US4435445A
Expired / Lapsed
US
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Photo-assisted CVD
Assignee: Atlantic Richfield Co
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Filing: 1982-05-13
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Granted: 1984-03-06
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Expires: 2002-05-13
Abstract
Abstract A process and apparatus for depositing a film from a gas involves introducing the gas to a deposition environment containing a substrate, heating the substrate, and irradiating the gas with radiation having a preselected energy spectrum, such that a film is deposited onto the substrate. In a preferred embodiment, the energy spectrum of the radiation is below or approximately equal to that required to photochemically decompose the gas. In another embodiment, the gas is irradiated through a transparent member exposed at a first surface thereof to the deposition environment, and a flow of substantially inert gaseous material is passed along the first surface to minimize deposition thereon.
Inventors
- 👤 David D. Allred
- 👤 Lee Walter
- 👤 Jaime M. Reyes
- 👤 Stanford R. Ovshinsky
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 06:47
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/48; C23C16/488; C23C16/04; C23C16/047; C23C16/482
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
77 words
A process for making an amorphous silicon and germanium alloy film comprising: providing a gas comprising silane and germane in a deposition environment containing the substrate; heating the substrate below the temperature required for pyrolysis of the silane and germane; irradiating the silane and germane with radiation below an energy level required to photochemically decompose the gas; and the combination of heat and radiation causing deposition of an amorphous silicon and germanium alloy film on the substrate.
Claim 2
Dependent Claim
77 words
A process for making an amorphous silicon and germanium alloy film comprising: providing a gas comprising silane and germane in a deposition environment containing the substrate; heating the substrate below the temperature required for pyrolysis of the silane and germane; irradiating the silane and germane with radiation below an energy level required to photochemically decompose the gas; and the combination of heat and radiation causing deposition of an amorphous silicon and germanium alloy film on the substrate.
Claim 3
Dependent Claim
19 words
The process of claim 1 wherein the substrate is heated to a temperature of at least about 250° C.
Claim 4
Dependent Claim
11 words
The process of claim 1 wherein the radiation is ultraviolet light.
Claim 5
Dependent Claim
17 words
The process of claim 3 wherein the ultraviolet light has a wavelength of greater than 2,000 Å.
Claim 6
Dependent Claim
45 words
The process of claim 1 wherein the radiation is passed through a transparent member exposed at a first surface thereof to the deposition environment, and the process further comprises establishing a flow of substantially inert gaseous material along the first surface to minimize deposition thereon.
Claim 7
Dependent Claim
22 words
The process of claim 5 wherein the step of establishing the flow comprises producing a laminar gas curtain along the first surface.
Claim 8
Dependent Claim
18 words
The process of claim 1 wherein the gas in the deposition environment consists essentially of silane and germane.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-03-06 | 1987-09-05 | 1988-03-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-03-06 | 1991-09-05 | 1992-03-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-03-06 | 1995-09-05 | 1996-03-06 | $7700.00 | Window Closed / Lapsed |