EP0083246A2
Expired / Lapsed
EP
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Scanning electron beam exposure system
Assignee: Fujitsu Ltd
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Filing: 1982-12-30
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Granted: —
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Expires: 2002-12-30
Abstract
Abstract A scanning electron beam exposure system comprises two apertures (39a, 48a) for forming a rectangular beam (31). The cross section of the rectangular beam is changed by a deflection unit (47X, 47Y) arranged between the two apertures. The rectangular beam is refocused by a refocusing coil (51) so as to improve the peripheral sharpness of a projected image of the beam. The refocusing coil is controlled in accordance with the cross section (X 1 , Y 1 ) of the beam.
Inventors
- 👤 Hiroshi Yasuda
- 👤 Haruo Tsuchikawa
- 👤 Takayuki Miyazaki
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-26 11:16
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/302; H01J37/3002; H01J37/3007; H01J37/3023
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
222 words
A scanning electron beam exposure system comprising: means (32 to 34) for emitting an electron beam (31); first aperture means (39a) for passing said electron beam therethrough; second aperture means (48a) for passing therethrough said electron beam passed through said first- aperture means so as to shape the cross section of said electron beam into a rectangular form; means (62) for storing information on a plurality of rectangular patterns defined by first size information (X 10 , Y 10 ) and first position information (X 20 , Y 20 ) ; pattern-generating means (63) for generating information on an exposure pattern defined by second size information (X 1 , Y1) and second position information ( X 2 , Y 2 ) ; first deflecting means (47X, 47Y), arranged between said first and second aperture means, for deflecting said electron beam so as to change the shape of the cross section of said electron beam passed through said second aperture means in accordance with said second size information; means for refocusing said electron beam passed through said second aperture means in accordance with said second size information; second deflecting means (52X, 52Y) for deflecting said electron beam passed through said refocusing means in accordance with said second position information; and at least two converging means (42, 44, 45) for converging said electron beam.
Claim 2
Dependent Claim
222 words
A scanning electron beam exposure system comprising: means (32 to 34) for emitting an electron beam (31); first aperture means (39a) for passing said electron beam therethrough; second aperture means (48a) for passing therethrough said electron beam passed through said first- aperture means so as to shape the cross section of said electron beam into a rectangular form; means (62) for storing information on a plurality of rectangular patterns defined by first size information (X 10 , Y 10 ) and first position information (X 20 , Y 20 ) ; pattern-generating means (63) for generating information on an exposure pattern defined by second size information (X 1 , Y1) and second position information ( X 2 , Y 2 ) ; first deflecting means (47X, 47Y), arranged between said first and second aperture means, for deflecting said electron beam so as to change the shape of the cross section of said electron beam passed through said second aperture means in accordance with said second size information; means for refocusing said electron beam passed through said second aperture means in accordance with said second size information; second deflecting means (52X, 52Y) for deflecting said electron beam passed through said refocusing means in accordance with said second position information; and at least two converging means (42, 44, 45) for converging said electron beam.
Claim 3
Dependent Claim
87 words
A system as set fourth in claim 1, wherein said refocusing means comprises: a coreless coil (51) provided within one (44) of said-converging means adjacent to the last (45) converging means; first multiplying means (69) for multiplying said second size information; first register means (70) for storing a first coefficient (a); second multiplying means (71) for multiplying the output of said first multiplying means by said first coefficient; and driving means for driving said coreless coil in accordance with the output (α·S) of said second multiplying means.
Claim 4
Dependent Claim
42 words
A system as set forth in claim 1, further comprising means for flying back said electron beam passed through said refocusing means so as to correct the shift in position of said electron beam in accordance with said second size information. -
Claim 5
Dependent Claim
94 words
A system as set forth in claim 3, wherein said flyback means comprises: second register means (74) for storing a second coefficient (8X); third register means (75) for storing a third coefficient (8Y); third multiplying means (76) for multiplying the output of said first multiplying means by said second coefficient; and . fourth multiplying means (77) for multiplying the output of said first multiplying means by said third coefficient, and wherein said flyback means controls said second deflecting means by using the outputs ( A X, ΔY) of said third and fourth multiplying means.
Claim 6
Dependent Claim
49 words
A system as set forth in claim 1, wherein said pattern-generating means (63) generates information on a plurality of devided exposure patterns each having the same size when said storing means transmits a rectangular pattern which is of a larger size than a predetermined size to said pattern-generating means.
References Cited (Backward Citations)
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