US4497878A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photomask material
Assignee: Konica Minolta Inc
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Filing: 1982-08-06
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Granted: 1985-02-05
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Expires: 2002-08-06
Abstract
Abstract There is disclosed a photomask material comprising a substrate, and at least one layer containing mixture of a metal oxide and a metal nitride or at least one metal nitride layer provided on the substrate, and the photomask material may comprise a substrate and a mask layer provided on the substrate, the mask layer consisting of a layer containing a lower metal oxide and/or a lower metal nitride, and a layer containing a mixture of a higher oxide and a higher nitride of the same metal or a higher metal nitride layer of the same metal. The photomask material of the present invention exhibits excellent resistance to the cleaning solutions and can be used repeatedly.
Inventors
- 👤 Takashi Hatano
- 👤 Akira Maruyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 13:12
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
75 words
A photomask material comprising a substrate and a mask layer provided on said substrate, said mask layer consisting of a layer containing a lower metal oxide, a lower metal nitride or a combination of said lower metal oxide and said lower metal nitride, and a layer containing a mixture of a higher metal oxide and a higher metal nitride of the same metal or a layer containing a higher metal nitride of the same metal.
Claim 2
Dependent Claim
75 words
A photomask material comprising a substrate and a mask layer provided on said substrate, said mask layer consisting of a layer containing a lower metal oxide, a lower metal nitride or a combination of said lower metal oxide and said lower metal nitride, and a layer containing a mixture of a higher metal oxide and a higher metal nitride of the same metal or a layer containing a higher metal nitride of the same metal.
Claim 3
Dependent Claim
25 words
The photomask material of claim 1, wherein said lower metal oxide has an element ratio of metal to oxygen between 99:1 (inclusive) and 50:50 (exclusive).
Claim 4
Dependent Claim
25 words
The photomask material of claim 1, wherein said lower metal nitride has an element ratio of metal to nitrogen between 99:1 (inclusive) and 75:25 (exclusive).
Claim 5
Dependent Claim
25 words
The photomask material of claim 1, wherein said higher metal oxide has an element ratio of metal to oxygen between 50:50 and 30:70 (inclusive, respectively).
Claim 6
Dependent Claim
24 words
The photomask material of claim 1, wherein said higher nitride has an element ratio of metal to nitrogen between 75:25 and 30:70 (inclusive, respectively).
Claim 7
Dependent Claim
29 words
The photomask material of any of claims 1 to 5, wherein the metal is at least one selected from the group consisting of chromium, titanium, molybdenum, tantalum and tungsten.
Claim 8
Dependent Claim
11 words
The photomask material of claim 6, wherein said metal is chromium.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-02-05 | 1988-08-06 | 1989-02-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-02-05 | 1992-08-06 | 1993-02-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-02-05 | 1996-08-06 | 1997-02-05 | $7700.00 | Window Closed / Lapsed |