal contact pad, covering the frusta side of the slice with a metal contact continuity layer and then with a handle layer formed to lie parallel with that surface of the silicon slice which is remote from the frusta, lapping away the silicon slice to expose parts of the handle layer which extend between the frusta so that the frusta are separated so as to define discrete mesas held together by the handle layer, forming one of the two terminals on a face of the mesas remote from the contact pads, removing the handle layer to reveal the contact pads and bonding each contact pad thereby revealed to the metallized face of a diamond heat sink, one heat sink to each contact pad, which heat sink forms a part of the other of the two terminals of each mesa semiconductor device.

Inventors

  • 👤 Ian Davies
  • 👤 Sydney Cotton
  • 👤 Anthony M. Howard

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 08:46
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/70; H10P72/74; H10D; H10D8/00; H10D8/01; H10W; H10W40/00; H10W40/20; H10W40/25; H10W40/254

Claims Analysis

Total Claims: 13
Claim 1
Independent Claim 162 words
A method of fabricating two terminal mesa semiconductor devices from a silicon slice having a doped surface region coated with a metal layer, the method comprising etching the silicon slice through the metal layer thereby to define a plurality of silicon frusta each capped by a metal contact pad, forming a metal contact continuity layer over the defined frusta and contact pads, forming a handle layer over the metal contact continuity layer, the handle layer extending between the frusta, lapping away the silicon slice to expose regions of the handle layer between the frusta, thereby to define discrete mesas cojoined by the handle layer, forming a first of the two terminals on a face of the mesas remote from the contact pads, removing the handle layer to reveal the contact pads, and bonding each revealed contact pad to the metallised face of a diamond heatsink, each heat sink forming part of the other of the two terminals of each mesa semiconductor device.
Claim 2
Independent Claim 162 words
A method of fabricating two terminal mesa semiconductor devices from a silicon slice having a doped surface region coated with a metal layer, the method comprising etching the silicon slice through the metal layer thereby to define a plurality of silicon frusta each capped by a metal contact pad, forming a metal contact continuity layer over the defined frusta and contact pads, forming a handle layer over the metal contact continuity layer, the handle layer extending between the frusta, lapping away the silicon slice to expose regions of the handle layer between the frusta, thereby to define discrete mesas cojoined by the handle layer, forming a first of the two terminals on a face of the mesas remote from the contact pads, removing the handle layer to reveal the contact pads, and bonding each revealed contact pad to the metallised face of a diamond heatsink, each heat sink forming part of the other of the two terminals of each mesa semiconductor device.
Claim 3
Dependent Claim 24 words
A method according to claim 1 wherein the first of the two terminals of each mesa semiconductor device is stuck to a supporting substrate.
Claim 4
Dependent Claim 22 words
A method according to claim 2 wherein the supporting substrate comprises a glass slide to which the mesas are stuck with wax.
Claim 5
Independent Claim 19 words
A method according to any one of claims 1 to 3 wherein the metal contact continuity layer comprises gold.
Claim 6
Dependent Claim 12 words
A method according to claim 4 wherein the handle layer comprises copper.
Claim 7
Dependent Claim 45 words
A method according to claim 4 wherein the first of the two terminals is formed by metallising the lapped surface of the silicon slice, laying down photo-resist to leave exposed contact regions of metallisation, and laying down gold terminal regions on the exposed contact regions.
Claim 8
Dependent Claim 22 words
A method according to claim 5 wherein the copper handle layer is removed by etching so as to expose the contact pads.
Claim 9
Dependent Claim 16 words
A method according to claim 1 wherein the diamond heat sinks are mounted in gold studs.
Claim 10
Dependent Claim 20 words
A method according to claim 1 comprising coating the doped surface region of the silicon slice with the metal layer.
Claim 11
Dependent Claim 25 words
A method according to claim 9 wherein the metal layer comprises a coating of gold overlying a coating of platinum and a coating of chromium.
Claim 12
Dependent Claim 31 words
A method according to claim 1 wherein the doped surface region of the silicon slice comprises a P type epitlayer sandwiched between an N type epilayer and a P+ contact layer.
Claim 13
Dependent Claim 32 words
A method according to claim 6 wherein the metallisation on the lapped surface of the silicon slice comprises a coating of gold overlying a coating of platinum and a coating of chromium.

References Cited (Backward Citations)

US3820236A Cited
US3849217A Cited
US3922775A Cited
US3993515A Cited
US4197551A Cited
US4319265A Cited
US4576224A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1990-10-12 1991-04-13 1991-10-13 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1994-10-12 1995-04-13 1995-10-13 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1998-10-12 1999-04-13 1999-10-13 $7700.00 Window Closed / Lapsed

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