Electron beam exposure system and apparatus for carrying out the same

Claim 2

An electron beam exposure system in which an electron beam is radiated to a medium (10) placed on a continuously moving stage (11) characterized in that a correction memory (16) is provided for storing electron beam correction data (f, S , S , d x , d ) for at least one of a field curvature, an astigmatism and a distortion which change in accordance with the deflection amount (f) of the electron beam, wherein said deflection amount (f) is obtained from a difference between a medium position data and a beam deflection position data from a processor (12), and said electron beam correction data corresponding to said deflection amount (f) is read out from said correction memory (16) and applied to a beam control means (5, 6, 7, 8).

Claim 3

An electron beam exposure apparatus characterized by an exposing means including a stage (11) which continuously moves, a mechanism for projecting a rectangular electron beam (B) in the variable cross-section onto the medium (10) placed on the stage (11), a deflection coil (8) for the electron beam (B) and an adjusting means (5, 6, 7, 8) for at least one of a-field curvature, an astigmatism and a distortion, a unit (15) for outputting a current position signal of said stage, a subtractor (19) for obtaining a difference between an output of said unit (15) and an output of a current position signal output unit, an amplifier (24) which inputs an output (S 6 ) of said subtractor (19) and outputs a signal (S 10 ) for activating said deflection coil (8), and a correction memory (16) for storing correction data (f, S , S y , d x , d ) for at least one of the field curvature, the astigmatism, and the distortion corresponding to each deflection angle of the electron beam (B) and activating said adjusting means (5, 6, 7, 8).

Claim 4

An electron beam exposure apparatus characterized by an exposing means including a stage (11) which continuously moves, a mechanism for projecting a rectangular electron beam (B) in the variable cross-section onto the medium (10) placed on the stage (11), a deflection coil (8) for the electron beam (B) and an adjusting means (5, 6, 7, 8) for at least one of a-field curvature, an astigmatism and a distortion, a unit (15) for outputting a current position signal of said stage, a subtractor (19) for obtaining a difference between an output of said unit (15) and an output of a current position signal output unit, an amplifier (24) which inputs an output (S 6 ) of said subtractor (19) and outputs a signal (S 10 ) for activating said deflection coil (8), and a correction memory (16) for storing correction data (f, S , S y , d x , d ) for at least one of the field curvature, the astigmatism, and the distortion corresponding to each deflection angle of the electron beam (B) and activating said adjusting means (5, 6, 7, 8).