US4628862A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photochemical vapor deposition apparatus
Assignee: Canon Inc
•
Filing: 1985-03-25
•
Granted: 1986-12-16
•
Expires: 2005-03-25
Abstract
Abstract A photochemical vapor deposition apparatus which includes a reaction chamber, a means for introducing a starting gas for film formation into the reaction chamber and a means for irradiating the starting gas with a light of high energy and deposites a thin film on a substrate placed in the reaction chamber by utilizing the photochemical reaction, characterized in that the apparatus includes a means for heating in advance to high temperature the starting gas to be introduced into the reaction chamber.
Inventors
- 👤 Osamu Kamiya
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 21:01
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/48
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
79 words
A photochemical vapor deposition apparatus which includes a reaction chamber, a means for introducing a starting gas for film formation into the reaction chamber and a means for irradiating the starting gas with a light of high energy to deposit a thin film on a substrate placed in the reaction chamber by utilizing the photochemical reaction, wherein the apparatus includes a means for heating in advance to high temperature the starting gas to be introduced into the reaction chamber.
Claim 2
Dependent Claim
79 words
A photochemical vapor deposition apparatus which includes a reaction chamber, a means for introducing a starting gas for film formation into the reaction chamber and a means for irradiating the starting gas with a light of high energy to deposit a thin film on a substrate placed in the reaction chamber by utilizing the photochemical reaction, wherein the apparatus includes a means for heating in advance to high temperature the starting gas to be introduced into the reaction chamber.
Claim 3
Dependent Claim
18 words
A photochemical vapor deposition apparatus according to claim 1 wherein the heating means is a resistance heating device.
Claim 4
Dependent Claim
18 words
A photochemical vapor deposition apparatus according to claim 1 wherein the heating means is an infrared heating device.
References Cited (Backward Citations)
US4496609A
Cited
US4371587A
Cited
US4435445A
Cited
US4533820A
Cited
US4522674A
Cited
US4516527A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-12-15 | 1990-06-16 | 1990-12-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-12-15 | 1994-06-16 | 1994-12-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-12-15 | 1998-06-16 | 1998-12-16 | $7700.00 | Window Closed / Lapsed |