Method for making planar FET having gate, source and drain in the same plane

Claim 2

A process for manufacturing an MOS transistor, comprising: (a) forming a trench region in a monocrystalline semiconductor substrate of p- (or n-) type conductivity; (b) forming a gate insulation layer of semiconductor oxide on the vertical and bottom surfaces of said trench region; (c) depositing a gate element of semiconductor material on the gate insulation layer in said trench region so that said gate element substantially fills said trench region; and (d) forming source and drain elements on said substrate contiguous to the vertical surfaces of the gate insulation layer by doping said substrate, while simultaneously therewith doping said gate element, with an n- (or p-) type impurity; thereby forming an MOS transistor having source and drain elements in the same plane as the gate element.

Claim 3

The process of claim 1 wherein interconnection layers of low resistivity are deposited on the source and drain elements and on the doped gate element; wherein an insulating layer is deposited on the surface of said substrate; and wherein metal contacts are deposited over said interconnection layers so as to provide means of electrically connecting said source and drain elements and gate elements with electrical contact exterior to said transistor.

Claim 4

The process of claim 1 wherein the semiconductor substrate is silicon.

Claim 5

The process of claim 1 wherein the n-type dopant is phosphorus, arsenic, or antimony.

Claim 6

The process of claim 1 wherein the p-type dopant is boron, aluminum, gallium, or indium.

Claim 7

The process of claim 1 wherein the gate element of semiconductor material is a conducting film made from doped polycrystalline silicon, or a refractory metal silicide, or a refractory metal polycide.

Claim 8

The process of claim 2 wherein the interconnection layers of low resistivity material are made from doped polycrystalline silicon, or refractory metal silicide, or refractory metal polycide.

Claim 9

The process of claim 2 wherein the insulation layer is formed by the thermal growth method, chemical vapor deposition, or chemical vapor deposition after thermal growth.

Claim 10

The process of claim 2 wherein the metal contacts are formed by deposition through apertures in said insulating layer.

Claim 11

The process of claim 6 or 7 in which the said refractory metal is selected from the group consisting of tungsten, titanium, platinum, and molybdenum.

Claim 12

A process for manufacturing an MOS transistor, comprising: (a) forming a trench region in a monocrystalline semiconductor substrate of p- (or n-) type conductivity; (b) forming a gate insulation layer of semiconductor oxide on the surface of said monocrystalline semiconductor substrate, including on the vertical and bottom surfaces of said trench regions; (c) depositing a semiconductor material on said gate insulation layer so as to cover the surface thereof and to substantially fill said trench; (d) planarizing said structure so as to expose the surface of the monocrystalline semiconductor substrate surrounding said trench region and the vertical surfaces of the gate insulation layer; and (e) doping said substrate with an n- (or p-) type impurity so as to simultaneously form source and drain elements on said substrate contiguous to the vertical surfaces of the gate insulation layer and said gate element; thereby forming an MOS transistor having source and drain elements in the same plane as the gate element.

Claim 13

A process for manufacturing an MOS transistor, comprising: (a) forming a trench region in a monocrystalline semiconductor substrate of p- (or n-) type conductivity; (b) forming a gate insulation layer of semiconductor oxide on the surface of said monocrystalline semiconductor substrate, including on the vertical and bottom surfaces of said trench regions; (c) depositing a semiconductor material on said gate insulation layer so as to cover the surface thereof and to substantially fill said trench; (d) planarizing said structure so as to expose the surface of the monocrystalline semiconductor substrate surrounding said trench region and the vertical surfaces of the gate insulation layer; and (e) doping said substrate with an n- (or p-) type impurity so as to simultaneously form source and drain elements on said substrate contiguous to the vertical surfaces of the gate insulation layer and said gate element; thereby forming an MOS transistor having source and drain elements in the same plane as the gate element.