US4151422A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electron beam exposure method
Assignee: Jeol Ltd
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Filing: 1978-06-07
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Granted: 1979-04-24
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Expires: 1998-06-07
Abstract
Abstract An electron beam having a narrow rectangular cross section, shaped by two aperture plates and a deflector, is scanned over a workpiece or specimen. The length and width of the narrow rectangular cross section, relative to beam scanning, in accordance with the shape of the pattern being exposed.
Inventors
- 👤 Eiichi Goto
- 👤 Takashi Souma
- 👤 Masanori Idesawa
- 👤 Tetsuo Yuasa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 17:06
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/3002; H01J37/3007; H01J37/302; H01J37/3023; H01J37/3026
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
82 words
An electron beam exposure method for projecting an electron beam having a selectable cross section onto a workpiece, said method comprising the steps for: A. controlling the electron beam to produce an elongate rectangular cross section, B. projecting said electron beam onto a workpiece, C. deflecting said projected electron beam over the workpiece, and D. varying the length of the cross section of the beam in accordance with the pattern to be exposed and concomitant with the deflection of the electron beam.
Claim 2
Dependent Claim
82 words
An electron beam exposure method for projecting an electron beam having a selectable cross section onto a workpiece, said method comprising the steps for: A. controlling the electron beam to produce an elongate rectangular cross section, B. projecting said electron beam onto a workpiece, C. deflecting said projected electron beam over the workpiece, and D. varying the length of the cross section of the beam in accordance with the pattern to be exposed and concomitant with the deflection of the electron beam.
Claim 3
Dependent Claim
34 words
An electron beam exposure method according to claim 1 in which step A is carried out by deflecting the image of one aperture plate upon a subsequent apertured plate with a deflector arranged therebetween.
Claim 4
Dependent Claim
102 words
An electron beam exposure method for projecting an electron beam having a selectable cross section onto a workpiece, said method comprising the steps for: A. controlling the electron beam to produce an elongate rectangular cross section, B. projecting said electron beam onto a workpiece, C. deflecting said projected electron beam over the workpiece, D. varying the length of the cross section of the beam in accordance with the pattern to be exposed and concomitant with the deflection of the electron beam and E. varying the width of the cross section of the beam in accordance with the deflection of the electron beam.
Claim 5
Dependent Claim
102 words
An electron beam exposure method for projecting an electron beam having a selectable cross section onto a workpiece, said method comprising the steps for: A. controlling the electron beam to produce an elongate rectangular cross section, B. projecting said electron beam onto a workpiece, C. deflecting said projected electron beam over the workpiece, D. varying the length of the cross section of the beam in accordance with the pattern to be exposed and concomitant with the deflection of the electron beam and E. varying the width of the cross section of the beam in accordance with the deflection of the electron beam.
Claim 6
Dependent Claim
34 words
An electron beam exposure method according to claim 3 in which step A is carried out by deflecting the image of one apertured plate upon a subsequent apertured plate with a deflector arranged therebetween.
Claim 7
Dependent Claim
30 words
A method according to claim 3, in which the length and width of the beam cross section are varied such that the width approaches zero as the length approaches maxima.
Claim 8
Dependent Claim
31 words
A method according to claim 3, in which the width of the cross section of the electron beam is gradually reduced to zero as the beam is moved across the workpiece.
Claim 9
Dependent Claim
38 words
A method according to claim 3, in which the width of the cross section of the electron beam is increased from zero to a fixed value at which it remains as the beam is moved across the workpiece.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-04-23 | 1982-10-23 | 1983-04-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-04-23 | 1986-10-23 | 1987-04-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-04-23 | 1990-10-23 | 1991-04-24 | $7700.00 | Window Closed / Lapsed |