US4647782A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Charged particle beam exposure apparatus
Assignee: Toshiba Corp
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Filing: 1985-11-25
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Granted: 1987-03-03
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Expires: 2005-11-25
Abstract
Abstract The dimensions of the cross section of an electron beam emitted from a beam source are changed by deflectors interposed between a pair of aperture masks and are position-corrected by beam position correction deflectors. The electron beam is then irradiated onto a wafer. In accordance with beam dimension signals from a CPU, a correction signal generating circuit supplies correction signals to a beam position correction circuit. The circuit supplies beam position correction signals to the deflectors.
Inventors
- 👤 Hirotsugu Wada
- 👤 Shunichi Sano
- 👤 Mamoru Nakasuji
- 👤 Ryoichi Yoshikawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 17:27
CPC Classifications
B; B82; B82Y; B82Y10/00; H; H01; H01J; H01J37/00; H01J37/30; H01J37/3002; H01J37/3007; B82Y40/00; H01J37/304; H01J37/317; H01J37/3174; H10; H10P; H10P95/00; H01J2237/00; H01J2237/15; H01J2237/30; H01J2237/304; H01J2237/30455; H01J2237/317; H01J2237/3175; H01J2237/31776
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
163 words
A charged particle beam exposure apparatus comprising: a charged particle beam source for generating a charged particle beam; first and second aperture masks which respectively have a rectangular aperture and are sequentially arranged on a charged particle beam path extending from the charged particle beam source to an object to be exposed; means for supplying pattern data and beam dimension and beam position signals corresponding thereto; beam deflecting means arranged between said first and second aperture masks for controlling a beam dimension in accordance with the beam dimension signals; and means for scanning the charged particle beam having controlled beam dimensions on the object to be exposed and for drawing a predetermined pattern, wherein the apparatus further comprises means for generating beam position correction signals in accordance with the beam dimensions of the charged particle beam set by said beam deflecting means, and means for correcting a beam position on the object to be exposed in accordance with the beam position correction signals.
Claim 2
Dependent Claim
163 words
A charged particle beam exposure apparatus comprising: a charged particle beam source for generating a charged particle beam; first and second aperture masks which respectively have a rectangular aperture and are sequentially arranged on a charged particle beam path extending from the charged particle beam source to an object to be exposed; means for supplying pattern data and beam dimension and beam position signals corresponding thereto; beam deflecting means arranged between said first and second aperture masks for controlling a beam dimension in accordance with the beam dimension signals; and means for scanning the charged particle beam having controlled beam dimensions on the object to be exposed and for drawing a predetermined pattern, wherein the apparatus further comprises means for generating beam position correction signals in accordance with the beam dimensions of the charged particle beam set by said beam deflecting means, and means for correcting a beam position on the object to be exposed in accordance with the beam position correction signals.
Claim 3
Dependent Claim
71 words
An apparatus according to claim 1, wherein said beam position correction signal generating means includes a correction signal generating circuit which receives the beam dimension signals and produces the beam position correction signals; and said beam position correcting means includes a beam position correction circuit for generating a voltage signal in accordance with said correction signals, and deflection plates for deflecting said charged particle beam in accordance with said voltage signals.
Claim 4
Dependent Claim
31 words
An apparatus according to claim 2, wherein said correction signal generating circuit includes potentiometers which produce divided voltage outputs corresponding to the beam dimension signals as the beam position correction signals.
Claim 5
Dependent Claim
37 words
An apparatus according to claim 3, wherein a voltage dividing ratio of each of said potentiometers is set to equal a ratio of the beam dimension corresponding thereto to an amount of shift in the beam position.
Claim 6
Dependent Claim
57 words
An apparatus according to claim 2, wherein said beam position correction signal generating means has multipliers each of which receives the beam dimension signals at one input terminal thereof, and means for supplying predetermined proportionality constant data to the other input terminal of each of said multipliers, the beam position correction signals being obtained from said multipliers.
Claim 7
Dependent Claim
103 words
An apparatus according to claim 2, wherein said beam position correction signal generating circuit has a data processing circuit which obtains beam position correction signals X and Y in accordance with equations: X=k1x0+k2y0+k3x0y0+k4x0.sup.2 +k5y0.sup.2 Y=k6x0+k7y0+k8x0y0+k9x0.sup.2 +k10y0.sup.2 where X is the amount of shift in a beam position in an x direction, Y is the amount of shift in the beam position in a y direction, x0 and y0 are dimensions of the beam in the x and y directions, and k1 to k10 are constants determined by at least three factors a beam current density, maximum beam dimensions, and a lens focal point.
Claim 8
Dependent Claim
65 words
An apparatus according to claim 1, wherein said beam position correction signal generating means includes a central processing unit, said CPU incorporates therein a memory which stores data representing a ratio of the amount of shift in beam position to the beam dimensions, and has a function to multiply the beam dimension signals by data representing the ratio to obtain the beam position correction signals.
Claim 9
Dependent Claim
44 words
An apparatus according to claim 1, wherein said beam position correction signal generating means includes means for measuring beam dimensions and beam positions of said charged particle beam; and data processing means for obtaining a ratio of said measured beam dimensions and beam positions.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-03-02 | 1990-09-01 | 1991-03-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-03-02 | 1994-09-01 | 1995-03-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-03-02 | 1998-09-01 | 1999-03-03 | $7700.00 | Window Closed / Lapsed |