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US4684536A
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Hard layer formed by incorporating nitrogen into Mo or W metal and method for obtaining this layer
Assignee: Battelle Development Corp
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Filing: 1984-12-06
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Granted: 1987-08-04
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Expires: 2004-12-06
Abstract
Abstract This hard layer is obtained by incorporating a maximum of 2 weight % of nitrogen in Mo or W by the technique of cathode sputtering in a nitrogen reactive medium, the temperature at which the nitrogen incorporation occurs which is in the order of 300° C. preventing the nitrogen to precipitate at the grains-joints during cooling, so that the layer only comports a cubic centered Mo or W phase, thus preserving its own ductility to the metal.
Inventors
- 👤 Bogdan Zega
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:31
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/0021; C23C14/0036; C23C14/06; C23C14/14; C23C14/16; C23C14/165
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
57 words
A method for obtaining a ductile, polycrystalline, cubic-centered Mo or W coating comprising magnetron cathode sputtering a Mo or W target onto a substrate in the presence of a nitrogen atmosphere such that a solid solution of Mo or W plus nitrogen is formed on the substrate, the nitrogen not exceeding 2% by weight of the coating.
Claim 2
Independent Claim
57 words
A method for obtaining a ductile, polycrystalline, cubic-centered Mo or W coating comprising magnetron cathode sputtering a Mo or W target onto a substrate in the presence of a nitrogen atmosphere such that a solid solution of Mo or W plus nitrogen is formed on the substrate, the nitrogen not exceeding 2% by weight of the coating.
Claim 3
Dependent Claim
16 words
The method of claim 1 wherein the nitrogen pressure is below about 0.2 Pa during sputtering.
Claim 4
Dependent Claim
18 words
The method of claim 1 wherein the temperature of the substrate is below about 300° C. during sputtering.
Claim 5
Dependent Claim
14 words
The method of claim 1 which comprises sputtering a W target onto the substrate.
Claim 6
Dependent Claim
16 words
The method of claim 1 wherein the nitrogen pressure is above about 0.12 Pa during sputtering.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-08-03 | 1991-02-02 | 1991-08-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-08-03 | 1995-02-02 | 1995-08-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-08-03 | 1999-02-02 | 1999-08-04 | $7700.00 | Window Closed / Lapsed |